Patents by Inventor Rajesh S. Patel
Rajesh S. Patel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6642477Abstract: A method of forming a through-hole which is counter-tapered relative to a drilling laser involves directing, along an incidence axis and onto an impingement location on a first surface of a material, a laser beam of sufficient energy to ablate the material, the incidence axis being offset from a normal to the first surface at the impingement location. The material and the laser beam are then relatively rotated, for at least 360°, such that a through-hole having a larger exit opening than entrance opening is formed.Type: GrantFiled: October 23, 2001Date of Patent: November 4, 2003Assignee: Imra America, Inc.Inventors: Rajesh S. Patel, James M. Bovatsek
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Patent number: 6624885Abstract: A method for inspecting small holes in a material is disclosed. The method comprises directing a light source through the holes in the material, and then focusing the light passing through the material onto a CCD detector. The focusing techniques allow for a reduction in the size of the image which must be inspected, thereby increasing sample throughput, while still allowing for detailed inspection of the hole number and quality. Methods of producing an aerosolization container and device comprising membranes which pass such an inspection are also provided.Type: GrantFiled: June 10, 1999Date of Patent: September 23, 2003Assignee: Aradigm CorporationInventors: Russell M. Pon, Rajesh S. Patel, James M. Bovatsek, Jeffrey A. Schuster, Geoffrey K. McKinley, Sze-The Young
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Patent number: 6551542Abstract: A method for producing a nozzle useful in generating a fine aerosol for delivery of therapeutic or diagnostic agents is provided. The method comprises focusing a laser source onto a thin, preferably flexible material so as to form pores substantially through the material. The pores are formed to have an unflexed exit aperture diameter in the range of about 0.5 to about 25 microns, depending on the size of the aerosol particles desired for a particular application. The nozzle may have a variety of shapes and be distributed in a variety of patterns. An elevated area can be formed around the exit aperture of the nozzle in order to prevent intrusion of liquid into the nozzle.Type: GrantFiled: November 8, 2000Date of Patent: April 22, 2003Assignee: Aradigm CorporationInventors: Rajesh S. Patel, Sudarsan Srinivasan, Russell M. Pon, Jeffrey A. Schuster, Igor Gonda
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Patent number: 6543442Abstract: A nozzle comprised of a thin, flexible membrane material having a plurality of pores is disclosed. In one embodiment, the pores have an unflexed exit aperture diameter in the range of about 0.5 to about 2 microns (preferably about 1 micron) and are positioned substantially uniformly in the material, preferably about 50 microns apart. The nozzle preferably has a conical or trumpet-shaped cross-section. In another aspect of the invention, the exit aperture of the nozzle is surrounded by an elevated area protruding above the substantially planar exit side of the membrane in order to prevent intrusion of liquid back into the nozzle. The nozzle can be used to form an aerosol containing a pharmaceutical composition from the exit side of the nozzle upon forcible application of the composition to the entrance side of the nozzle. This aerosol can be used to administer the pharmaceutical composition, for example, to the eye or to a selected portion of the respiratory tract.Type: GrantFiled: March 2, 2001Date of Patent: April 8, 2003Assignee: Aradigm CorporationInventors: Igor Gonda, Jeffrey A. Schuster, Rajesh S. Patel
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Patent number: 6541709Abstract: A multilayer thin film structure having defined strap repair lines thereon and a method for repairing interconnections in the multilayer thin film structure (MLTF) and/or making engineering changes (EC) are provided. The method determines interconnection defects in the MLTF at a thin film layer adjacent the top metal layer of the structure, defines the top surface metallization including a series of orthogonal X conductor lines and Y conductor lines using photoresist and lithography and additive or subtractive metallization techniques and then uses a phototool to selectively expose the photoresist to define top surface strap connections needed to repair the interconnections and/or make EC's, and forms the top surface metallization.Type: GrantFiled: November 1, 1996Date of Patent: April 1, 2003Assignee: International Business Machines CorporationInventors: Peter A. Franklin, Arthur G. Merryman, Rajesh S. Patel, Thomas A. Wassick
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Publication number: 20030057192Abstract: A method for material processing using a pulsed laser includes generating a beam of laser pulses, focusing the beam in a plane above the surface of a workpiece, causing breakdown of matter at a lasing point, and removing or modifying material of the workpiece. Positioning the focal plane of the laser above the workpiece permits the use of higher intensity laser beam pulses and minimizes ill effects of workpiece surface conditions on laser energy absorption. In a second aspect, a method for material processing further includes using vacuum to remove the material removed by the beam, preferably by a push-pull type air vacuum system located slightly above the workpiece surface, thereby providing cleaner workpiece and feature surfaces.Type: ApplicationFiled: October 24, 2002Publication date: March 27, 2003Applicant: IMRA America, Inc.Inventor: Rajesh S. Patel
