Patents by Inventor Ralf Lukner

Ralf Lukner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of and apparatus for chemical-mechanical polishing
    Patent number: 6572441
    Abstract: During a CMP operation, vibration-caused variations in the forces holding a wafer against a polishing pad, and/or relatively moving the pad and the wafer are measured and the standard deviation thereof is used to minimize or eliminate the deleterious effects of the vibrations.
    Type: Grant
    Filed: May 31, 2001
    Date of Patent: June 3, 2003
    Assignee: Momentum Technical Consulting, Inc.
    Inventors: Ralf Lukner, Owen Hehmeyer
  • Method of and apparatus for chemical-mechanical polishing
    Publication number: 20020182978
    Abstract: During a CMP operation, vibration-caused variations in the forces holding a wafer against a polishing pad, and/or relatively moving the pad and the wafer are measured and the standard deviation thereof is used to minimize or eliminate the deleterious effects of the vibrations.
    Type: Application
    Filed: May 31, 2001
    Publication date: December 5, 2002
    Applicant: Momentum Technical Consulting, Inc.
    Inventors: Ralf Lukner, Owen Hehmeyer