Patents by Inventor Rakesh Kumar Kuncha

Rakesh Kumar Kuncha has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9898572
    Abstract: A method of Back-End-Of-Line processing of a semiconductor device is provided including providing a layout for metal lines of a metallization layer of the semiconductor device, determining a semi-isolated metal line in the provided layout and shifting at least a portion of the determined semi-isolated metal line.
    Type: Grant
    Filed: February 17, 2016
    Date of Patent: February 20, 2018
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Thomas Melde, Matthias U. Lehr, Thomas Herrmann, Jens Hassmann, Moritz Andreas Meyer, Rakesh Kumar Kuncha
  • Publication number: 20170235867
    Abstract: A method of Back-End-Of-Line processing of a semiconductor device is provided including providing a layout for metal lines of a metallization layer of the semiconductor device, determining a semi-isolated metal line in the provided layout and shifting at least a portion of the determined semi-isolated metal line.
    Type: Application
    Filed: February 17, 2016
    Publication date: August 17, 2017
    Inventors: Thomas Melde, Matthias U. Lehr, Thomas Herrmann, Jens Hassmann, Moritz Andreas Meyer, Rakesh Kumar Kuncha
  • Publication number: 20160154922
    Abstract: A method of manufacturing semiconductor devices employing optical proximity correction (OPC) is provided including providing a design layout of masks, performing OPC on the design layout to obtain a post OPC layout, performing post chemical mechanical polishing (CMP) topography simulations of a wafer to obtain the surface topography of the wafer, calculating a focus shift of a nominal focus caused by the surface topography of the wafer to obtain a shifted nominal focus, determining a process window based on the shifted nominal focus, simulating a nominal image based on the post OPC layout and the shifted nominal focus and process window images based on the post OPC layout and the process window, and identifying hotspots based on the simulated nominal and process window images.
    Type: Application
    Filed: December 1, 2014
    Publication date: June 2, 2016
    Inventors: Rakesh Kumar Kuncha, Aravind Narayana Samy