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Publication number: 20020130197Abstract: A nozzle comprising a thin, flexible substantially planar polymeric film having a plurality of pores with structures allowing for generation of an aerosol at reduced extrusion pressure is disclosed. The pores can comprise at least two sections, or steps, in which the thickness of the membrane is reduced in stepwise fashion, or the pores can be tapered. Nozzles formed comprising pores having such structures permit aerosol generation at lower extrusion pressures, thereby allowing for decreased weight of aerosolization devices, increased efficiency, increased portability and increased battery life. The pore structures also allow for the use of thicker, more easily processed polymeric films in manufacturing while having a thinner, more efficient aerosolization area. The use of decreased extrusion pressures also results in increased uniformity in aerosol generation and improved reliability of other components.Type: ApplicationFiled: March 11, 2002Publication date: September 19, 2002Inventors: Rajesh S. Patel, Sudarsan Srinivasan
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Publication number: 20020108938Abstract: A method for material processing using a pulsed laser includes generating a beam of laser pulses, focusing the beam in a plane above the surface of a workpiece, causing breakdown of matter at a lasing point, and removing or modifying material of the workpiece. Positioning the focal plane of the laser above the workpiece permits the use of higher intensity laser beam pulses and minimizes ill effects of workpiece surface conditions on laser energy absorption. In a second aspect, a method for material processing further includes using vacuum to remove the material removed by the beam, preferably by a push-pull type air vacuum system located slightly above the workpiece surface, thereby providing cleaner workpiece and feature surfaces.Type: ApplicationFiled: February 9, 2001Publication date: August 15, 2002Inventor: Rajesh S. Patel
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Patent number: 6427324Abstract: A multilayer thin film structure having defined strap repair lines thereon and a method for repairing interconnections in the multilayer thin film structure (MLTF) and/or making engineering changes (EC) are provided. The method comprises determining interconnection defects in the MLTF at a thin film layer adjacent the top metal layer of the structure, defining the top surface metallization including a series of orthogonal X conductor lines and Y conductor lines using photoresist and lithography and additive or phototool to selectively expose the photoresist to define top surface strap connections needed to repair the interconnections and/or make EC's, and forming the top surface metallization.Type: GrantFiled: July 13, 1998Date of Patent: August 6, 2002Assignee: International Business Machines CorporationInventors: Peter A. Franklin, Arthur G. Merryman, Rajesh S. Patel, Thomas A. Wassick
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Publication number: 20020088781Abstract: A nozzle comprising a thin, flexible substantially planar polymeric film having a plurality of pores with structures allowing for generation of an aerosol at reduced extrusion pressure is disclosed. The pores can comprise at least two sections, or steps, in which the thickness of the membrane is reduced in stepwise fashion, or the pores can be tapered. Nozzles formed comprising pores having such structures permit aerosol generation at lower extrusion pressures, thereby allowing for decreased weight of aerosolization devices, increased efficiency, increased portability and increased battery life. The pore structures also allow for the use of thicker, more easily processed polymeric films in manufacturing while having a thinner, more efficient aerosolization area. The use of decreased extrusion pressures also results in increased uniformity in aerosol generation and improved reliability of other components.Type: ApplicationFiled: October 26, 2001Publication date: July 11, 2002Inventors: Rajesh S. Patel, Sudarsan Srinivasan
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Patent number: 6354516Abstract: A nozzle comprising a thin, flexible substantially planar polymeric film having a plurality of pores with structures allowing for generation of an aerosol at reduced extrusion pressure is disclosed. The pores can comprise at least two sections, or steps, in which the thickness of the membrane is reduced in stepwise fashion, or the pores can be tapered. Nozzles formed comprising pores having such structures permit aerosol generation at lower extrusion pressures, thereby allowing for decreased weight of aerosolization devices, increased efficiency, increased portability and increased battery life. The pore structures also allow for the use of thicker, more easily processed polymeric films in manufacturing while having a thinner, more efficient aerosolization area. The use of decreased extrusion pressures also results in increased uniformity in aerosol generation and improved reliability of other components.Type: GrantFiled: November 2, 1999Date of Patent: March 12, 2002Assignee: Aradigm CorporationInventors: Rajesh S. Patel, Sudarsan Srinivasan
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Patent number: 6295986Abstract: A method for producing a nozzle useful in generating a fine aerosol for delivery of a therapeutic or diagnostic agent is provided. The method comprises treating a thin, preferably flexible material having partially formed nozzles with a plasma which alters the size and shape of the nozzles. The pores in the nozzles so formed preferably have an unflexed exit aperture diameter in the range of about 0.5 to about 25 microns, depending on the size of the aerosol particles desired for a given application. The pores in the nozzles can have a variety of shapes and can be distributed in a variety of patterns. An elevated area can be formed around the exit aperture of the nozzle in order to prevent intrusion of liquid back into the nozzle. A method of producing an aerosolization device incorporating such a nozzle is also provided.Type: GrantFiled: January 12, 2000Date of Patent: October 2, 2001Assignee: Aradigm CorporationInventors: Rajesh S. Patel, Sudarsan Srinivasan
