Patents by Inventor Ralf Reize

Ralf Reize has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • END EFFECTOR AND ROBOT HAVING AN END EFFECTOR
    Publication number: 20260042226
    Abstract: An end effector is described which is suitable for handling both wafers and wafer cassettes. The end effector has a first gripping unit configured to pick up and hold individual wafers and a second gripping unit configured to pick up and hold a wafer cassette, wherein the first and second gripping units are connected to each other in such a way that they can be attached to a common robot arm and that they are arranged at an angle to each other so that they do not interfere with each other during operation.
    Type: Application
    Filed: August 11, 2023
    Publication date: February 12, 2026
    Inventors: Patrick PELZ, Ralf REIZE, Patrick SCHMID
  • Device, system and method for plasma-enhanced chemical vapor deposition
    Patent number: 12454756
    Abstract: A device for plasma-enhanced chemical vapor deposition includes a process chamber configured to receive at least one workpiece carrier. The device is configured to heat the process chamber with the aid of at least one workpiece carrier that can be received by the process chamber. A system and a method for plasma-enhanced chemical vapor deposition are also provided.
    Type: Grant
    Filed: September 14, 2021
    Date of Patent: October 28, 2025
    Assignee: centrotherm international AG
    Inventors: Jens-Uwe Fuchs, Mirko Tröller, Ralf Reize, Roland Leichtle
  • DEVICE, SYSTEM AND METHOD FOR PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION
    Publication number: 20230349046
    Abstract: A device for plasma-enhanced chemical vapor deposition includes a process chamber configured to receive at least one workpiece carrier. The device is configured to heat the process chamber with the aid of at least one workpiece carrier that can be received by the process chamber. A system and a method for plasma-enhanced chemical vapor deposition are also provided.
    Type: Application
    Filed: September 14, 2021
    Publication date: November 2, 2023
    Inventors: Jens-Uwe Fuchs, Mirko Tröller, Ralf Reize, Roland Leichtle
  • WORKPIECE HOLDER, SYSTEM, AND OPERATING METHOD FOR PECVD
    Publication number: 20230349044
    Abstract: A workpiece holder for a plasma-enhanced chemical vapor deposition system is configured to produce a plasma from a process gas surrounding the workpiece holder. The workpiece holder is also configured to heat the surroundings of the workpiece holder to a process temperature provided for the vapor deposition. A chemical vapor deposition system and an operating method for the system are also provided.
    Type: Application
    Filed: September 14, 2021
    Publication date: November 2, 2023
    Inventors: Jens-Uwe Fuchs, Mirko Tröller, Ralf Reize, Roland Leichtle