Patents by Inventor Raisa Kharbash
Raisa Kharbash has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11435664Abstract: Provided is a photopolymer composition for hologram recording comprising: a polymer matrix or a precursor thereof; a dye including a compound of the following Chemical Formula 1; a photoreactive monomer; and a photoinitiator,Type: GrantFiled: December 13, 2019Date of Patent: September 6, 2022Assignees: LG Chem, Ltd., Korea Advanced Institute of Science and TechnologyInventors: Heon Kim, Yoosik Kim, Raisa Kharbash, Se Hyun Kwon, Yeongrae Chang, Seokhoon Jang
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Patent number: 11084933Abstract: The present invention relates to a compound having a novel structure, a photopolymer composition including the compound as a dye, a hologram recording medium produced from the photopolymer composition, an optical element including the hologram recording medium, and a holographic recording method using the hologram recording medium.Type: GrantFiled: December 7, 2018Date of Patent: August 10, 2021Assignees: LG CHEM, LTD., KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Heon Kim, Yoosik Kim, Raisa Kharbash, Se Hyun Kwon, Yeongrae Chang, Seokhoon Jang
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Publication number: 20210026239Abstract: Provided is a photopolymer composition for hologram recording comprising: a polymer matrix or a precursor thereof; a dye including a compound of the following Chemical Formula 1; a photoreactive monomer; and a photoinitiator,Type: ApplicationFiled: December 13, 2019Publication date: January 28, 2021Inventors: Heon KIM, Yoosik KIM, Raisa KHARBASH, Se Hyun KWON, Yeongrae CHANG, Seokhoon JANG
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Publication number: 20210024981Abstract: The merocyanine compound of the present invention causes a spectral change of a hypochromic shift in the vicinity of the wavelength of 512 nm by intercalation between dsRNA nucleotide pairs, and the spectral change shows high accuracy and reproducibility, so the merocyanine compound of the present invention can be effectively used for detecting dsRNA and comparing the expression levels between samples. In addition, the present invention relates to a method for providing information for the diagnosis of cancer comprising the steps of 1) measuring the expression level of dsRNA in a sample of a test subject; and 2) comparing the expression level of dsRNA measured in step 1) with that of the normal control group, and a composition for detecting dsRNA comprising a merocyanine compound, a salt thereof or an isomer thereof.Type: ApplicationFiled: April 19, 2019Publication date: January 28, 2021Inventors: Yoosik KIM, Raisa KHARBASH, Ahsan Ausaf ALI, Minjeong KANG
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Publication number: 20210003919Abstract: The present disclosure relates to a photopolymer composition, and more particularly, to a compound having a novel structure, a photopolymer composition including the compound as a dye, a hologram recording medium produced from the photopolymer composition, an optical element including the hologram recording medium, and a holographic recording method using the photopolymer composition.Type: ApplicationFiled: April 29, 2019Publication date: January 7, 2021Applicants: LG CHEM, LTD., KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Heon KIM, Yoosik KIM, Raisa KHARBASH, Se Hyun KWON, Yeongrae CHANG, Seokhoon JANG
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Publication number: 20200263038Abstract: The present invention relates to a compound having a novel structure, a photopolymer composition including the compound as a dye, a hologram recording medium produced from the photopolymer composition, an optical element including the hologram recording medium, and a holographic recording method using the hologram recording medium.Type: ApplicationFiled: December 7, 2018Publication date: August 20, 2020Applicants: LG CHEM, LTD., KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Heon KIM, Yoosik KIM, Raisa KHARBASH, Se Hyun KWON, Yeongrae CHANG, Seokhoon JANG
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Patent number: 8883398Abstract: The present application relates to a photoactive compound including an oxime ester group and a phosphonate group together, and a photosensitive resin composition comprising the same, the compound of the present application having excellent storage stability and high-temperature process characteristics.Type: GrantFiled: May 22, 2013Date of Patent: November 11, 2014Assignee: LG Chem, Ltd.Inventors: Changho Cho, Sunghyun Kim, Han Soo Kim, Sunhwa Kim, Raisa Kharbash, Jongho Park
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Patent number: 8871430Abstract: The present invention relates to a photoactive compound having a novel structure and a photosensitive resin composition including the same, and the photoactive compound according to the present invention has excellent sensitivity due to efficient absorption to a UV light source by including a nitro group and a phosphonate structure, and has excellent retention rate, mechanical strength, heat resistance, chemical resistance and developing resistance by improving solubility of the photosensitive resin composition by excellent compatibility of the phosphonate structure and a binder resin. Therefore, the photosensitive resin composition according to the present invention is useful to cure a column spacer, an overcoat, a passivation material and the like of a liquid crystal display device, and is useful in view of a high temperature process property.Type: GrantFiled: May 14, 2012Date of Patent: October 28, 2014Assignee: LG Chem, Ltd.Inventors: Changho Cho, Won Jin Chung, Raisa Kharbash, Sunghyun Kim, Dongchang Choi, Sang Chul Lee, Han Soo Kim, Yoon Hee Heo, Sunhwa Kim
