Patents by Inventor Ralf Bluthner

Ralf Bluthner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020063053
    Abstract: Production of a thin-film system containing at least one ultra-thin film, preferentially in the film thickness range from 1 to 10 nm, which is separated by plasma-aided chemical or physical vapor-phase deposition using magnetron discharges. The method is characterized in that in the course of deposition of the ultra-thin film the power output is introduced into the plasma in the form of a controlled number of power pulses and that the average power output during the pulse-on time is set higher by a factor of at least 3 than the averaged power output over the entire coating time during deposition of the ultra-thin film.
    Type: Application
    Filed: September 26, 2001
    Publication date: May 30, 2002
    Applicant: Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e.V.
    Inventors: Torsten Winkler, Ralf Bluthner, Klaus Goedicke, Michael Junghahnel, Hans Buchberger, Manfred Muller, Arno Hebgen, Hans-Hermann Schneider