Patents by Inventor Rajesh Raja Puthenkovilakom

Rajesh Raja Puthenkovilakom has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8741989
    Abstract: This invention relates to a composition suitable for use in making moisture resistant gypsum products. In particular, this invention relates to resin dispersions and their use in combination with gypsum to form moisture resistant gypsum compositions which are settable by hydration. Further, the invention relates to moisture resistant products formed from such settable gypsum compositions, e.g. panels and boards, and a method for the manufacture of such moisture resistant gypsum products.
    Type: Grant
    Filed: February 15, 2011
    Date of Patent: June 3, 2014
    Assignee: Eastman Chemical Company
    Inventors: Laura Lee Martin, Andrea Gail Hagood, Carol Ann Perkins, Rajesh Raja Puthenkovilakom
  • Patent number: 8053515
    Abstract: A polymer includes a first type of repeat unit represented by Formula I: where X is selected from —CH2—, —CH2—CH2—, or —O—; m is an integer from 0 to about 5; and where for the first type of repeat unit one of R1, R2, R3, and R4 is one of a maleimide containing group and for the second type of repeat unit one of R1, R2, R3, and R4 is a hindered aromatic group, a C8 or greater alkyl group, a C4 or greater halohydrocarbyl or perhalocarbyl group, a C7 or greater aralkyl group, or a heteroatom hydrocarbyl or halohydrocarbyl group.
    Type: Grant
    Filed: December 3, 2007
    Date of Patent: November 8, 2011
    Assignee: Promerus LLC
    Inventors: Edmund Elce, Andrew Bell, Brian Knapp, Hendra Ng, Larry F. Rhodes, Robert Shick, Wei Zhang, William DiMenna, Saikumar Jayaraman, Jianyong Jin, Rajesh Raja Puthenkovilakom, Ramakrishna Ravikiran, Xiaoming Wu, Etsu Takeuchi
  • Publication number: 20110136945
    Abstract: This invention relates to a composition suitable for use in making moisture resistant gypsum products. In particular, this invention relates to resin dispersions and their use in combination with gypsum to form moisture resistant gypsum compositions which are settable by hydration. Further, the invention relates to moisture resistant products formed from such settable gypsum compositions, e.g. panels and boards, and a method for the manufacture of such moisture resistant gypsum products.
    Type: Application
    Filed: February 15, 2011
    Publication date: June 9, 2011
    Applicant: Eastman Chemical Company
    Inventors: Laura Lee Martin, Andrea Gail Hagood, Carol Ann Perkins, Rajesh Raja Puthenkovilakom
  • Patent number: 7897660
    Abstract: This invention relates to a composition suitable for use in making moisture resistant gypsum products. In particular, this invention relates to resin dispersions and their use in combination with gypsum to form moisture resistant gypsum compositions which are settable by hydration. Further, the invention relates to moisture resistant products formed from such settable gypsum compositions, e.g. panels and boards, and a method for the manufacture of such moisture resistant gypsum products.
    Type: Grant
    Filed: October 28, 2008
    Date of Patent: March 1, 2011
    Assignee: Eastman Chemical Company
    Inventors: Laura Lee Martin, Andrea Gail Hagood, Carol Ann Perkins, Rajesh Raja Puthenkovilakom
  • Patent number: 7875686
    Abstract: Polymeric compositions for semiconductor applications comprising 10 to 99 wt. % of norbornene-type cycloolefin monomers represented by one or more of Formula I(a), I(b), and optionally I(c) and/or I(d), 0.0005 to 0.5 wt. % of an addition polymerization procatalyst, and optionally: up to 0.5 wt. % of a cocatalyst, up to 59 wt. % of a crosslinking monomer, up to 50 wt. % of a viscosifier, up to 20 wt. % of a thixotropic additive(s), up to 80 wt. % of a filler, up to 10 wt. % of an antioxidant, and up to 0.6 wt. % of an antioxidant synergist, the total of the components of the formulation adding up to 100%. Such formulations are mass polymerized, or cured, to form polymeric compositions that have properties desirable for a variety of specific electronic, microelectronic, optoelectronic and micro-optoelectronic applications such as die attach adhesives, underfill materials, prepreg binders, encapsulants, protective layers, and other related applications.