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Publication number: 20010010224Abstract: A nozzle comprised of a thin, flexible membrane material having a plurality of pores is disclosed. In one embodiment, the pores have an unflexed exit aperture diameter in the range of about 0.5 to about 2 microns (preferably about 1 micron) and are positioned substantially uniformly in the material, preferably about 50 microns apart. The nozzle preferably has a conical or trumpet-shaped cross-section. In another aspect of the invention, the exit aperture of the nozzle is surrounded by an elevated area protruding above the substantially planar exit side of the membrane in order to prevent intrusion of liquid back into the nozzle. The nozzle can be used to form an aerosol containing a pharmaceutical composition from the exit side of the nozzle upon forcible application of the composition to the entrance side of the nozzle. This aerosol can be used to administer the pharmaceutical composition, for example, to the eye or to a selected portion of the respiratory tract.Type: ApplicationFiled: March 2, 2001Publication date: August 2, 2001Inventors: Igor Gonda, Jeffrey A. Schuster, Rajesh S. Patel
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Patent number: 6230706Abstract: A nozzle comprised of a thin, flexible membrane material having a plurality of pores is disclosed. In one embodiment, the pores have an unflexed exit aperture diameter in the range of about 0.5 to about 2 microns (preferably about 1 micron) and are positioned substantially uniformly in the material, preferably about 50 microns apart. The nozzle preferably has a conical or trumpet-shaped cross-section. In another aspect of the invention, the exit aperture of the nozzle is surrounded by an elevated area protruding above the substantially planar exit side of the membrane in order to prevent intrusion of liquid back into the nozzle. The nozzle can be used to form an aerosol containing a pharmaceutical composition from the exit side of the nozzle upon forcible application of the composition to the entrance side of the nozzle. This aerosol can be used to administer the pharmaceutical composition, for example, to the eye or to a selected portion of the respiratory tract.Type: GrantFiled: June 5, 2000Date of Patent: May 15, 2001Assignee: Aradigm CorporationInventors: Igor Gonda, Jeffrey A. Schuster, Rajesh S. Patel
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Patent number: 6070575Abstract: A nozzle comprised of a thin, flexible membrane material having a plurality of pores is disclosed. In one embodiment, the pores have an unflexed exit aperture diameter in the range of about 0.5 to about 2 microns (preferably about 1 micron) and are positioned substantially uniformly in the material, preferably about 50 microns apart. The nozzle preferably has a conical or trumpet-shaped cross-section. In another aspect of the invention, the exit aperture of the nozzle is surrounded by an elevated area protruding above the substantially planar exit side of the membrane in order to prevent intrusion of liquid back into the nozzle. The nozzle can be used to form an aerosol containing a pharmaceutical composition from the exit side of the nozzle upon forcible application of the composition to the entrance side of the nozzle. This aerosol can be used to administer the pharmaceutical composition, for example, to the eye or to a selected portion of the respiratory tract.Type: GrantFiled: November 16, 1998Date of Patent: June 6, 2000Assignee: Aradigm CorporationInventors: Igor Gonda, Jeffrey A. Schuster, Rajesh S. Patel
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Patent number: 5756236Abstract: A method of fabricating a high resolution ablation mask for use at laser fluences of greater than 200 mJ/cm.sup.2 is disclosed. The method comprises combining dry etching and chemical etching of an unetched ablation mask which comprises a transparent substrate, a layer of high UV light refractivity material, e.g. aluminum, deposited on said substrate, and a photoresist layer positioned on a predetermined area of said high UV light refractivity material layer leaving other areas of said high UV light refractivity material layer exposed.Type: GrantFiled: January 29, 1997Date of Patent: May 26, 1998Assignee: International Business Machines CorporationInventors: Steven A. Cordes, James L. Speidell, Rajesh S. Patel
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Patent number: 5536605Abstract: A repaired laser ablation mask is disclosed capable of withstanding laser fluences in the range from about 200 mJ/cm.sup.2 to at least 500 mJ/cm.sup.2. The repaired mask comprises a single or multiple layers of apertured metal, such as, aluminum, on a quartz substrate. The laser mask repair technique and structure are also disclosed. The thickness of the metal layer, such as, aluminum layer, is in the range from about 2 microns to about 6 microns. A laser projection etching technique is also disclosed for using the repaired ablation mask.Type: GrantFiled: May 22, 1995Date of Patent: July 16, 1996Assignee: International Business Machines CorporationInventors: Rajesh S. Patel, Laertis Economikos
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Patent number: 5534371Abstract: A repaired laser ablation mask is disclosed capable of withstanding laser fluences in the range from about 200 mJ/cm.sup.2 to at least 500 mJ/cm.sup.2. The repaired mask comprises a single or multiple layers of apertured metal, such as, aluminum, on a quartz substrate. The laser mask repair technique and structure are also disclosed. The thickness of the metal layer, such as, aluminum layer, is in the range from about 2 microns to about 6 microns. A laser projection etching technique is also disclosed for using the repaired ablation mask.Type: GrantFiled: May 22, 1995Date of Patent: July 9, 1996Assignee: International Business Machines CorporationInventors: Rajesh S. Patel, Laertis Economikos