Patents by Inventor Raimond Visser

Raimond Visser has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10007197
    Abstract: A sensor system configured to determine a position of a substrate having an edge. The sensor system includes a radiation source arranged to emit a radiation bundle, a reflective element, a detector device and a substrate table having a supporting surface for supporting the substrate. The supporting surface is at least partly along a plane. The radiation source and the detector device are arranged on a first side of the plane. The reflective element is arranged on a second side of the plane other than the first side. The reflective element is arranged to create a reflected bundle by reflecting the radiation bundle. The reflective element is arranged to illuminate the edge with the reflected bundle. The detector device is arranged to receive the reflected bundle.
    Type: Grant
    Filed: March 2, 2015
    Date of Patent: June 26, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Joost Kauffman, Martin Dieter Nico Peters, Petrus Theodorus Rutgers, Martijn Hendrikus Wilhelmus Stopel, Gerard Van Den Eijkel, Harmen Klaas Van Der Schoot, Raimond Visser
  • Publication number: 20160370716
    Abstract: A sensor system configured to determine a position of a substrate having an edge. The sensor system includes a radiation source arranged to emit a radiation bundle, a reflective element, a detector device and a substrate table having a supporting surface for supporting the substrate. The supporting surface is at least partly along a plane. The radiation source and the detector device are arranged on a first side of the plane. The reflective element is arranged on a second side of the plane other than the first side. The reflective element is arranged to create a reflected bundle by reflecting the radiation bundle. The reflective element is arranged to illuminate the edge with the reflected bundle. The detector device is arranged to receive the reflected bundle.
    Type: Application
    Filed: March 2, 2015
    Publication date: December 22, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Joeri LOF, Joost KAUFFMAN, Martin Dieter Nico PETERS, Petrus Theodorus RUTGERS, Martijn Hendrikus Wilhelmus STOPEL, Gerard VAN DEN EIJKEL, Harmen Klaas VAN DER SCHOOT, Raimond VISSER
  • Publication number: 20130077078
    Abstract: A lithographic apparatus comprises a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes an electrostatic clamp arranged to clamp the substrate at a top side thereof. The electrostatic clamp is arranged to clamp at least part of a circumferential outer zone of a top surface of the substrate. The invention provides a substrate handling method including positioning the substrate by means of a gripper on a substrate table of a lithographic apparatus. The substrate is clamped at a top side thereof by using an electrostatic clamp of the gripper.
    Type: Application
    Filed: August 29, 2012
    Publication date: March 28, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus Donders, Antonius Franciscus Johannes De Groot, Hubert Marie Segers, Johannes Petrus Martinus Bernardus Vermeulen, Raimond Visser, Johannes Charles Adrianus Van Den Berg, Jan Steven Christiaan Westerlaken, Yang-Shan Huang, Christiaan Louis Valentin
  • Patent number: 8064730
    Abstract: A method to determine a rotation of a substrate with respect to the patterning device without using a reference mark on the substrate is presented. At least two structures having corresponding features and present on the substrate, e.g. previously projected patterns, are imaged with a known position with respect to a measurement coordinate system. A distance vector between the at least two structures is determined. From the distance vector, a rotation angle is calculated. In an embodiment of the invention, there is provided a method to estimate a position of the substrate from the acquired image(s). A position is measured and used as a reference position for subsequent substrates of which the rotation angle is to be determined.
    Type: Grant
    Filed: September 8, 2004
    Date of Patent: November 22, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Raimond Visser, Leo Wilhelmus Maria Kuipers
  • Publication number: 20090148604
    Abstract: An exemplary substrate processing apparatus has a vacuum chamber and a load lock for gas removal. The load lock has a support table to support a substrate. A cover plate may be provided in the load lock, the cover plate having a lower surface facing the upper surface of the support table. Openings may be provided in the lower surface of the cover plate to allow removal of gas from over the substrate in a direction substantially normal to the lower surface. In an embodiment, a gas pressure between the upper surface of the support table and the substrate is initially reduced through the opening to a certain pressure below a concurrent load lock pressure. When the remainder of the load lock pressure has dropped below the certain, gas pressure between the upper surface of the support table and the substrate is reduced together with the remainder load lock pressure.
    Type: Application
    Filed: November 14, 2008
    Publication date: June 11, 2009
    Applicant: ASML Netherlands B.V.
    Inventors: Raimond VISSER, Pieter Renaat Maria Hennus, Johannes Hendrikus Gertrudis Franssen, Erwin Theodorus Jacoba Verhagen
  • Patent number: 7486384
    Abstract: The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.
