Patents by Inventor Ralf BIEDERMANN

Ralf BIEDERMANN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11905592
    Abstract: In various aspects of the disclosure, a method of operating a process group that performs at least a first reactive coating process and a second reactive coating process may comprise: coating of a substrate by means of the first reactive coating process and by means of the second reactive coating process; closed-loop control of the process group by means of a first manipulated variable of the first coating process and a second manipulated variable of the second coating process and using a correction element; wherein the correction element relates the first manipulated variable and the second manipulated variable to one another in such a way that their control values are different from one another.
    Type: Grant
    Filed: September 2, 2020
    Date of Patent: February 20, 2024
    Inventors: Ralf Biedermann, Bernd Teichert, Thomas Meyer, Torsten Dsaak
  • Patent number: 11887867
    Abstract: According to various embodiments, a vacuum arrangement may comprise the following: a first dehydration chamber and a second dehydration chamber, which are gas-separated from one another; a substrate transfer chamber for changing clocked substrate transport into continuous substrate transport towards the second dehydration chamber; a first high-vacuum pump of gas-transfer type for evacuating the first dehydration chamber; and a second high-vacuum pump of gas-binding type for evacuating the second dehydration chamber; wherein the first dehydration chamber is, with respect to the substrate transport, arranged between the second dehydration chamber and the substrate transfer chamber.
    Type: Grant
    Filed: June 26, 2019
    Date of Patent: January 30, 2024
    Assignee: VON ARDENNE ASSET GMBH & CO. KG
    Inventors: Torsten Dsaak, Thomas Meyer, Bernd Teichert, Ralf Biedermann
  • Publication number: 20220090254
    Abstract: The instant disclosure relates to methods, devices, and code for controlling a coating process and, in particular, for controlling a coating process of a substrate. According to various embodiments, the method may include driving a first actuator that supplies the coating process, which is based on monitored process variables that are detected in parallel with one another. The control variables may be considered when driving the first actuator. The method may also include driving a second actuator that supplies the coating process, which is based on the detected monitored process variables. The detected monitored process variables may also be considered when driving the second actuator.
    Type: Application
    Filed: September 21, 2021
    Publication date: March 24, 2022
    Inventors: Martin LANGER, Ralf BIEDERMANN, Damir MUCHAMEDJAROW
  • Publication number: 20210062327
    Abstract: In various aspects of the disclosure, a method of operating a process group that performs at least a first reactive coating process and a second reactive coating process may comprise: coating of a substrate by means of the first reactive coating process and by means of the second reactive coating process; closed-loop control of the process group by means of a first manipulated variable of the first coating process and a second manipulated variable of the second coating process and using a correction element; wherein the correction element relates the first manipulated variable and the second manipulated variable to one another in such a way that their control values are different from one another.
    Type: Application
    Filed: September 2, 2020
    Publication date: March 4, 2021
    Inventors: Ralf BIEDERMANN, Bernd TEICHERT, Thomas MEYER, Torsten DSAAK
  • Publication number: 20200006091
    Abstract: According to various embodiments, a vacuum arrangement may comprise the following: a first dehydration chamber and a second dehydration chamber, which are gas-separated from one another; a substrate transfer chamber for changing clocked substrate transport into continuous substrate transport towards the second dehydration chamber; a first high-vacuum pump of gas-transfer type for evacuating the first dehydration chamber; and a second high-vacuum pump of gas-binding type for evacuating the second dehydration chamber; wherein the first dehydration chamber is, with respect to the substrate transport, arranged between the second dehydration chamber and the substrate transfer chamber.
    Type: Application
    Filed: June 26, 2019
    Publication date: January 2, 2020
    Inventors: Torsten DSAAK, Thomas MEYER, Bernd TEICHERT, Ralf BIEDERMANN