Patents by Inventor Ralf Degenhardt
Ralf Degenhardt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8203119Abstract: The invention provides a charged particle beam device to inspect or structure a specimen with a primary charged particle beam propagating along an optical axis; a beam tube element having a tube voltage; and a retarding field analyzer in the vicinity of the beam tube element to detect secondary charged particles generated by the primary charged particle beam on the specimen. According to the invention, the retarding field analyzer thereby comprises an entrance grid electrode at a second voltage; at least one filter grid electrode at a first voltage; a charged particle detector to detect the secondary charged particles; and at least one further electrode element arranged between the entrance grid electrode and the at least one filter grid electrode. The at least one further electrode element reduces the size of the stray fields regions in the retarding electric field region to improve the energy resolution of the retarding field analyzer.Type: GrantFiled: June 10, 2005Date of Patent: June 19, 2012Assignee: ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbHInventors: Ralf Degenhardt, Hans-Peter Feuerbaum, Dirk Hambach, Walter Kögler, Harry Munack, Carlo Salvesen
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Patent number: 7679054Abstract: The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element acting in a focusing and dispersive manner, a second element acting in a focusing and dispersive manner, a first quadrupole element being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element being positioned, in beam direction, after the first element acting in a focusing and dispersive manner.Type: GrantFiled: September 2, 2004Date of Patent: March 16, 2010Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventors: Jürgen Frosien, Ralf Degenhardt, Stefan Lanio
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Publication number: 20090200463Abstract: The invention provides a charged particle beam device to inspect or structure a specimen with a primary charged particle beam propagating along an optical axis; a beam tube element having a tube voltage; and a retarding field analyzer in the vicinity of the beam tube element to detect secondary charged particles generated by the primary charged particle beam on the specimen. According to the invention, the retarding field analyzer thereby comprises an entrance grid electrode at a second voltage; at least one filter grid electrode at a first voltage; a charged particle detector to detect the secondary charged particles; and at least one further electrode element arranged between the entrance grid electrode and the at least one filter grid electrode. The at least one further electrode element reduces the size of the stray fields regions in the retarding electric field region to improve the energy resolution of the retarding field analyzer.Type: ApplicationFiled: June 10, 2005Publication date: August 13, 2009Inventors: Ralf Degenhardt, Hans-Peter Feuerbaum, Dirk Hambach, Walter Kögler, Harry Munack, Carlo Salvesen
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Patent number: 7507956Abstract: The present invention provides a charged particle beam energy width reduction system. The system comprises a first element acting in a focusing and dispersive manner in an x-z-plane; a second element acting in a focusing and dispersive manner in the x-z-plane; a charged particle selection element positioned between the first and the second element acting in a focusing and dispersive manner; and a focusing element positioned between the first and the second element acting in a focusing and dispersive manner.Type: GrantFiled: September 2, 2004Date of Patent: March 24, 2009Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventors: Jürgen Frosien, Ralf Degenhardt, Stefan Lanio
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Patent number: 7468517Abstract: The present invention provides a charged particle beam device. The device comprises a first lens generating a crossover a second lens positioned after the crossover and an element acting in a focusing and dispersive manner in an x-z-plane with a center of the element having essentially same z-position as the crossover. Further, a multipole element, which acts in the x-z-plane and a y-z-plane is provided. A first charged particle selection element and a second charged particle selection element are used for selecting a portion of the charged particles. Thereby, e.g. the energy width of the charged particle beam can be reduced.Type: GrantFiled: September 2, 2004Date of Patent: December 23, 2008Assignee: ICT Integrated Circuit Testing Gesellschaft fur Halbleiternruftechnik mbHInventors: Jürgen Frosien, Ralf Degenhardt, Stefan Lanio, Gerald Schönecker
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Patent number: 7429740Abstract: An electric-magnetic field-generating element and a multipole element comprising a plurality of these field-generating elements providing for a stable charged particle beam are described. For some embodiments, the electric-magnetic field-generating element includes a pole piece, a yoke to which the pole piece is attached, at least one coil, a vacuum-tight container accommodating the coil(s), and a holder adapted to hold the vacuum-tight container such that the vacuum-tight container is spaced from the pole piece and the yoke.Type: GrantFiled: July 10, 2006Date of Patent: September 30, 2008Assignee: ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbHInventors: Carlo Salvesen, Ralf Degenhardt
