Abstract: The present invention relates to methods and devices for extending a time period until changing a measuring tip of a scanning probe microscope. In particular, the invention relates to a method for hardening a measuring tip for a scanning probe microscope, comprising the step of: Processing the measuring tip with a beam of an energy beam source, the energy beam source being part of a scanning electron microscope.

Abstract: The present invention relates to methods and devices for extending a time period until changing a measuring tip of a scanning probe microscope. In particular, the invention relates to a method for hardening a measuring tip for a scanning probe microscope, comprising the step of: Processing the measuring tip with a beam of an energy beam source, the energy beam source being part of a scanning electron microscope.

Abstract: The present invention relates to methods and devices for extending a time period until changing a measuring tip of a scanning probe microscope. In particular, the invention relates to a method for hardening a measuring tip for a scanning probe microscope, comprising the step of: Processing the measuring tip with a beam of an energy beam source, the energy beam source being part of a scanning electron microscope.

Abstract: A communication set-up having an electronic circuit; the circuit including at least one communication unit for wireless communication. The communication unit includes an antenna network connected to an antenna; and also includes an actuating unit. The circuit of the communication set-up further includes a signal processing unit, and in response to operation of the actuating unit, the actuating unit is configured to release a signal to the signal processing unit, which, on the basis of this, converts the communication set-up from a blocked state to an enabled state, or vice versa. In addition, a method for controlling such a communication set-up is described.

Abstract: The present invention relates to methods and devices for extending a time period until changing a measuring tip of a scanning probe microscope. In particular, the invention relates to a method for hardening a measuring tip for a scanning probe microscope, comprising the step of: Processing the measuring tip with a beam of an energy beam source, the energy beam source being part of a scanning electron microscope.

Abstract: A communication set-up having an electronic circuit; the circuit including at least one communication unit for wireless communication. The communication unit includes an antenna network connected to an antenna; and also includes an actuating unit. The circuit of the communication set-up further includes a signal processing unit, and in response to operation of the actuating unit, the actuating unit is configured to release a signal to the signal processing unit, which, on the basis of this, converts the communication set-up from a blocked state to an enabled state, or vice versa. In addition, a method for controlling such a communication set-up is described.

Abstract: A communication set-up having an electronic circuit; the circuit including at least one communication unit for wireless communication. The communication unit includes an antenna network connected to an antenna; and also includes an actuating unit. The circuit of the communication set-up further includes a signal processing unit, and in response to operation of the actuating unit, the actuating unit is configured to release a signal to the signal processing unit, which, on the basis of this, converts the communication set-up from a blocked state to an enabled state, or vice versa. In addition, a method for controlling such a communication set-up is described.

Abstract: A scattered radiation grid for an x-ray imaging is disclosed. In an embodiment, the scattered radiation grid includes alternately arranged layers permeable to x-ray radiation and absorbing x-ray radiation. The layers absorbing the x-ray radiation are formed from an amorphous material. Further, a method is disclosed for using an amorphous metal for the layers of a scattered radiation grid absorbing the x-ray radiation.

Abstract: The present invention relates to methods and devices for extending a time period until changing a measuring tip of a scanning probe microscope. In particular, the invention relates to a method for hardening a measuring tip for a scanning probe microscope, comprising the step of: Processing the measuring tip with a beam of an energy beam source, the energy beam source being part of a scanning electron microscope.

Abstract: A communication set-up having an electronic circuit; the circuit including at least one communication unit for wireless communication. The communication unit includes an antenna network connected to an antenna; and also includes an actuating unit. The circuit of the communication set-up further includes a signal processing unit, and in response to operation of the actuating unit, the actuating unit is configured to release a signal to the signal processing unit, which, on the basis of this, converts the communication set-up from a blocked state to an enabled state, or vice versa. In addition, a method for controlling such a communication set-up is described.

Abstract: A scattered radiation grid for an x-ray imaging is disclosed. In an embodiment, the scattered radiation grid includes alternately arranged layers permeable to x-ray radiation and absorbing x-ray radiation. The layers absorbing the x-ray radiation are formed from an amorphous material. Further, a method is disclosed for using an amorphous metal for the layers of a scattered radiation grid absorbing the x-ray radiation.

Abstract: The invention relates to a method for electron beam induced etching of a material (100, 200) with the method steps providing at least one etching gas at a position of the material (100, 200) at which an electron beam impacts on the material (100, 200) and simultaneously providing at least one passivation gas which is adapted for slowing down or inhibiting a spontaneous etching by the at least one etching gas.

Abstract: The invention relates to a method for electron beam induced etching of a layer contaminated with gallium, with the method steps of providing at least one first halogenated compound as an etching gas at the position at which an electron beam impacts on the layer, and providing at least one second halogenated compound as a precursor gas for removing of the gallium from this position.

Abstract: A cock fitting includes a cock plug disposed in a housing. The cock plug is connected to a drive arrangement for lifting and subsequent rotation of the cock plug, wherein the drive arrangement is configured to operate hydraulically for lifting as well as for rotating the cock plug.

Abstract: The present method relates to processes for the removal of a material from a sample by a gas chemical reaction activated by a charged particle beam. The method is a multiple step process wherein in a first step a gas is supplied which, when a chemical reaction between the gas and the material is activated, forms a non-volatile material component such as a metal salt or a metaloxide. In a second consecutive step the reaction product of the first chemical reaction is removed from the sample.

Abstract: The invention relates to a method for electron beam induced deposition of electrically conductive material from a metal carbonyl with the method steps of providing at least one electron beam at a position of a substrate, storing at least one metal carbonyl at a first temperature, and heating the at least one metal carbonyl to at least one second temperature prior to the provision at the position at which the at least one electron beam impacts on the substrate.

Abstract: An apparatus and a method for investigating and/or modifying a sample is disclosed. The apparatus comprises a charged particle source, at least one particle optical element forming a charged particle beam of charged particles emitted by said charged particle source. The apparatus further comprises an objective lens which generates a charged particle probe from said charged particle beam. The objective lens defines a particle optical axis. A first electrostatic deflection element is arranged—in a direction of propagation of charged particles emitted by said charged particle source—downstream of the objective lens. The electrostatic deflection element deflecting the charged particle beam in a direction perpendicular to said charged particle optical axis and has a deflection bandwidth of at least 10 MHz.

Abstract: An apparatus and a method for investigating and/or modifying a sample is disclosed. The apparatus comprises a charged particle source, at least one particle optical element forming a charged particle beam of charged particles emitted by said charged particle source. The apparatus further comprises an objective lens which generates a charged particle probe from said charged particle beam. The objective lens defines a particle optical axis. A first electrostatic deflection element is arranged—in a direction of propagation of charged particles emitted by said charged particle source—downstream of the objective lens. The electrostatic deflection element deflecting the charged particle beam in a direction perpendicular to said charged particle optical axis and has a deflection bandwidth of at least 10 MHz.

Abstract: The invention relates to a method for electron beam induced etching of a layer contaminated with gallium (120), (220) with the method steps of providing at least one first halogenated compound as an etching gas at the position at which an electron beam impacts on the layer (120), (220) and providing at least one second halogenated compound as a precursor gas for removing of the gallium from this position.

Abstract: The invention relates to a method for electron beam induced etching of a material (100, 200) with the method steps providing at least one etching gas at a position of the material (100, 200) at which an electron beam impacts on the material (100, 200) and simultaneously providing at least one passivation gas which is adapted for slowing down or inhibiting a spontaneous etching by the at least one etching gas