Patents by Inventor Ralf Heck

Ralf Heck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Tube target
    Patent number: 6793784
    Abstract: A tube target for cathode sputtering installations, and a process for producing a cylindrical hollow body for such a tube target and its use. The problem of providing a simple and low-cost process for producing a cylindrical hollow body for a tube target and of providing a cylindrical hollow body with a uniform, fine-grained structure is solved by the cylindrical hollow body being produced by centrifugal casting of a melt.
    Type: Grant
    Filed: November 6, 2000
    Date of Patent: September 21, 2004
    Assignee: W. C. Heraeus GmbH & Co. KG
    Inventors: Otto Bach, David Lupton, Hans Bohmeier, Ralf Heck
  • Hollow cylindrical cathode sputtering target and process for producing it
    Patent number: 6756081
    Abstract: A hollow cylindrical target for a cathode sputtering unit with a hollow cylindrical sputtering material and a target holder is disclosed. The sputtering material has an annular cross section and concentrically surrounds a longitudinal segment of the target holder. The target holder extends out of the sputtering material at least at one end of the target to allow connection to the cathode sputtering unit. The at least one part of the target holder that extends from the sputtering material is a single part that can be detached from the target by at least one screw fitting.
    Type: Grant
    Filed: March 11, 2003
    Date of Patent: June 29, 2004
    Assignee: W. C. Heraeus GmbH & Co. KG
    Inventors: David Lupton, Ralf Heck, Bernd Stenger, Oliver Warkentin
  • Process for producing a tube-shaped cathode sputtering target
    Patent number: 6719034
    Abstract: A process for producing a tube target for cathode sputtering plants, in which the tube target is formed from a metallic inner tube (target holder) made of a first material with a first melting point of Ts1≧900 K and a metallic outer tube (target) that concentrically surrounds the inner tube and that is made of a second material with a second melting point of Ts2≦800 K. The inside diameter of the outer tube and the outside diameter of the inner tube are proportioned in such a way that the two tubes fit together tightly and are mechanically firmly joined. The outer tube is formed by casting the second material in a molten state in a heated, vertical, cylindrical permanent mold, which has a heated mandrel that constitutes the inner tube.
    Type: Grant
    Filed: December 19, 2001
    Date of Patent: April 13, 2004
    Assignee: W. C. Heraeus GmbH & Co. KG
    Inventors: Ralf Heck, Rainer Jüttner, David Lupton, Egon Maier, Peter Mainz, Harald Manhardt, Bernd Stenger, Holger Zingg
  • Hollow cylindrical cathode sputtering target and process for producing it
    Patent number: 6645358
    Abstract: A hollow cylindrical target for a cathode sputtering unit with a hollow cylindrical sputtering material and a target holder is disclosed. The sputtering material has an annular cross section and concentrically surrounds a longitudinal segment of the target holder. The target holder extends out of the sputtering material at least at one end of the target to allow connection to the cathode sputtering unit. The at least one part of the target holder that extends from the sputtering material is a single part that can be detached from the target by at least one screw fitting.
    Type: Grant
    Filed: January 15, 2002
    Date of Patent: November 11, 2003
    Assignee: W.C. Heraeus GmbH & Co. KG
    Inventors: David Lupton, Ralf Heck, Bernd Stenger, Oliver Warkentin
  • Hollow cylindrical cathode sputtering target and process for producing it
    Publication number: 20030141183
    Abstract: A hollow cylindrical target for a cathode sputtering unit with a hollow cylindrical sputtering material and a target holder. The sputtering material has an annular cross section and concentrically surrounds a longitudinal segment of the target holder. The target holder extends out of the sputtering material at least at one end of the target to allow connection to the cathode sputtering unit. The at least one part of the target holder that extends from the sputtering material is a single part that can be detached from the target by at least one screw fitting.
    Type: Application
    Filed: March 11, 2003
    Publication date: July 31, 2003
    Applicant: W. C. Heraeus GmbH & Co. KG
    Inventors: David Lupton, Ralf Heck, Bernd Stenger, Oliver Warkentin
  • Process for producing a tube-shaped cathode sputtering target
    Publication number: 20030089482
    Abstract: A process for producing a tube target for cathode sputtering plants, in which the tube target is formed from a metallic inner tube (target holder) made of a first material with a first melting point of Ts1≧900 K and a metallic outer tube (target) that concentrically surrounds the inner tube and that is made of a second material with a second melting point of Ts2≦800 K. The inside diameter of the outer tube and the outside diameter of the inner tube are proportioned in such a way that the two tubes fit together tightly and are mechanically firmly joined. The outer tube is formed by casting the second material in a molten state in a heated, vertical, A cylindrical permanent mold, which has a heated mandrel that constitutes the inner tube.
    Type: Application
    Filed: December 19, 2001
    Publication date: May 15, 2003
    Applicant: W.C. Heraeus GmbH & Co. KG
    Inventors: Ralf Heck, Rainer Juttner, David Lupton, Egon Maier, Peter Mainz, Harald Manhardt, Bernd Stenger, Holger Zingg
  • Hollow cylindrical cathode sputtering target and process for producing it
    Publication number: 20020096430
    Abstract: A hollow cylindrical target for a cathode sputtering unit with a hollow cylindrical sputtering material and a target holder. The sputtering material has an annular cross section and concentrically surrounds a longitudinal segment of the target holder. The target holder extends out of the sputtering material at least at one end of the target to allow connection to the cathode sputtering unit. The at least one part of the target holder that extends from the sputtering material is a single part that can be detached from the target by at least one screw fitting.
    Type: Application
    Filed: January 15, 2002
    Publication date: July 25, 2002
    Applicant: W. C. Heraeus GmbH & Co. KG.
    Inventors: David Lupton, Ralf Heck, Bernd Stenger, Oliver Warkentin