Patents by Inventor Rajat Subhra Basu

Rajat Subhra Basu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • AZEOTROPE-LIKE COMPOSITION OF PF5 AND HF
    Publication number: 20120003138
    Abstract: Provided are azeotropic and azeotrope-like compositions of PF5 and HF, and methods of making such compositions. Such azeotropic and azeotrope-like compositions can be used, for example, in processes for producing LiPF6.
    Type: Application
    Filed: April 29, 2011
    Publication date: January 5, 2012
    Applicant: HONEYWELL INTERNATIONAL INC.
    Inventors: Ryan J. Hulse, Rajat Subhra Basu, Matthew H. Luly
  • Multiple solvent cleaning system
    Patent number: 6355113
    Abstract: A non-aqueous cleaning process uses an organic solvent for removing soil or surface contamination from contaminated articles such as printed circuit boards which are cleaned by immersion into a sump compartment of a cleaning tank containing the organic cleaning solvent. The organic solvent is preferably a hydrocarbon solvent. The cleaned articles, now coated with the organic cleaning solvent, are then disposed in a rinsing sump containing a fluorocarbon based rinsing solvent having an affinity for the organic cleaning solvent. The organic solvent is thus removed from the articles which are then dried without waste water as in a conventional solvent vapor degreasing solvent process.
    Type: Grant
    Filed: November 6, 1998
    Date of Patent: March 12, 2002
    Assignee: 3M Innovative Properties Company
    Inventors: David Nalewajek, Rajat Subhra Basu, David Paul Wilson, Michael Van Der Puy, Ellen Louise Swan, Peter Brian Logsdon, Gary J. Zyhowski, Hepburn Ingham, Daniel Franklin Harnish, Joel Edward Rodgers
  • Process for separating difluoromethane
    Patent number: 5785822
    Abstract: The present invention provides a method for separating dichlorodifluoromethane from difluoromethane. More specifically, a process is provided for separating dichlorodifluoromethane and difluoromethane using azeotropic distillation.
    Type: Grant
    Filed: May 23, 1996
    Date of Patent: July 28, 1998
    Assignee: AlliedSignal Inc.
    Inventors: Gustavo Cerri, Kin Ching Kong, Charles Francis Swain, Rajat Subhra Basu
  • Hydrofluoroalkanes as cleaning and degreasing solvents
    Patent number: 5696307
    Abstract: Hydrofluoroalkanes useful as solvents, especially for vapor degreasing and solvent cleaning, are one or many of the following formulae:CHF.sub.2 --X--(CHF).sub.n --X--Ywherein X is selected from the group consisting of CHF, CF.sub.2 and CH.sub.2, Y is CH.sub.3, and n is 0, 1 or 2.
    Type: Grant
    Filed: January 21, 1994
    Date of Patent: December 9, 1997
    Assignee: AlliedSignal Inc.
    Inventors: Michael Van Der Puy, Rajat Subhra Basu, David Nalewajek, Lois A. Ellis