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Patent number: 7361897Abstract: An imaging apparatus is provided, comprising a first lens, a Wien filter having a first opening and a second opening, and further comprising a 2*m-pole element, m?2, and a second lens, wherein said first lens is disposed upstream said first opening of the Wien filter and said second lens is disposed downstream said second opening of the Wien filter, and an intermediate image plane of the first lens is located between said first opening and said first lens and an intermediate object plane of the second lens is located between said second opening and said second lens, and wherein said Wien filter is adapted for dispersion-free imaging of a stigmatic image formed in said intermediate image plane of said first lens into a stigmatic image formed in said intermediate object plane of said second lens.Type: GrantFiled: March 7, 2006Date of Patent: April 22, 2008Assignee: ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbHInventor: Ralf Degenhardt
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Patent number: 7274018Abstract: A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam resulting in a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.Type: GrantFiled: April 3, 2006Date of Patent: September 25, 2007Assignee: ICT, Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbHInventors: Pavel Adamec, Ralf Degenhardt, Hans-Peter Feuerbaum, Harry Munack, Dieter Winkler
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Publication number: 20070200069Abstract: The present invention relates to e.g.Type: ApplicationFiled: September 2, 2004Publication date: August 30, 2007Inventors: Jürgen Frosien, Ralf Degenhardt, Stefan Lanio
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Publication number: 20070158561Abstract: The present invention provides a charged particle beam device. The device comprises a first lens (101; 510) generating a crossover a second lens (102; 512) positioned after the crossover and a element acting in a focusing and dispersive manner in an x-z-plane with a center of the element having essentially same z-position as the crossover. Further, a multipole element, which acts in the x-z-plane and a y-z-plane is provided. A first charged particle selection element and a second charged particle selection element are used for selecting a portion of the charged particles. Thereby, e.g. the energy width of the charged particle beam can be reduced.Type: ApplicationFiled: September 2, 2004Publication date: July 12, 2007Inventors: Jurgen Frosien, Ralf Degenhardt, Stefan Lanio, Gerald Schonecker
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Publication number: 20070069150Abstract: The present invention provides a charged particle beam energy width reduction system. The system comprises a first element (110) acting in a focusing and dispersive manner in an x-z-plane; a second element (112) acting in a focusing and dispersive manner in the x-z-plane; a charged particle selection element (116; 116a; 116b) positioned between the first and the second element acting in a focusing and dispersive manner; and a focusing element (114; 314, 712; 714) positioned between the first and the second element acting in a focusing and dispersive manner.Type: ApplicationFiled: September 2, 2004Publication date: March 29, 2007Inventors: Jürgen Frosien, Ralf Degenhardt, Stefan Lanio
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Publication number: 20070023673Abstract: An electric-magnetic field-generating element and a multipole element comprising a plurality of these field-generating elements providing for a stable charged particle beam are described. For some embodiments, the electric-magnetic field-generating element includes a pole piece, a yoke to which the pole piece is attached, at least one coil, a vacuum-tight container accommodating the coil(s), and a holder adapted to hold the vacuum-tight container such that the vacuum-tight container is spaced from the pole piece and the yoke.Type: ApplicationFiled: July 10, 2006Publication date: February 1, 2007Inventors: Carlo Salvesen, Ralf Degenhardt
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Publication number: 20060219915Abstract: An imaging apparatus is provided, comprising a first lens, a Wien filter having a first opening and a second opening, and further comprising a 2*m-pole element, m?2, and a second lens, wherein said first lens is disposed upstream said first opening of the Wien filter and said second lens is disposed downstream said second opening of the Wien filter, and an intermediate image plane of the first lens is located between said first opening and said first lens and an intermediate object plane of the second lens is located between said second opening and said second lens, and wherein said Wien filter is adapted for dispersion-free imaging of a stigmatic image formed in said intermediate image plane of said first lens into a stigmatic image formed in said intermediate object plane of said second lens.Type: ApplicationFiled: March 7, 2006Publication date: October 5, 2006Inventor: Ralf Degenhardt
