Patents by Inventor Ralf Otto

Ralf Otto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050059146
    Abstract: A new method for selecting clones and recloning mammalian cells which are of importance for the production of biopharmaceuticals, preferably hamster or mouse myeloma cells, with a high degree of automation and throughput. The invention relates to methods of depositing and replicating single cell clones of the cells in question. The invention also relates to methods of preparing proteins using cells which have been obtained and replicated by single cell deposition as well as compositions which allow the replication of single cells.
    Type: Application
    Filed: August 19, 2004
    Publication date: March 17, 2005
    Applicant: Boehringer Ingelheim Pharma GmbH & Co. KG
    Inventors: Ralf Otto, Barbara Enenkel, Juergen Fieder, Thomas Krieg
  • Patent number: 6866820
    Abstract: The invention relates to an appliance for opening and closing a reagent-container stopper in a partially or fully automatic analysis apparatus, and to the method, which is applied by means of this appliance, for opening and closing a reagent-container stopper in a partially or fully automatic analysis appliance.
    Type: Grant
    Filed: April 18, 2000
    Date of Patent: March 15, 2005
    Assignee: Dade Behring Marburg, GmbH
    Inventors: Ralf Otto, Hugo Wilmes, Hans-Dieter Sänger
  • Publication number: 20040148647
    Abstract: An expression vector for eukaryotic cells comprising a gene which codes for a protein of interest, functionally linked to a hamster-ubiquitin/S27a-promoter and a gene which codes for a fluorescent protein. Preferably the expression vector also contains an amplifiable selectable marker gene.
    Type: Application
    Filed: November 26, 2003
    Publication date: July 29, 2004
    Applicant: Boehringer Ingelheim Pharma GmbH & Co. KG
    Inventors: Barbara Enenkel, Juergen Fieder, Ralf Otto, Stefanos Grammatikos
  • Publication number: 20040117055
    Abstract: A processing tool for manufacturing semiconductor devices, e.g. a lithography cluster, has a device transfer area with an optical sensor (e.g. CCD-camera), and an illumination system. A substrate (e.g., a semiconductor wafer, a reticle, or a mask for exposure on the wafer) that is transferred to or from one of its processing chambers can be scanned during its movement at low resolution. Scanning is performed before and after processing in at least one the processing chambers of the processing tool. The images are compared and optionally subtracted from each other. Defects imposed to the substrate due to contaminating particles only during the present processes with sizes larger than 10 &mgr;m are visible on the subtracted image. Defects imposed earlier are diminished as well as structures formed from a mask pattern below 10 &mgr;m. Pattern recognition allows efficient classification of the defects just detected in a processing tool.
    Type: Application
    Filed: November 17, 2003
    Publication date: June 17, 2004
    Inventors: Torsten Seidel, Ralf Otto, Karl Schumacher, Thorsten Schedel, Eckhard Marx, Gunter Hraschan
  • Patent number: 6750332
    Abstract: Novel salicyl alcohol derivatives having valuable cosmetically and pharmaceutically useful properties, such as prostaglandin synthesis inhibition, corresponding to the formula (I): R1—OCH2—Ph—O—Z—(R2)n  (I), a method for producing the same and their utilization in cosmetics and pharmacy.
    Type: Grant
    Filed: February 26, 2002
    Date of Patent: June 15, 2004
    Assignee: Cognis Deutschland GmbH & Co. KG
    Inventors: Ralf Otto, Albrecht Weiss
  • Publication number: 20040087170
    Abstract: A method is provided for determining the end point during cleaning etching of processing chambers by means of plasma etching, which is used for carrying out coating or etching processes during the manufacture of semiconductor components. The invention provides a method for effectively and reliably determining the end point during cleaning etching of processing chambers. The end point is determined by monitoring the DC bias voltage on the plasma generator which is used for the plasma cleaning etching in the processing chamber in an evaluation unit. The plasma cleaning etching process is terminated by stopping the supply of the process gases in the gas supply unit and by switching off the plasma generator upon reaching a predetermined DC bias voltage value which corresponds to completion of the cleaning etching process.
    Type: Application
    Filed: September 5, 2003
    Publication date: May 6, 2004
    Inventors: Percy Heger, Tobias Hoernig, Ralf Otto
  • Publication number: 20040029025
    Abstract: A batch of semiconductor wafers are exposed after an alignment in a wafer stepper or scanner and each of their alignment parameters are determined. Using, e.g., a linear formula with tool specific coefficients, the overlay accuracy can be calculated from these alignment parameters in advance with a high degree of accuracy as if a measurement with an overlay inspection tool had been performed. The exposure tool-offset can be adjusted on a wafer-to-wafer basis to correct for the derived overlay inaccuracy. Moreover, the alignment parameters for a specific wafer can be used to change the tool-offset for the same wafer prior to exposure. The required inspection tool capacity is advantageously reduced, the wafer rework decreases, and time is saved to perform the exposure step.