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Publication number: 20140234774Abstract: The present application relates to a photoactive compound including an oxime ester group and a phosphonate group together, and a photosensitive resin composition comprising the same, the compound of the present application having excellent storage stability and high-temperature process characteristics.Type: ApplicationFiled: May 22, 2013Publication date: August 21, 2014Inventors: Changho Cho, Sunghyun Kim, Han Soo Kim, Sunhwa Kim, Raisa Kharbash, Jongho Park
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Publication number: 20140220491Abstract: The present invention relates to a photoactive compound having a novel structure and a photosensitive resin composition including the same, and the photoactive compound according to the present invention has excellent sensitivity due to efficient absorption to a UV light source by including a nitro group and a phosphonate structure, and has excellent retention rate, mechanical strength, heat resistance, chemical resistance and developing resistance by improving solubility of the photosensitive resin composition by excellent compatibility of the phosphonate structure and a binder resin. Therefore, the photosensitive resin composition according to the present invention is useful to cure a column spacer, an overcoat, a passivation material and the like of a liquid crystal display device, and is useful in view of a high temperature process property.Type: ApplicationFiled: May 14, 2012Publication date: August 7, 2014Applicant: LG CHEM, LTD.Inventors: Changho Cho, Won Jin Chung, Raisa Kharbash, Sunghyun Kim, Dongchang Choi, Sang Chul Lee, Han Soo Kim, Yoon Hee Heo, Sunhwa Kim
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Patent number: 8252507Abstract: A novel photoactive compound is provided. The photoactive compound has a structure represented by Formula 1: wherein R1, R2, R3, A, X, Y, n and m are as defined in the specification. The photoactive compound efficiently absorbs UV light. Accordingly, the photoactive compound has an improved ability to generate radicals and is efficiently photopolymerized with unsaturated bonds. Further provided is a photosensitive resin composition comprising the photoactive compound. The photosensitive resin composition has good sensitivity because it efficiently absorbs UV light. In addition, the photosensitive resin composition has excellent characteristics in terms of residual film ratio, mechanical strength and resistance to heat, chemicals and development. Therefore, the photosensitive resin composition is advantageously used in curing materials for column spacers, overcoats and passivation films of liquid crystal display devices.Type: GrantFiled: April 1, 2009Date of Patent: August 28, 2012Assignee: LG Chem, Ltd.Inventors: Chang Ho Cho, Sung Hyun Kim, Raisa Kharbash, Keon Woo Lee, Sang Kyu Kwak, Dong Kung Oh, Chang Soon Lee, Kyoung Hoon Min
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Patent number: 8198462Abstract: The present invention relates to a dendritic photoactive compound that comprises oxime ester and a method for producing the same. Since the compound according to the present invention comprises two or more oxime ester groups and chromophores in one molecule at the same time, the solubility in respects to the organic solvent and the efficiency for producing a radical by absorbing ultraviolet rays are excellent. In addition, it can act as an effective initiator in respects to the photopolymerization of the unsaturated group, in particular, the acryl compound.Type: GrantFiled: July 15, 2008Date of Patent: June 12, 2012Assignee: LG Chem, Ltd.Inventors: Keon-Woo Lee, Chang-Ho Cho, Kyoung-Hoon Min, Raisa Kharbash, Chang-Soon Lee, Sung-Hyun Kim
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Patent number: 8182979Abstract: A photopolymerization initiator is provided. The photopolymerization initiator contains at least one unsaturated double bond and at least one oxime ester group in the molecule. The photopolymerization initiator comprises a compound represented by Formula 1 or 2: wherein R1 and R2 are each independently —CH3, —C2H5, —C3H7 or —C6H5; wherein R3, R4 and R5 are each independently —CH3, —C2H5, —C3H7 or —C6H5. Further provided is a photosensitive resin composition comprising the photopolymerization initiator. The use of the photosensitive resin composition in photolithography reduces the formation of volatile residue during post-development baking.Type: GrantFiled: October 30, 2009Date of Patent: May 22, 2012Assignee: LG Chem, Ltd.Inventors: Keon Woo Lee, Raisa Kharbash, Chang Ho Cho, Sung Hyun Kim, Sang Kyu Kwak, Dong Kung Oh, Chang Soon Lee
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Patent number: 8168369Abstract: The present invention relates to a photoactive compound of a novel structure represented by Chemical Formula 1 below In Chemical Formula 1, R1 and R2, R3, and A are as defined in the specification, and a photosensitive resin composition comprising the same. The photoactive compound of the present invention comprises a nitro group and a phosphonate structure and thus exhibits excellent sensitivity through efficient absorption for UV light, excellent compatibility between the photoactive compound and the alkali-soluble binder resin, and an improved solubility of the photosensitive resin composition. Furthermore, the photosensitive resin composition of the present invention has excellent residual film thickness and mechanical strength characteristics and heat-resistant, chemical-resistant, and development-resistant properties.Type: GrantFiled: February 12, 2010Date of Patent: May 1, 2012Assignee: LG Chem, Ltd.Inventors: Chang Ho Cho, Sung Hyun Kim, Raisa Kharbash, Keon Woo Lee, Dong Kung Oh, Won Jin Chung, Sang Kyu Kwak, Chang Soon Lee