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Publication number: 20060192145Abstract: A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam resulting in a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.Type: ApplicationFiled: April 3, 2006Publication date: August 31, 2006Inventors: Pavel Adamec, Ralf Degenhardt, Hans-Peter Feuerbaum, Harry Munack, Dieter Winkler
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Patent number: 7045781Abstract: A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam to a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.Type: GrantFiled: January 16, 2004Date of Patent: May 16, 2006Assignee: ICT, Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik MbhInventors: Pavel Adamec, Ralf Degenhardt, Hans-Peter Feuerbaum, Harry Munack, Dieter Winkler
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Patent number: 6943349Abstract: The present invention provides an improved column for a charged particle beam device. The column comprises an aperture plate having multiple apertures to produce multiple beams of charged particles and a deflector to influence the beams of charged particles so that each beam appears to come from a different source. Furthermore, an objective lens is used in order to focus the charged-particle beams onto the specimen. Due to the deflector, multiple images of the source are created on the surface of the specimen whereby all the images can be used for parallel data acquisition. Accordingly, the speed of data acquisition is increased. With regard to the focusing properties of the objective lens, the beams of charged particles can basically be treated as independent particle beams which do not negatively affect each other. Accordingly, each beam basically provides the same resolution as the beam of a conventional charged particle beam device.Type: GrantFiled: April 27, 2001Date of Patent: September 13, 2005Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventors: Pavel Adamec, Ralf Degenhardt, Hans-Peter Feuerbaum, Harry Munack, Dieter Winkler
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Publication number: 20040169141Abstract: A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam to a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.Type: ApplicationFiled: January 16, 2004Publication date: September 2, 2004Inventors: Pavel Adamec, Ralf Degenhardt, Hans-Peter Feuerbaum, Harry Munack, Dieter Winkler
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Publication number: 20030168606Abstract: The present invention provides an improved column for a charged particle beam device. The column comprises an aperture plate having multiple apertures to produce multiple beams of charged particles and a deflector to influence the beams of charged particles so that each beam appears to come from a different source. Furthermore, an objective lens is used in order to focus the charged-particle beams onto the specimen. Due to the deflector, multiple images of the source are created on the surface of the specimen whereby all the images can be used for parallel data acquisition. Accordingly, the speed of data acquisition is increased. With regard to the focusing properties of the objective lens, the beams of charged particles can basically be treated as independent particle beams which do not negatively affect each other. Accordingly, each beam basically provides the same resolution as the beam of a conventional charged particle beam device.Type: ApplicationFiled: May 12, 2003Publication date: September 11, 2003Inventors: Pavel Adamec, Ralf Degenhardt, Hans-Peter Feuerbaum, Harry Munack, Dieter Winkler
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Patent number: 6576908Abstract: A charged particle beam column with a first vacuum chamber further comprises a particle source for providing a beam of charged particles and a multi aperture unit with at least two beam defining apertures for shaping the beam of charged particles. The particle source and the beam defining apertures are located within the first vacuum chamber. A separation unit for isolating a second vacuum chamber from the first vacuum chamber whereby the separation unit comprises a path aperture for the charged particle beam is arranged between the first and second vacuum chamber. A first deflecting unit directs the beam of charged particles through one of the beam defining apertures and a second deflecting unit directs the beam of charged particles through the path aperture.Type: GrantFiled: November 3, 1999Date of Patent: June 10, 2003Assignee: Applied Materials, Inc.Inventors: Dieter Winkler, Hans-Peter Feuerbaum, Ralf Degenhardt
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Patent number: 5336885Abstract: An electron beam apparatus is provided with an energy selective device which enables spectrometric measurements together with imaging. The energy selective device has its main electron beam trajectory in a plane outside the optical axis of the electron beam apparatus, thereby substantially reducing the overall length of the apparatus. Preferably the energy selective device has double symmetry such that the energy dispersion has a maximum value in a central plane of symmetry where a selective slit can be introduced. Full symmetry facilitates full compensation of optical aberrations in the device. Adding quadruples in a second plane of symmetry enables imaging of spectra at a location outside the device.Type: GrantFiled: October 20, 1992Date of Patent: August 9, 1994Assignee: U.S. Philips CorporationInventors: Harald Rose, Ralf Degenhardt, Karel D. Van der Mast