Patents by Inventor Raghu Balasubramanian

Raghu Balasubramanian has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optimized model and parameter selection for optical metrology
    Patent number: 7092110
    Abstract: A profile model for use in optical metrology of structures in a wafer is selected based on a template having one or more parameters including characteristics of process and modeling attributes associated with a structure in a wafer. The process includes performing a profile modeling process to generate a profile model of a wafer structure based on a template having one or more parameters including characteristics of process and modeling attributes. The profile model includes a set of geometric parameters associated with the dimensions of the structure. The generated profile model may further be tested against termination criteria and the one or more parameters modified. The process of performing a modeling process to generate a profile model and testing the generated profile model may be repeated until the termination criteria are met.
    Type: Grant
    Filed: March 25, 2003
    Date of Patent: August 15, 2006
    Assignee: Timbre Technologies, Inc.
    Inventors: Raghu Balasubramanian, Sanjay Yedur, Vi Vuong, Nickhil Jakatdar
  • Optimized model and parameter selection for optical metrology
    Publication number: 20040017575
    Abstract: A profile model for use in optical metrology of structures in a wafer is selected based on a template having one or more parameters including characteristics of process and modeling attributes associated with a structure in a wafer. The process includes performing a profile modeling process to generate a profile model of a wafer structure based on a template having one or more parameters including characteristics of process and modeling attributes. The profile model includes a set of geometric parameters associated with the dimensions of the structure. The generated profile model may further be tested against termination criteria and the one or more parameters modified. The process of performing a modeling process to generate a profile model and testing the generated profile model may be repeated until the termination criteria are met.
    Type: Application
    Filed: March 25, 2003
    Publication date: January 29, 2004
    Inventors: Raghu Balasubramanian, Sanjay Yedur, Vi Vuong, Nickhil Jakatdar