    Type: Application
    Filed: August 6, 2003
    Publication date: February 12, 2004
    Inventors: Heiko Hommen, Ralf Otto, Thorsten Schedel, Sebastian Schmidt, Thomas Fischer
  • Patent number: 6684124
    Abstract: While a first leading semiconductor wafer (11) already processed in a process appliance (1) and belonging to a batch is being measured in a microscope measuring instrument (2) in relation to values for the structure parameters 30, a second or further semiconductor wafer (12) belonging to the batch is processed in the process appliance (1). An event signal (100) reports, for example, an inspection carried out successfully of the first wafer, so that the following wafers (12) no longer need to be inspected. Using the measured results, the process parameters (31) of the process appliance (1) are automatically readjusted. Events such as maintenance work or parameter drifts in trend maps etc. are detected in control units (8 or 9) and, via the output of an event signal (102), for example in an event database (40), lead to the event-based selection of structure parameters (30′) to be measured and/or to the initiation of a leading wafer (11).
    Type: Grant
    Filed: April 29, 2002
    Date of Patent: January 27, 2004
    Assignee: Infineon Technologies AG
    Inventors: Thorsten Schedel, Karl Schumacher, Thomas Fischer, Heiko Hommen, Ralf Otto, Sebastian Schmidt
  • Publication number: 20040014184
    Abstract: Disclosed is a method for obtaining 12-hydroxystearinic acid and the salts thereof from a native fat or oil, especially ricinoleic oil, characterized in that a) the native fat or oil is hydrolized under the catalytic influence of one or several enzymes at 15-50° C. to obtain ricinoleic acid b) the glycerol thus arising and the enzyme are separated, c) the hydrolysate is catalytically hydrolized, d) the product thus obtained is formulated.
    Type: Application
    Filed: May 2, 2003
    Publication date: January 22, 2004
    Inventors: Ralf Otto, Ulrich Schoerken, Albrecht Weiss, Levent Yueksel, Georg Fieg, Sabine Both, Sabine Kranz
  • Publication number: 20030170186
    Abstract: The invention relates to flavone and isoflavone glycoside derivatives of general formula (I): [A1-C(═O)O]m—[X—O-Z]-[O—C(═O)-A2]n (I), wherein [X—O-Z] represents a flavone or isoflavone glycoside structure, wherein X represents a flavone or isoflavone parent substance of formula (IIa) or (IIb), said (iso)flavone parent substance being mono- or multisubstituted and/or mono- or multireduced (hydrogenated), wherein Z (sugar) represents a mono-, di- or polysaccharide which is acetally bonded to the radical X and is ester-substituted with A2 n-times, [A1-C(═O)] representing an acyl radical on the flavone or isoflavone parent substance, wherein A1 and A2, independently of each other, represent a polyunsaturated C15-C25-alkenyl radical with at least 4 isolated and/or at least 2 conjugated double bonds or an arylaliphatic radical with 1-4 methylene groups between the ester group and the aromatic ring, wherein [C(═O)A2&rs
    Type: Application
    Filed: April 24, 2003
    Publication date: September 11, 2003
    Inventors: Bernadette Geers, Ralf Otto, Albrecht Weiss, Dirk Petersohn, Klaus Rudolf Schroeder, Kordula Schlotmann
  • Publication number: 20030153030
    Abstract: The invention relates to an enzyme-catalysed modification of substances in a mixture, comprising bringing the substance in a mixture to be modified into contact with an enzyme and a substrate.
    Type: Application
    Filed: November 26, 2002
    Publication date: August 14, 2003
    Inventors: Ralf Otto, Albrecht Weiss
  • Publication number: 20030124694
    Abstract: The invention relates to a process for the deacidification of natural fats and oils in which glycerides with acid values of 5 to 20 are treated with lower alcohols and free fatty acids are thus converted into esters and which is distinguished by the fact that the reaction is carried out in the presence of enzymes immobilized on supports with a diameter of 1 to 5 mm.
    Type: Application
    Filed: November 21, 2002
    Publication date: July 3, 2003
    Inventors: Bernhard Gutsche, Albrecht Weiss, Ralf Otto, Tycho Michel
  • Publication number: 20020183879
    Abstract: While a first leading semiconductor wafer (11) already processed in a process appliance (1) and belonging to a batch is being measured in a microscope measuring instrument (2) in relation to values for the structure parameters 30, a second or further semiconductor wafer (12) belonging to the batch is processed in the process appliance (1). An event signal (100) reports, for example, an inspection carried out successfully of the first wafer, so that the following wafers (12) no longer need to be inspected. Using the measured results, the process parameters (31) of the process appliance (1) are automatically readjusted. Events such as maintenance work or parameter drifts in trend maps etc. are detected in control units (8 or 9) and, via the output of an event signal (102), for example in an event database (40), lead to the event-based selection of structure parameters (30′) to be measured and/or to the initiation of a leading wafer (11).
    Type: Application
    Filed: April 29, 2002
    Publication date: December 5, 2002
    Inventors: Thorsten Schedel, Karl Schumacher, Thomas Fischer, Heiko Hommen, Ralf Otto, Sebastian Schmidt
  • Patent number: 6265225
    Abstract: A description is given of a cap for a reagent container having a sealable lid, where the lid can be pivoted laterally upward from the cap sealing position, with the container being opened, by means of an inclined bistable hinge, bears one or more catches which can come into contact with an apparatus for opening or closing the lid, and the cap has one or more centering elements by means of which the reagent-container setting position in the analyzer is fixed.
    Type: Grant
    Filed: October 15, 1998
    Date of Patent: July 24, 2001
    Assignee: Dade Behring Marburg GmbH
    Inventors: Ralf Otto, Dieter Bickoni, Hugo Wilmes