    Type: Grant
    Filed: March 31, 2004
    Date of Patent: February 3, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus Tinnemans, Edwin Johan Buis, Sjoerd Nicolaas Lambertus Donders, Jan Van Elp, Jan Frederik Hoogkamp, Aschwin Lodewijk Hendricus Johannes Van Meer, Patrick Johannes Cornelus Hendrik Smulders, Franciscus Andreas Cornelis Johannes Spanjers, Johannes Petrus Martinus Bernardus Vermeulen, Raimond Visser, Henricus Gerardus Tegenbosch, Johannes Charles Adrianus Van Den Berg, Henricus Johannes Adrianus Van De Sande, Thijs Vervoort
  • Publication number: 20080297758
    Abstract: The invention relates to a transfer apparatus for transferring an object (W). the transfer apparatus comprises a gripper (15) for at least one of gripping the object (W) at a first position and then releasing the object (W) at a second position proximate to a receiver (20) and releasing the object (W) at a first position after gripping the object at a second position proximate to the receiver (20). The transfer apparatus is further provided with a measurement device (22) arranged to measure the relative position of the gripper (15) with respect to the receiver (20) in at least one dimension. Further, a relative position error is defined with respect to a desired relative position based on the relative position measured. The relative position of the gripper (15) and the receiver (20) are adjusted for minimizing the relative position error in the second position.
    Type: Application
    Filed: June 26, 2008
    Publication date: December 4, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Patricius Aloysius Jacobus Tinnemans, Edwin Johan Buis, Sjoerd Nicolaas Lambertus Donders, Jan Van Elp, Jan Frederik Hoogkamp, Aschwin Lodewijk Hendricus Van Meer, Patrick Johannes Cornelus Smulders, Franciscus Andreas Cornelis Spanjers, Johannes Petrus Martinus Ber Vermeulen, Raimond Visser, Henricus Gerardus Tegenbosch, Johannes Charles Adrianus Van Den Berg, Henricus Johannes Adrianus Van De Sande, Thijs Vervoort
  • Patent number: 7408618
    Abstract: A method for aligning a substrate in a lithographic apparatus includes determining from a geometric reference of the substrate a position of a window on the substrate. The window indicates an area in which an alignment mark of the substrate may be expected. Then, a position of the alignment mark is measured in the window. A relationship between the measured position of the alignment mark and the position of the window is determined. The relationship is stored in a database and the substrate is aligned making use of the measured position of the alignment mark. The above may be repeated for a following aligning of the substrate, prior however to the measuring of the position of the alignment mark in the window, the position of the window is amended making use of the relationship between the measured position of the alignment mark and the position of the window as stored in the database for one or more preceding alignings.
    Type: Grant
    Filed: June 30, 2005
    Date of Patent: August 5, 2008
    Assignee: ASML Netherlands B.V.
    Inventor: Raimond Visser
  • Patent number: 7394525
    Abstract: The present invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam; a patterning device support constructed to support a patterning device, the patterning device placed on the patterning device support being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a patterning device handling apparatus, including a single robot for exchanging a patterning device with the patterning device support and a loading station, wherein the robot includes a first holding device configured to hold a patterning device in a first holding position and a second holding device configured to hold a patterning device in a second holding position. Such single robot makes a rapid and accurate exchange of patterning devices possible.
    Type: Grant
    Filed: October 21, 2004
    Date of Patent: July 1, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Jaap Kuit, Jan Frederik Hoogkamp, Hubert Marie Segers, Raimond Visser, Johannes Maquine
  • Patent number: 7394520
    Abstract: A load lock for a lithographic apparatus is arranged to transfer an object, like a substrate, into and from the lithographic apparatus. The load lock outer wall defining at least part of a load lock volume accommodating a support unit for supporting the object when in the load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus.
    Type: Grant
    Filed: March 11, 2004
    Date of Patent: July 1, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Albert Jan Hendrik Klomp, Jan Frederik Hoogkamp, Raimond Visser, Josephus Cornelius Johannes Antonius Vugts, Henricus Johannes Louis Marie Vullings, Leo Wilhelmus Maria Kuipers, Johannes Hendrikus Gertrudis Franssen
  • Patent number: 7307695
    Abstract: Embodiments of the invention include a method of placing a substrate on a support. In an embodiment of the invention, the method includes determining a position of the substrate relative to a reference position via a sensor which outputs a sensor signal to a control unit, the determining including detecting the position of the substrate in a chamber, and determining a gripping position on the substrate; gripping the substrate at the gripping position with a gripper controlled by the control unit, and providing the substrate in a defined position on the support member, the providing including moving the substrate to a fixed position relative to the support member such that the center of the substrate arrives at a predetermined position on the support member.
    Type: Grant
    Filed: October 8, 2004
    Date of Patent: December 11, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Martinus Andreas Hazenberg, Patricius Aloysius Jacobus Tinnemans, Raimond Visser
  • Patent number: 7283225
    Abstract: To enable differentiation between a particle and a ghost particle, a detector system resolves radiation from a ghost particle from radiation from an actual particle. The detector system outputs at least two detector signals corresponding to intensities of radiation being incident on different parts of the detector system or the detector system outputs at least two detector signals corresponding to intensities of radiation with different wavelengths being incident on the detector system. If radiation is received from a ghost particle, not each of the at least two detector signals has a level above a predetermined threshold level, whereas radiation received from a particle results in the signals having substantially a same level above a threshold level.
