Patents by Inventor Ralf Ritcher

Ralf Ritcher has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130140645
    Abstract: In a replacement gate approach, the semiconductor material of the gate electrode structures may be efficiently removed during a wet chemical etch process, while this material may be substantially preserved in electronic fuses. Consequently, well-established semiconductor-based electronic fuses may be used instead of requiring sophisticated metal-based fuse structures. The etch selectivity of the semiconductor material may be modified on the basis of ion implantation or electron bombardment.
    Type: Application
    Filed: January 2, 2013
    Publication date: June 6, 2013
    Applicant: Globalfoundries Inc.
    Inventors: Jens Heinrich, Ralf Ritcher, Kai Frohberg