Patents by Inventor Rainer Cremer

Rainer Cremer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210348269
    Abstract: Provided is a hot filament CVD device capable of easily disposing multiple base materials in a chamber. A hot filament CVD device includes a chamber, multiple filaments, multiple base material supports supporting respective multiple base materials, and a table. The multiple base material supports can be inserted into the chamber in a predetermined insertion direction through an opening, and support the corresponding multiple base materials so that the multiple base materials are disposed at intervals in the insertion direction. The table has a mounting surface on which the multiple base material supports are allowed to be mounted allowing the multiple base materials to be disposed facing the corresponding multiple filaments, and supports the multiple base material supports inside the chamber while allowing the multiple base material supports to be disposed adjacent to each other in a chamber width direction.
    Type: Application
    Filed: August 19, 2019
    Publication date: November 11, 2021
    Applicant: KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.)
    Inventors: Tetsuya TAKAHASHI, Satoshi HIROTA, Rainer CREMER
  • Publication number: 20210324520
    Abstract: Provided is a hot filament CVD device capable of performing coating treatment on a base material while stably correcting slack of a filament due to thermal expansion. The hot filament CVD device includes a chamber, a base material support that supports multiple base materials, multiple filaments, a first frame, a second frame, a power source, a drive unit, a drive control unit, a calculation unit, and a temperature information acquisition unit. The temperature information acquisition unit acquires information on temperature of the multiple filaments, the temperature changing with application of voltage. The calculation unit calculates an amount of thermal expansion of the multiple filaments based on the acquired information on temperature. The drive control unit causes the second frame to move apart from the first frame in accordance with the amount of thermal expansion calculated by the calculation unit.
    Type: Application
    Filed: August 19, 2019
    Publication date: October 21, 2021
    Applicant: KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.)
    Inventors: Tetsuya TAKAHASHI, Satoshi HIROTA, Rainer CREMER
  • Publication number: 20210324511
    Abstract: Provided is a hot filament CVD device capable of easily attaching, detaching, and replacing a filament. The hot filament CVD device includes a chamber, a base material support that supports multiple base materials, filament cartridges, and paired holding parts. The filament cartridges each include multiple filaments (60), a first frame, a second frame, and paired connecting members. The paired holding parts guide each of the filament cartridges when it is inserted into the chamber, and hold the filament cartridges in the chamber so that the filament cartridges face the multiple base materials.
    Type: Application
    Filed: August 19, 2019
    Publication date: October 21, 2021
    Applicant: KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.)
    Inventors: Tetsuya TAKAHASHI, Satoshi HIROTA, Rainer CREMER
  • Patent number: 9911576
    Abstract: In an ion bombardment apparatus of the present invention, a heating type thermal electron emission electrode formed by a filament is placed on one inner surface of a vacuum chamber, an anode for receiving a thermal electron from the thermal electron emission electrode is placed on another inner surface of the vacuum chamber, and a base material is placed between the thermal electron emission electrode and the anode. Further, the ion bombardment apparatus has a discharge power supply for generating a glow discharge upon application of a potential difference between the thermal electron emission electrode and the anode, a heating power supply for heating the thermal electron emission electrode so as to emit the thermal electron, and a bias power supply for applying negative pulse-shaped bias potential with respect to the vacuum chamber to the base material.
    Type: Grant
    Filed: November 1, 2012
    Date of Patent: March 6, 2018
    Assignee: Kobe Steel, Ltd.
    Inventors: Satoshi Hirota, Naoyuki Goto, Homare Nomura, Rainer Cremer
  • Patent number: 9812299
    Abstract: The invention relates to an apparatus and a method for pretreating and coating bodies by means of magnetron sputtering. In a vacuum chamber having a metallic chamber wall (26), magnetrons with sputter targets are arranged, at least one of which is an HPPMS magnetron to which electric pulses are fed by connecting a capacitive element (6) with the sputter target of the HPPMS magnetron via a switching element (5). To achieve effective pretreatment and coating of substrates it is provided according to a first aspect to arrange the switching element on the chamber wall. According to a second aspect, an electrode pair is provided, wherein a first electrode is an HPPMS magnetron (1) and the first and second electrodes are arranged in such a manner that a body (11) supported on a substrate table (4) is arranged between the active surfaces of the electrode pair or is moved through the space between the active surfaces of the electrode pair.
    Type: Grant
    Filed: April 28, 2009
    Date of Patent: November 7, 2017
    Assignee: CemeCon AG
    Inventors: Rainer Cremer, Walter May
  • Patent number: 8173278
    Abstract: A coated body and a process for producing a layer of hard material on a substrate are described. The body comprises a substrate (30) and a layer of hard material (36) which has been applied to the substrate (30) and at least partly covers the body. The layer of hard material comprises the metallic elements Al, Cr and Si and also nonmetallic elements selected from the group consisting of B, C, N, O. The atomic proportion of oxygen among the nonmetallic elements is greater than 30%. The layer of hard material is deposited on the substrate by means of magnetron atomization.
    Type: Grant
    Filed: April 20, 2007
    Date of Patent: May 8, 2012
    Assignee: CemeCon AG
    Inventor: Rainer Cremer
  • Publication number: 20110180389
    Abstract: The invention relates to an apparatus and a method for pretreating and coating bodies by means of magnetron sputtering. In a vacuum chamber having a metallic chamber wall (26), magnetrons with sputter targets are arranged, at least one of which is an HPPMS magnetron to which electric pulses are fed by connecting a capacitive element (6) with the sputter target of the HPPMS magnetron via a switching element (5). To achieve effective pretreatment and coating of substrates it is provided according to a first aspect to arrange the switching element on the chamber wall. According to a second aspect, an electrode pair is provided, wherein a first electrode is an HPPMS magnetron (1) and the first and second electrodes are arranged in such a manner that a body (11) supported on a substrate table (4) is arranged between the active surfaces of the electrode pair or is moved through the space between the active surfaces of the electrode pair.
    Type: Application
    Filed: April 28, 2009
    Publication date: July 28, 2011
    Inventors: Rainer Cremer, Walter May
  • Publication number: 20090252973
    Abstract: A coated body and a process for producing a layer of hard material on a substrate are described. The body comprises a substrate (30) and a layer of hard material (36) which has been applied to the substrate (30) and at least partly covers the body. The layer of hard material comprises the metallic elements Al, Cr and Si and also nonmetallic elements selected from the group consisting of B, C, N, O. The atomic proportion of oxygen among the nonmetallic elements is greater than 30%. The layer of hard material is deposited on the substrate by means of magnetron atomization.
    Type: Application
    Filed: April 20, 2007
    Publication date: October 8, 2009
    Applicant: CEMECON AG
    Inventor: Rainer Cremer