Patents by Inventor Raimo Leimala

Raimo Leimala has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8357227
    Abstract: The invention relates to a method for the removal of metal impurities in chloride-based copper recovery processes. The amount of impurities in a strong chloride solution of monovalent copper can be reduced according to the method down to very low levels by using ion exchange as at least one purification stage.
    Type: Grant
    Filed: April 15, 2003
    Date of Patent: January 22, 2013
    Assignee: Outotec Oyj
    Inventor: Raimo Leimala
  • Publication number: 20050145073
    Abstract: The invention relates to a method for the removal of metal impurities in chloride-based copper recovery processes. The amount of impurities in a strong chloride solution of monovalent copper can be reduced according to the method down to very low levels by using ion exchange as at least one purification stage.
    Type: Application
    Filed: April 15, 2003
    Publication date: July 7, 2005
    Inventor: Raimo Leimala
  • Patent number: 6861037
    Abstract: The present invention focuses on the method for the removal of impurities, such as tellurium and bismuth, from gold concentrate containing sulfides. According to the present method, the impurities are leached from the gold concentrate with the aid of an acidic aqueous solution, at an elevated temperature, whereby the impurities dissolve and the gold remains in the concentrate.
    Type: Grant
    Filed: August 10, 2000
    Date of Patent: March 1, 2005
    Assignee: Outokumpu Oyj
    Inventors: Raimo Leimala, Olli Hyvärinen