Patents by Inventor Rainer Koeppler

Rainer Koeppler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7981824
    Abstract: The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass, doped with titanium and/or fluorine, which is distinguished by an extremely high homogeneity. The homogeneity relates to the following features: a) micro-inhomogeneities caused by a local variance of the TiO2 distribution (<0.05% TiO2, averaged over a volume element of (5 ?m)3 in relation to the mean value of the TiO2 content), b) an absolute maximum inhomogeneity in the thermal expansion coefficient ?? in the main functional direction (<5 ppb/K), c) a radial variance of the thermal expansion coefficient over the usable surface of the quartz glass blank of not more than 0.4 ppb/(K.cm); d) a maximum stress birefringence (SDB) at 633 nm in the main functional direction of 2 nm/cm with a specific progression; and e) a specific progression of the ??, averaged according to (b) on the optical surface.
    Type: Grant
    Filed: May 11, 2005
    Date of Patent: July 19, 2011
    Assignee: Heraeus Quarzglas GmbH & Co. KG
    Inventors: Wolfgang Englisch, Ralf Takke, Bodo Kuehn, Bruno Uebbing, Rainer Koeppler
  • Patent number: 7637126
    Abstract: The invention relates to a method for the economic production of a blank for a component made from laser-active quartz glass in any form or dimension. The method comprises the following method steps: a) preparation of a dispersion with a solids content of at least 40 wt. %, comprising SiO2 nanopowder and doping agents, including a cation of the rare earth metals and transition metals in a fluid, b) granulation by agitation of the dispersion, with removal of moisture to form a doped SiO2 granulate of spherical porous granular particles with a moisture content of less than 35 wt. % and a density of at least 0.95 g/cm3, c) drying and purification of the SiO2 granulate, by heating to a temperature of at least 1000° C. to form doped porous SiO2 grains with an OH content of less than 10 ppm and d) sintering or fusing the doped SiO2 grains in a reducing atmosphere to give the blank made from doped quartz glass.
    Type: Grant
    Filed: November 30, 2004
    Date of Patent: December 29, 2009
    Assignee: Heraeus Quarzglas GmbH & Co. KG
    Inventors: Rainer Koeppler, Bodo Kuehn, Waltraud Werdecker, Ulrich Kirst, Walter Lehmann
  • Publication number: 20080274869
    Abstract: The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass, doped with titanium and/or fluorine, which is distinguished by an extremely high homogeneity. The homogeneity relates to the following features: a) micro-inhomogeneities caused by a local variance of the TiO2 distribution (<0.05% TiO2, averaged over a volume element of (5 ?m)3 in relation to the mean value of the TiO2 content), b) an absolute maximum inhomogeneity in the thermal expansion coefficient ?? in the main functional direction (<5 ppb/K), c) a radial variance of the thermal expansion coefficient over the usable surface of the quartz glass blank of not more than 0.4 ppb/(K·cm); d) a maximum stress birefringence (SDB) at 633 nm in the main functional direction of 2 nm/cm with a specific progression; and e) a specific progression of the ??, averaged according to (b) on the optical surface.
    Type: Application
    Filed: May 11, 2005
    Publication date: November 6, 2008
    Applicant: Heraeus Quarzglas GmbH & Co. KG
    Inventors: Wolfgang Englisch, Ralf Takke, Bodo Kuehn, Bruno Uebbing, Rainer Koeppler
  • Publication number: 20070145332
    Abstract: The invention relates to a method for the economic production of a blank for a component made from laser-active quartz glass in any form or dimension. The method comprises the following method steps: a) preparation of a dispersion with a solids content of at least 40 wt. %, comprising SiO2 nanopowder and doping agents, including a cation of the rare earth metals and transition metals in a fluid, b) granulation by agitation of the dispersion, with removal of moisture to form a doped SiO2 granulate of spherical porous granular particles with a moisture content of less than 35 wt. % and a density of at least 0.95 g/cm3, c) drying and purification of the SiO2 granulate, by heating to a temperature of at least 1000° C. to form doped porous SiO2 grains with an OH content of less than 10 ppm and d) sintering or fusing the doped SiO2 grains in a reducing atmosphere to give the blank made from doped quartz glass.
    Type: Application
    Filed: November 30, 2004
    Publication date: June 28, 2007
    Applicant: Heraeus Quarzglas GmbH & Co. KG
    Inventors: Rainer Koeppler, Bodo Kuehn, Waltraud Werdecker, Ulrich Kirst, Walter Lehmann
  • Patent number: 6849242
    Abstract: The granule consists of individual granules approximately spherical in shape, having a pore volume of 0.5 cm3, a mean diameter of pores of 50 nm or less, a specific surface area of 100 m2/g or less, and a bulk density of 0.7 g/cm3 or higher. It is produced by dispersing a fumed silica obtained by hydrolysis of a silicon compound into pure water to obtain a slurry, and drying the slurry. The granule is used for producing high purity synthetic quartz glass powder. The method further comprises: a first heat treatment under an oxygen-containing atmosphere, a second heat treatment in a temperature range of from 600 to 1100° C., and a third heat treatment in a temperature range of from 1100 to 1300° C. under an atmosphere containing hydrogen chloride; and a step of densification comprising calcining the product at a temperature not higher than 1500° C. under vacuum or in an atmosphere of gaseous hydrogen or gaseous helium.
    Type: Grant
    Filed: September 28, 2000
    Date of Patent: February 1, 2005
    Assignees: Heraeus Quarzglas GmbH & Co. KG, Shin-Etsu Quartz Products Co., Ltd.
    Inventors: Rainer Koeppler, Fritz-Ulrich Kreis, Klaus Arnold, Hiroshi Matsui, Kasumi Hoshikawa, Tsukasa Sakaguchi
  • Patent number: 6660671
    Abstract: Composite material with high resistance to temperature changes and a high density, and having an SiO2-containing matrix with quartz glass grains embedded therein is produced by preparing a suspension from a particle mixture of finely divided SiO2 powder having at least two different particle fractions and of the quartz glass grains, forming a green compact and sintering the compact. The matrix has an SiO2 content of at least 99% by wt. and is formed from at least first and second particle fractions, each of which is present as granules of nanoscale, amorphous, synthetically produced SiO2 primary particles having a mean primary particle size of less than 100 nm. The composite material has an SiO2-containing matrix with an SiO2 content of at least 99% by wt. It is particularly suited for applications such as starting material for producing a permanent mold for melting solar silicon.
    Type: Grant
    Filed: March 21, 2002
    Date of Patent: December 9, 2003
    Assignee: Heraeus Quarzglas GmbH & Co. KG.
    Inventors: Waltraud Werdecker, Udo Gertig, Johann Leist, Rainer Koeppler
  • Publication number: 20030119648
    Abstract: Known is a method of producing a composite material having an SiO2-containing matrix in which quartz glass grains are embedded, wherein a suspension is prepared from a particle mixture of finely divided SiO2 powder having at least two different particle fractions and of the quartz glass grains, a green compact is formed therefrom and said compact is sintered. To permit an inexpensive production of a composite material having a high resistance to temperature changes together with a high density, it is suggested according to the invention that the matrix should have an SiO2 content of at least 99% by wt. and should be formed from at least a first (33) and a second (35) particle fraction, each of the particle fractions being present as granules of nanoscale, amorphous, synthetically produced SiO2 primary particles (2) having a mean primary particle size of less than 100 nm.
    Type: Application
    Filed: March 21, 2002
    Publication date: June 26, 2003
    Inventors: Waltraud Werdecker, Udo Gertig, Johann Leist, Rainer Koeppler