Patents by Inventor Ralf LEIERS

Ralf LEIERS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CVD reactor and method for controlling the surface temperature of the substrates
    Patent number: 12320002
    Abstract: In a CVD reactor and a method for the open-loop/closed-loop control of the surface temperature of substrates arranged therein, the substrates lie on substrate-retaining elements, which are each supported by a gas cushion. Actual values of the surface temperatures associated with a respective substrate-retaining element are successively measured and the surface temperatures are controlled in a closed-loop manner to a common value by varying the gas cushion height.
    Type: Grant
    Filed: January 5, 2021
    Date of Patent: June 3, 2025
    Assignee: AIXTRON SE
    Inventor: Ralf Leiers
  • CVD REACTOR AND METHOD FOR CONTROLLING THE SURFACE TEMPERATURE OF THE SUBSTRATES
    Publication number: 20230041558
    Abstract: In a CVD reactor and a method for the open-loop/closed-loop control of the surface temperature of substrates arranged therein, the substrates lie on substrate-retaining elements, which are each supported by a gas cushion. Actual values of the surface temperatures associated with a respective substrate-retaining element are successively measured and the surface temperatures are controlled in a closed-loop manner to a common value by varying the gas cushion height.
    Type: Application
    Filed: January 5, 2021
    Publication date: February 9, 2023
    Inventor: Ralf LEIERS