Patents by Inventor Rafal Maciej RECHCINSKI

Rafal Maciej RECHCINSKI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11973131
    Abstract: Examples described in this disclosure relate to gating a semiconductor layer into a quantum spin Hall insulator state, Certain examples further relate to using quantum spin Hall insulators as topological quantum qubits. Quantum spin Hall systems may rely upon the quantum spin Hall effect by causing a state of a matter to change from a certain phase to an inverted bandgap phase. In one example, the present disclosure relates to a device including a semiconductor layer comprising an active material. The device further includes a gate coupled to the semiconductor layer, where the semiconductor layer is operable in a quantum spin Hall insulator state by using electrons and holes from the active material in response to an application of an electric field to the semiconductor layer via the gate.
    Type: Grant
    Filed: August 6, 2021
    Date of Patent: April 30, 2024
    Assignee: Microsoft Technology Licensing, LLC
    Inventors: Dmitry Pikulin, Georg Wolfgang Winkler, Rafal Maciej Rechcinski, Dominik André Gresch
  • Publication number: 20230038763
    Abstract: Examples described in this disclosure relate to gating a semiconductor layer into a quantum spin Hall insulator state, Certain examples further relate to using quantum spin Hall insulators as topological quantum qubits. Quantum spin Hall systems may rely upon the quantum spin Hall effect by causing a state of a matter to change from a certain phase to an inverted bandgap phase. In one example, the present disclosure relates to a device including a semiconductor layer comprising an active material. The device further includes a gate coupled to the semiconductor layer, where the semiconductor layer is operable in a quantum spin Hall insulator state by using electrons and holes from the active material in response to an application of an electric field to the semiconductor layer via the gate.
    Type: Application
    Filed: August 6, 2021
    Publication date: February 9, 2023
    Inventors: Dmitry PIKULIN, Georg Wolfgang WINKLER, Rafal Maciej RECHCINSKI, Dominik André GRESCH