Patents by Inventor Raguraman Venkatesan

Raguraman Venkatesan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask design and OPC for device manufacture
    Patent number: 8778605
    Abstract: Described herein is mask design and modeling for a set of masks to be successively imaged to print a composite pattern on a substrate, such as a semiconductor wafer. Further described herein is a method of double patterning a substrate with the set of masks. Also described herein is a method of correcting a drawn pattern of one of the mask levels based on a predicted pattern contour of the other of the mask levels. Also described herein is a method of modeling a resist profile contour for a mask level in which photoresist is applied onto a inhomogeneous substrate, as well as method of predicting a resist profile of a Boolean operation of two masks.
    Type: Grant
    Filed: February 7, 2013
    Date of Patent: July 15, 2014
    Assignee: Intel Corporation
    Inventors: Shem Ogadhoh, Raguraman Venkatesan, Kevin J. Hooker, Sungwon Kim, Bin Hu, Vivek Singh, Bikram Baidya, Prasad Narendra Atkar, Seongtae Jeong
  • MASK DESIGN AND OPC FOR DEVICE MANUFACTURE
    Publication number: 20130149638
    Abstract: Described herein is mask design and modeling for a set of masks to be successively imaged to print a composite pattern on a substrate, such as a semiconductor wafer. Further described herein is a method of double patterning a substrate with the set of masks. Also described herein is a method of correcting a drawn pattern of one of the mask levels based on a predicted pattern contour of the other of the mask levels. Also described herein is a method of modeling a resist profile contour for a mask level in which photoresist is applied onto a inhomogeneous substrate, as well as method of predicting a resist profile of a Boolean operation of two masks.
    Type: Application
    Filed: February 7, 2013
    Publication date: June 13, 2013
    Inventors: Shem OGADHOH, Raguraman VENKATESAN, Kevin J. HOOKER, Sungwon KIM, Bin HU, Vivek SINGH, Bikram BAIDYA, Prasad NARENDRA ATKAR, Seongtae JEONG
  • Mask design and OPC for device manufacture
    Patent number: 8404403
    Abstract: Described herein is mask design and modeling for a set of masks to be successively imaged to print a composite pattern on a substrate, such as a semiconductor wafer. Further described herein is a method of double patterning a substrate with the set of masks. Also described herein is a method of correcting a drawn pattern of one of the mask levels based on a predicted pattern contour of the other of the mask levels. Also described herein is a method of modeling a resist profile contour for a mask level in which photoresist is applied onto a inhomogeneous substrate, as well as method of predicting a resist profile of a Boolean operation of two masks.
    Type: Grant
    Filed: June 25, 2010
    Date of Patent: March 26, 2013
    Assignee: Intel Corporation
    Inventors: Shem Ogadhoh, Raguraman Venkatesan, Kevin J. Hooker, Sungwon Kim, Bin Hu, Vivek Singh, Bikram Baidya, Prasad Narendra Atkar, Seongtae Jeong
  • MASK DESIGN AND OPC FOR DEVICE MANUFACTURE
    Publication number: 20110318672
    Abstract: Described herein is mask design and modeling for a set of masks to be successively imaged to print a composite pattern on a substrate, such as a semiconductor wafer. Further described herein is a method of double patterning a substrate with the set of masks. Also described herein is a method of correcting a drawn pattern of one of the mask levels based on a predicted pattern contour of the other of the mask levels. Also described herein is a method of modeling a resist profile contour for a mask level in which photoresist is applied onto a inhomogeneous substrate, as well as method of predicting a resist profile of a Boolean operation of two masks.
    Type: Application
    Filed: June 25, 2010
    Publication date: December 29, 2011
    Inventors: Shem Ogadhoh, Raguraman Venkatesan, Kevin J. Hooker, Sungwon Kim, Bin Hu, Vivek Singh, Bikram Baidya, Prasad Narendra Atkar, Seongtae Jeong