Patents by Inventor Rainer Käsmaier

Rainer Käsmaier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithography method and lithography mask
    Patent number: 6686098
    Abstract: Layers are patterned with a lithography method during the fabrication of integrated circuits. A mask, which may be reflective or transmissive, for carrying out the method. The photosensitive layers are exposed to radiation that is emitted by a radiation source. The radiation lies in the extreme ultraviolet region and is guided via the mask onto the photosensitive layers.
    Type: Grant
    Filed: December 4, 2000
    Date of Patent: February 3, 2004
    Assignee: Infineon Technologies AG
    Inventors: Günther Czech, Christoph Friedrich, Carsten Fülber, Rainer Käsmaier, Dietrich Widmann