Abstract: An optical system for a lithography apparatus, comprises: a vacuum housing under vacuum, in which a number of optical elements for guiding radiation in the optical system and a number of actuator/sensor devices assigned to the optical elements are arranged; a vacuum-tight housing that is separate from the vacuum housing and under atmospheric pressure; and an electrical vacuum feedthrough that connects the vacuum housing and the vacuum-tight housing and serves to feed at least one electrical connection connected to at least one of the actuator/sensor devices from the vacuum-tight housing into the vacuum housing. An optical transceiver module for converting optical signals into electrical signals, which is connectable to a controller via at least one optical waveguide, is arranged in the interior of the vacuum-tight housing and is electrically connected to the electrical vacuum feedthrough.

Abstract: An optical system comprises a number of optics modules, wherein the respective optics module comprises: a number of displaceable optical elements for guiding radiation in the optical system; a number of actuator/sensor devices, wherein at least one of the actuator/sensor devices is assigned to the respective optical element, wherein the respective actuator/sensor device is configured to displace the assigned optical element and/or to acquire a position of the assigned optical element; a vacuum-tight housing; and an electronics unit in the vacuum-tight housing and configured to actuate the respective actuator/sensor device on the basis of received actuation data, wherein the electronics unit has a first electronics region containing a number of electrical and/or electronic component parts and that generates, and a second electronics region containing a number of electrical and/or electronic component parts.

Abstract: A control device actuates actuator unit to set a position of an optical element of a lithography system. The control device includes an amplifier unit for providing a control signal for the actuator unit via a voltage signal and a PWM signal. The PWM signal has a duty factor and a clock frequency. The control device also includes a modulator unit designed to provide the PWM signal having the duty factor and a defined clock frequency from a plurality of defined clock frequencies. A defined clock frequency of the plurality of defined clock frequencies is an integer multiple of a basic clock frequency. The basic clock frequency is in the range of 10 kHz to 1 MHz.

Abstract: A control device actuates actuator unit to set a position of an optical element of a lithography system. The control device includes an amplifier unit for providing a control signal for the actuator unit via a voltage signal and a PWM signal. The PWM signal has a duty factor and a clock frequency. The control device also includes a modulator unit designed to provide the PWM signal having the duty factor and a defined clock frequency from a plurality of defined clock frequencies. A defined clock frequency of the plurality of defined clock frequencies is an integer multiple of a basic clock frequency. The basic clock frequency is in the range of 10 kHz to 1 MHz.