    Type: Grant
    Filed: October 4, 2005
    Date of Patent: October 16, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Onvlee, Raimond Visser, Peter Ferdinand Greve, Johannes Hendrikus Gertrudis Franssen, Erwin Theodorus Jacoba Verhagen
  • Publication number: 20070035709
    Abstract: An apparatus includes a first support structure configured to support an element that has an alignment marker. The apparatus also includes an alignment sensor comprising a light source that is integrally formed on the first support structure and is configured to provide a light beam that illuminates the alignment marker and at least one detector configured to detect the position of the alignment marker by analyzing the light beam transmitted through the element. Such an apparatus may be used to align of the element with respect to the first support structure.
    Type: Application
    Filed: June 30, 2006
    Publication date: February 15, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Jan Kuit, Raimond Visser, Johannes Maquine
  • Publication number: 20070002298
    Abstract: A method for aligning a substrate in a lithographic apparatus includes determining from a geometric reference of the substrate a position of a window on the substrate. The window indicates an area in which an alignment mark of the substrate may be expected. Then, a position of the alignment mark is measured in the window. A relationship between the measured position of the alignment mark and the position of the window is determined. The relationship is stored in a database and the substrate is aligned making use of the measured position of the alignment mark. The above may be repeated for a following aligning of the substrate, prior however to the measuring of the position of the alignment mark in the window, the position of the window is amended making use of the relationship between the measured position of the alignment mark and the position of the window as stored in the database for one or more preceding alignings.
    Type: Application
    Filed: June 30, 2005
    Publication date: January 4, 2007
    Applicant: ASML Netherlands B.V.
    Inventor: Raimond Visser
  • Patent number: 7131999
    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a robot configured to transfer an exchangeable object to and from a support region, the robot including an arm and an end effector, the end effector including a first and second carrier configured to carry respective exchangeable objects, and the end effector being rotatably connected to the arm of the robot around a rotation axis which extends substantially parallel to the support region.
    Type: Grant
    Filed: September 28, 2004
    Date of Patent: November 7, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Frederik Hoogkamp, Jan Jaap Kuit, Raimond Visser
  • Patent number: 7123349
    Abstract: The invention relates to a lithographic projection assembly, having at least two load locks for transferring substrates between a first environment and a lower pressure second environment, a substrate handler with a handler chamber within the second environment and a lithographic projection apparatus including a projection chamber. The handler chamber and the projection chamber communicate via a load position for entering a substrate from the handler chanter into the projection chamber and an unload position for removing the substrate from the projection chamber into the handler chamber. The handler chamber also includes pre-processing means for pre-processing of the substrates and transport means for transferring substrates between the load locks and pre-processing means.
    Type: Grant
    Filed: March 11, 2004
    Date of Patent: October 17, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Pieter Johannes Marius Van Groos, Pieter Renaat Maria Hennus, Jan Frederik Hoogkamp, Albert Jan Hendrik Klomp, Johannes Onvlee, Raimond Visser
  • Patent number: 7106420
    Abstract: The present invention relates to a lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate support, the patterned beam of radiation being patterned with a patterning device held by a patterning device support.
    Type: Grant
    Filed: December 20, 2004
    Date of Patent: September 12, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Jaap Kuit, Dirk Jan Bijvoet, Jan Frederik Hoogkamp, Hubert Marie Segers, Raimond Visser, Johannes Maquine
  • Publication number: 20060087636
    Abstract: The present invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam; a patterning device support constructed to support a patterning device, the patterning device placed on the patterning device support being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a patterning device handling apparatus, including a single robot for exchanging a patterning device with the patterning device support and a loading station, wherein the robot includes a first holding device configured to hold a patterning device in a first holding position and a second holding device configured to hold a patterning device in a second holding position. Such single robot makes a rapid and accurate exchange of patterning devices possible.
    Type: Application
    Filed: October 21, 2004
    Publication date: April 27, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jan Kuit, Jan Hoogkamp, Hubert Segers, Raimond Visser, Johannes Maquine
  • Publication number: 20060072108
    Abstract: To enable differentiation between a particle and a ghost particle, a detector system resolves radiation from a ghost particle from radiation from an actual particle. The detector system outputs at least two detector signals corresponding to intensities of radiation being incident on different parts of the detector system or the detector system outputs at least two detector signals corresponding to intensities of radiation with different wavelengths being incident on the detector system. If radiation is received from a ghost particle, not each of the at least two detector signals has a level above a predetermined threshold level, whereas radiation received from a particle results in the signals having substantially a same level above a threshold level.
    Type: Application
    Filed: October 4, 2005
    Publication date: April 6, 2006
    Applicant: ASML Nethderlands B.V.
    Inventors: Johannes Onvlee, Raimond Visser, Peter Greve, Johannes Franssen, Erwin Verhagen
  • Publication number: 20060066832
    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a robot configured to transfer an exchangeable object to and from a support region, the robot including an arm and an end effector, the end effector including a first and second carrier configured to carry respective exchangeable objects, and the end effector being rotatably connected to the arm of the robot around a rotation axis which extends substantially parallel to the support region.
    Type: Application
    Filed: September 28, 2004
    Publication date: March 30, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jan Frederik Hoogkamp, Jan Jaap Kuit, Raimond Visser