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Publication number: 20110318692Abstract: The present invention relates to a photoactive compound of a novel structure represented by Chemical Formula 1 below In Chemical Formula 1, R1 and R2, R3, and A are as defined in the specification, and a photosensitive resin composition comprising the same. The photoactive compound of the present invention comprises a nitro group and a phosphonate structure and thus exhibits excellent sensitivity through efficient absorption for UV light, excellent compatibility between the photoactive compound and the alkali-soluble binder resin, and an improved solubility of the photosensitive resin composition. Furthermore, the photosensitive resin composition of the present invention has excellent residual film thickness and mechanical strength characteristics and heat-resistant, chemical-resistant, and development-resistant properties.Type: ApplicationFiled: February 12, 2010Publication date: December 29, 2011Applicant: LG CHEM, LTD.Inventors: Chang Ho Cho, Sung Hyun Kim, Raisa Kharbash, Keon Woo Lee, Dong Kung Oh, Won Jin Cung, Sang Kyu Kwak, Chang Soon Lee
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Publication number: 20100261815Abstract: A novel photoactive compound is provided. The photoactive compound has a structure represented by Formula 1: wherein R1, R2, R3, A, X, Y, n and m are as defined in the specification. The photoactive compound efficiently absorbs UV light. Accordingly, the photoactive compound has an improved ability to generate radicals and is efficiently photopolymerized with unsaturated bonds. Further provided is a photosensitive resin composition comprising the photoactive compound. The photosensitive resin composition has good sensitivity because it efficiently absorbs UV light. In addition, the photosensitive resin composition has excellent characteristics in terms of residual film ratio, mechanical strength and resistance to heat, chemicals and development. Therefore, the photosensitive resin composition is advantageously used in curing materials for column spacers, overcoats and passivation films of liquid crystal display devices.Type: ApplicationFiled: April 1, 2009Publication date: October 14, 2010Inventors: Chang Ho Cho, Sung-Hyun Kim, Raisa Kharbash, Keon Woo Lee, Sang Kyu Kwak, Dong Kung Oh, Chang Soon Lee, Kyoung Hoon Min
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Publication number: 20100145068Abstract: The present invention relates to a dendritic photoactive compound that comprises oxime ester and a method for producing the same. Since the compound according to the present invention comprises two or more oxime ester groups and chromophores in one molecule at the same time, the solubility in respects to the organic solvent and the efficiency for producing a radical by absorbing ultraviolet rays are excellent.Type: ApplicationFiled: July 15, 2008Publication date: June 10, 2010Inventors: Keon-Woo Lee, Chang-Ho Cho, Kyoung-Hoon Min, Raisa Kharbash, Chang-Soon Lee, Sung-Hyun Kim
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Publication number: 20100112479Abstract: A photopolymerization initiator is provided. The photopolymerization initiator contains at least one unsaturated double bond and at least one oxime ester group in the molecule. The photopolymerization initiator comprises a compound represented by Formula 1 or 2: wherein R1 and R2 are each independently —CH3, —C2H5, —C3H7 or —C6H5; wherein R3, R4 and R5 are each independently —CH3, —C2H5, —C3H7 or —C6H5. Further provided is a photosensitive resin composition comprising the photopolymerization initiator. The use of the photosensitive resin composition in photolithography reduces the formation of volatile residue during post-development baking.Type: ApplicationFiled: October 30, 2009Publication date: May 6, 2010Inventors: Keon Woo Lee, Raisa Kharbash, Chang Ho Cho, Sung Hyun Kim, Sang Kyu Kwak, Dong Kung Oh, Chang Soon Lee
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Patent number: 7449574Abstract: The present invention relates to a triazine based photoactive compound containing an oxime ester group. The compound according to the present invention is a photoactive compound containing both an oxime ester group and a triazine group in one molecule, has excellent radical-generating efficiency due to effective absorption of UV radiation, particularly i-line (365 nm) radiation and can function as an effective initiator for photopolymerization of various compounds containing unsaturated groups, particularly an acryl compound.Type: GrantFiled: November 6, 2006Date of Patent: November 11, 2008Assignee: LG Chem, Ltd.Inventors: Sung Hyun Kim, Jeong Ae Yoon, Raisa Kharbash, Han Soo Kim, Xiang Li Li, Min Young Lim, Chang Ho Cho
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Publication number: 20070106075Abstract: The present invention relates to a triazine based photoactive compound containing an oxime ester group. The compound according to the present invention is a photoactive compound containing both an oxime ester group and a triazine group in one molecule, has excellent radical-generating efficiency due to effective absorption of UV radiation, particularly i-line (365 nm) radiation and can function as an effective initiator for photopolymerization of various compounds containing unsaturated groups, particularly an acryl compound.Type: ApplicationFiled: November 6, 2006Publication date: May 10, 2007Inventors: Sung Kim, Jeong Yoon, Raisa Kharbash, Han Kim, Xiang Li, Min Lim, Chang Cho