Patents by Inventor Rajeev Tirumala Pakalapati

Rajeev Tirumala Pakalapati has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240158950
    Abstract: According to the present disclosure, techniques related to processing of materials for growth of crystals are provided. More particularly, the present disclosure provides apparatus and methods for heating of seed crystals suitable for use in conjunction with a high-pressure vessel for crystal growth of a material having a retrograde solubility in a supercritical fluid, including crystal growth of a group III metal nitride crystal by an ammonobasic or ammonoacidic technique, but there can be others. In other embodiments, the present disclosure provides methods suitable for synthesis of crystalline nitride materials, but it would be recognized that other crystals and materials can also be processed. Such crystals and materials include, but are not limited to, GaN, AlN, InN, InGaN, AlGaN, and AlInGaN, and others for manufacture of bulk or patterned substrates.
    Type: Application
    Filed: November 9, 2023
    Publication date: May 16, 2024
    Inventors: Paul M. VON DOLLEN, Drew W. CARDWELL, Mark P. D'EVELYN, Rajeev Tirumala PAKALAPATI
  • Publication number: 20230110306
    Abstract: Embodiments of the disclosure an apparatus for solvothermal crystal growth, comprising: a pressure vessel having a cylindrical shape and a vertical orientation; a cylindrical heater having an upper zone and a lower zone that can be independently controlled; at least one end heater; and an inward-facing surface of a baffle placed within 100 millimeters of a bottom end or top end surface of the growth chamber. The end heater is configured to enable: a variation in the temperature distribution along a first surface to be less than about 10° C., and a variation in the temperature distribution along a second surface to be less than about 20° C., during a crystal growth process.
    Type: Application
    Filed: October 10, 2022
    Publication date: April 13, 2023
    Inventors: Mark P. D'EVELYN, Paul M. VON DOLLEN, Rajeev Tirumala PAKALAPATI, Keiji FUKUTOMI, Maimi MONZEN, Koji MIYAMOTO, Motoi TAMAKI
  • Patent number: 10293318
    Abstract: A pressure release mechanism for use with a capsule for processing materials or growing crystals in supercritical fluids is disclosed. The capsule with the pressure release mechanism is scalable up to very large volumes and is cost effective according to a preferred embodiment. In conjunction with suitable high pressure apparatus, the capsule with pressure release mechanism is capable of processing materials at pressures and temperatures of 20-2000 MPa and 25-1500° C., respectively. Of course, there can be other variations, modifications, and alternatives.
    Type: Grant
    Filed: September 19, 2016
    Date of Patent: May 21, 2019
    Assignee: SLT TECHNOLOGIES, INC.
    Inventors: Mark Philip D'Evelyn, Rajeev Tirumala Pakalapati
  • Patent number: 10174438
    Abstract: An apparatus for processing material at elevated pressure, the apparatus comprising: (a) two or more radial restraint structures defining an interior region configured to receive a processing chamber, the radial restraint structures being configured to resist an outward radial force from the interior region; (b) upper and lower crown members being disposed axially on either end of the interior region and configured to resist an outward axial force from the interior region; (c) a first axial restraint structure coupling the upper crown member and the lower crown member to provide axial restraint of the upper crown member and the lower crown; and (d) a second axial restraint structure compressing the two or more radial restraint structures to provide an axial restraint of the two or more radial restraint structures.
    Type: Grant
    Filed: March 30, 2017
    Date of Patent: January 8, 2019
    Assignee: SLT TECHNOLOGIES, INC.
    Inventors: Rajeev Tirumala Pakalapati, Mark P. D'Evelyn
  • Publication number: 20180282897
    Abstract: An apparatus for processing material at elevated pressure, the apparatus comprising: (a) two or more radial restraint structures defining an interior region configured to receive a processing chamber, the radial restraint structures being configured to resist an outward radial force from the interior region; (b) upper and lower crown members being disposed axially on either end of the interior region and configured to resist an outward axial force from the interior region; (c) a first axial restraint structure coupling the upper crown member and the lower crown member to provide axial restraint of the upper crown member and the lower crown; and (d) a second axial restraint structure compressing the two or more radial restraint structures to provide an axial restraint of the two or more radial restraint structures.
    Type: Application
    Filed: March 30, 2017
    Publication date: October 4, 2018
    Inventors: Rajeev Tirumala Pakalapati, Mark P. D'Evelyn
  • Publication number: 20170081779
    Abstract: A pressure release mechanism for use with a capsule for processing materials or growing crystals in supercritical fluids is disclosed. The capsule with the pressure release mechanism is scalable up to very large volumes and is cost effective according to a preferred embodiment. In conjunction with suitable high pressure apparatus, the capsule with pressure release mechanism is capable of processing materials at pressures and temperatures of 20-2000 MPa and 25-1500° C., respectively. Of course, there can be other variations, modifications, and alternatives.
    Type: Application
    Filed: September 19, 2016
    Publication date: March 23, 2017
    Inventors: MARK PHILIP D'EVELYN, RAJEEV TIRUMALA PAKALAPATI
  • Publication number: 20110209414
    Abstract: A sintered cubic boron nitride (cBN) compact for use in a tool is obtained by sintering a mixture of (i) cubic boron nitride, (ii) aluminum oxide, (iii) one or more refractory metal compounds, and (iv) aluminum and/or one or more non-oxide aluminum compounds. The sintered bodies may have sufficient strength and toughness to be used as a tool material in solid, i.e. not carbide supported, form, and may be useful in heavy machining of cast irons.
    Type: Application
    Filed: April 25, 2011
    Publication date: September 1, 2011
    Applicant: DIAMOND INNOVATIONS, INC.
    Inventors: Rajeev Tirumala Pakalapati, James Michael McHale, JR.
  • Patent number: 7932199
    Abstract: A sintered cubic boron nitride (cBN) compact for use in a tool is obtained by sintering a mixture of (i) cubic boron nitride, (ii) aluminum oxide, (iii) one or more refractory metal compounds, and (iv) aluminum and/or one or more non-oxide aluminum compounds. The sintered bodies may have sufficient strength and toughness to be used as a tool material in solid, i.e. not carbide supported, form, and may be useful in heavy machining of cast irons.
    Type: Grant
    Filed: February 18, 2005
    Date of Patent: April 26, 2011
    Assignee: Diamond Innovations, Inc.
    Inventors: James Michael McHale, Jr., Rajeev Tirumala Pakalapati