    Type: Grant
    Filed: August 16, 2005
    Date of Patent: January 25, 2011
    Assignee: Promerus LLC
    Inventors: Ramakrisha Ravikiran, Hendra Ng, Rajesh Raja Puthenkovilakom, Linda Zhang, Dino Amoroso, Brian Knapp, Andrew Bell, Larry F. Rhodes
  • Patent number: 7858721
    Abstract: Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to devices, such as electrical, electronic and optoelectronic devices, that encompass such films.
    Type: Grant
    Filed: April 27, 2009
    Date of Patent: December 28, 2010
    Assignee: Promerus LLC
    Inventors: Dino Amoroso, Brian Bedwell, Andrew Bell, Edmund Elce, Rajesh Raja Puthenkovilakom, Ramakrishna Ravikiran, Robert Shick, Xiaoming Wu, Hiroaki Makabe, Yasunori Takahashi, Etsu Takeuchi, Daoji Gan, Seok Ho Kang
  • Publication number: 20090215976
    Abstract: Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to devices, such as electrical, electronic and optoelectronic devices, that encompass such films.
    Type: Application
    Filed: April 27, 2009
    Publication date: August 27, 2009
    Inventors: Dino Amoroso, Brian Bedwell, Andrew Bell, Edmund Elce, Rajesh Raja Puthenkovilakom, Ramakrishna Ravikiran, Robert Shick, Xiaoming Wu, Hiroaki Makabe, Yasunori Takahashi, Daoji Gan, Etsu Takeuchi, Seok Ho Kang
  • Publication number: 20090110946
    Abstract: This invention relates to a composition suitable for use in making moisture resistant gypsum products. In particular, this invention relates to resin dispersions and their use in combination with gypsum to form moisture resistant gypsum compositions which are settable by hydration. Further, the invention relates to moisture resistant products formed from such settable gypsum compositions, e.g. panels and boards, and a method for the manufacture of such moisture resistant gypsum products.
    Type: Application
    Filed: October 28, 2008
    Publication date: April 30, 2009
    Applicant: EASTMAN CHEMICAL COMPANY
    Inventors: Laura Lee Martin, Andrea Gail Hagood, Carol Ann Perkins, Rajesh Raja Puthenkovilakom
  • Patent number: 7524594
    Abstract: Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to devices, such as electrical, electronic and optoelectronic devices, that encompass such films.
    Type: Grant
    Filed: July 1, 2005
    Date of Patent: April 28, 2009
    Assignee: Promerus LLC
    Inventors: Dino Amoroso, Brian Bedwell, Andrew Bell, Edmund Elce, Rajesh Raja Puthenkovilakom, Ramakrishna Ravikiran, Robert Shick, Xiaoming Wu, Hiroaki Makabe, Yasunori Takahashi, Etsu Takeuchi, Daoji Gan, Seok Ho Kang
  • Publication number: 20080194740
    Abstract: A polymer includes a first type of repeat unit represented by Formula I: where X is selected from —CH2—, —CH2—CH2—, or —O—; m is an integer from 0 to about 5; and where for the first type of repeat unit one of R1, R2, R3, and R4 is one of a maleimide containing group and for the second type of repeat unit one of R1, R2, R3, and R4 is a hindered aromatic group, a C8 or greater alkyl group, a C4 or greater halohydrocarbyl or perhalocarbyl group, a C7 or greater aralkyl group, or a heteroatom hydrocarbyl or halohydrocarbyl group.
    Type: Application
    Filed: December 3, 2007
    Publication date: August 14, 2008
    Inventors: Edmund Elce, Andrew Bell, Brian Knapp, Hendra Ng, Larry F. Rhodes, Robert Shick, Wei Zhang, William DiMenna, Saikumar Jayaraman, Jianyong Jin, Rajesh Raja Puthenkovilakom, Ramakrishna Ravikiran, Xiaoming Wu, Etsu Takeuchi