Abstract: A panel platen for holding substrates such as PCBs has an automatic shimming mechanism to provide shims for panels of varying sizes and/or thicknesses. A platen includes a top surface, and a plurality of adjustable shims located below the top surface and around an edge of the platen, wherein the adjustable shims can be raised and lowered to a desired height to compensate for different sizes or thicknesses of substrates. A platen may include a top surface, a plurality of adjustable height pads located around an edge of the top surface, and a motorized control mechanism located below the top surface and configured to raise and lower the plurality of adjustable height pads. A method of automatically shimming different sized substrates on a platen includes providing a plurality of motorized shims under a top surface of the platen, and raising and lowering the motorized shims based on a size or thickness of a substrate.

Abstract: A substrate holding platen has a top surface having a plurality of openings, an enclosed plenum area below the top surface, and a large orifice valve connecting the plenum area to a high flow vacuum pump. The plurality of openings may include snubber slots on the top surface, and/or openings for automatic shims. The high flow vacuum pump preferably pulls between 100-150 cubic feet per minute (cfm) of air from the plenum through the large orifice valve.

Abstract: A flash lamp exposure system for exposing a substrate to ultraviolet radiation. The system includes at least one flash lamp, each of which includes: at least one lamp for emitting ultraviolet radiation in response to a voltage; at least one first reflector, each first reflector being adapted to reflect the ultraviolet radiation toward the substrate; a second reflector surrounding a path of the ultraviolet radiation from the at least one lamp to the substrate, the second reflector being adapted to reflect first rays of the ultraviolet radiation toward the substrate; and a third reflector disposed closer to the substrate than the secondary reflector and surrounding the path of the ultraviolet radiation from the at least one lamp to the substrate, the third reflector being adapted to reflect second rays of the ultraviolet radiation toward the substrate.