Patents by Inventor Raimund Sindlinger

Raimund Sindlinger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for the production of photoresist relief structures having an overhang character using o-quinone diazide photoresist with overexposure
    Patent number: 4649101
    Abstract: A process for the production of photoresist relief structures possessing an overhang character comprising coating a substrate with a positive-working photoresist composition based on phenol/formaldehyde condensates of the novolak resin type and photosensitive o-quinonediazide compounds, imagewise overexposure of the photoresist layer at an energy exceeding that required to produce relief structures with a 90.degree. angle between the photoresist compound and the substrate, and treatment of the overexposed layer and substrate with a buffered, aqueous, alkaline developer containing 1-100 ppm of an oxyethylated alkylphenol as a non-ionic surfactant.
    Type: Grant
    Filed: July 26, 1985
    Date of Patent: March 10, 1987
    Assignee: Merck Patent Gesellschaft mit beschrankter Haftung
    Inventors: Klaus P. Thiel, Raimund Sindlinger, Hans J. Merrem
  • Developer for positive photoresists
    Patent number: 4576903
    Abstract: A developer suitable for use with positive photoresists is based on a buffered aqueous-alkaline solution containing non-ionic surfactants and contains in the solution 1-100 ppm of the surfactants, preferably of the ethoxylated-alkylphenol type. The resultant photoresist shows outstanding properties with respect to the resolution and edge sharpness obtainable in the developed resist image and with respect to its developing activity, developing capacity and stability.
    Type: Grant
    Filed: December 21, 1984
    Date of Patent: March 18, 1986
    Assignee: Merck Patent Gesellschaft mit beschrankter Haftung
    Inventors: Winfried Baron, Kurt Marquard, Hans-Joachim Merrem, Raimund Sindlinger, Klaus-Peter Thiel