Patents by Inventor Ralf Schuster

Ralf Schuster has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8844109
    Abstract: A method for manufacturing motor vehicles at a manufacturing location (S), from which ready-assembled motor vehicles are built in a planned number and order of output. First modules (MA) are delivered in a specific assembly stage discontinuously from a first production shop (PA) to the manufacturing location (S) and are fed continuously into a manufacturing line (F) in which the modules (MA) are manufactured into motor vehicles (A). Second modules (MB) be fed in a specific assembly stage from a second production shop (PB) into the joint manufacturing line (F) at a sequencing station (5) alternately with the modules (MA). Thus, vehicles of first and second model series can be manufactured on one and the same manufacturing line.
    Type: Grant
    Filed: March 26, 2009
    Date of Patent: September 30, 2014
    Assignee: Dr. Ing.h.c.F.Porsche Aktiengesellschaft
    Inventors: Christian Meyer, Ralf Schuster, Lutz Muller, Pascal Kauffelin
  • Publication number: 20140005596
    Abstract: The invention relates to an injection device for delivering a drug, comprising a housing arranged to receive a drug container and an electrical energy source, wherein a driver is arranged to displace a dose of the drug from the container under load of a drive spring upon release, wherein an electric motor powered by the electrical energy source is arranged for tensioning the drive spring, wherein control means are arranged for controlling the electric motor so as to tension the drive spring when an injection has been performed.
    Type: Application
    Filed: March 28, 2012
    Publication date: January 2, 2014
    Inventor: Ralf Schuster
  • Publication number: 20110152156
    Abstract: The invention relates to solid block acid containing cleaning compositions comprising based on the composition A) 10-75 wt-% of at least one liquid mineral acid selected from the group consisting of phosphoric acid, sulphuric acid, sulphurous acid, and nitric acid, B) 1-60 wt-% of at least one solid organic acid with pKa at 20° C. between 1.0 and 1.1, C) 15-80 wt-% of at least one carboxylic acid selected from the group consisting of citric acid monohydrate, hydroxyacetic acid, maleic acid, succinic acid, glutaric acid and adipinic acid, D) 5-40 wt-% urea, E) 0.1-10 wt-% of at least one non-ionic surfactant, and the rest up to 100 wt-% is water, wherein the composition contains less than 1 wt-% nonylphenol ethoxylates and halogen compounds.
    Type: Application
    Filed: November 5, 2007
    Publication date: June 23, 2011
    Inventors: Joachim Sauter, Anna Burczek, Ludger Grunwald, Karl Helminger, Hubert De Roquefeuil, Ralf Schuster
  • Publication number: 20090260215
    Abstract: A method for manufacturing motor vehicles at a manufacturing location (S), from which ready-assembled motor vehicles are built in a planned number and order of output. First modules (MA) are delivered in a specific assembly stage discontinuously from a first production shop (PA) to the manufacturing location (S) and are fed continuously into a manufacturing line (F) in which the modules (MA) are manufactured into motor vehicles (A). Second modules (MB) be fed in a specific assembly stage from a second production shop (PB) into the joint manufacturing line (F) at a sequencing station (5) alternately with the modules (MA). Thus, vehicles of first and second model series can be manufactured on one and the same manufacturing line.
    Type: Application
    Filed: March 26, 2009
    Publication date: October 22, 2009
    Applicant: Dr.Ing.h.c.F.Porsche Aktiengesellschaft
    Inventors: Christian Meyer, Ralf Schuster, Lutz Muller, Pascal Kauffelin
  • Patent number: 6895294
    Abstract: The present invention relates to a system for the manufacture of semiconductor devices by lithography, and in particular to an assembly of mask containers for use in such a system. The system comprises: a plurality of mask containers adapted to engage with one another such that two or more containers can be carried together as a stack; a plurality of lithography bays; a transport rail system for carrying the containers between different lithography bays. Each lithography bay has a transmitter/receiver unit for communicating lithography data with a tracking device located in each container, allowing for more efficient mask management. The transportation of the containers in stacks results in an improvement in efficiency.
    Type: Grant
    Filed: December 4, 2000
    Date of Patent: May 17, 2005
    Assignees: Freescale Semiconductor, Inc., Infineon Technologies SC300 GmbH & Co. oHG, Infineon Technologies AG
    Inventors: Karl Emerson Mautz, Alain Bernhard Charles, John George Maltabes, Ralf Schuster
  • Patent number: 6881264
    Abstract: A process tool, preferably a spin coater, includes a set of at least three arms and an adjustable rinse nozzle. The arms lift a substrate, e.g. a semiconductor wafer, from a chuck inside the process chamber after having performed the corresponding manufacturing step, e.g. coating. The contact area between the arms and the substrate is as small as possible. The rinse nozzle dispenses a solvent liquid onto the backside of the substrate, thereby removing contaminating particles located at the area of contact between the vacuum channels of the chuck and the substrate. The set of arms rotates for a homogeneous cleaning. A gas flowing out of vacuum ports of the chuck prevents the vacuum ports from being obstructed with particles. While the substrate is being lifted, the chuck can also be cleaned by dispensing the solvent liquid onto the chuck.
    Type: Grant
    Filed: August 19, 2003
    Date of Patent: April 19, 2005
    Assignees: Infineon Technologies AG, Infineon Technologies SC300 GmbH, Motorola Inc.
    Inventors: Mark Hiatt, Karl Mautz, Ralf Schuster
  • Publication number: 20040154530
    Abstract: A process tool, preferably a spin coater, includes a set of at least three arms and an adjustable rinse nozzle. The arms lift a substrate, e.g. a semiconductor wafer, from a chuck inside the process chamber after having performed the corresponding manufacturing step, e.g. coating. The contact area between the arms and the substrate is as small as possible. The rinse nozzle dispenses a solvent liquid onto the backside of the substrate, thereby removing contaminating particles located at the area of contact between the vacuum channels of the chuck and the substrate. The set of arms rotates for a homogeneous cleaning. A gas flowing out of vacuum ports of the chuck prevents the vacuum ports from being obstructed with particles. While the substrate is being lifted, the chuck can also be cleaned by dispensing the solvent liquid onto the chuck.
    Type: Application
    Filed: August 19, 2003
    Publication date: August 12, 2004
    Inventors: Mark Hiatt, Karl Mautz, Ralf Schuster
  • Publication number: 20030074097
    Abstract: The present invention relates to a system for the manufacture of semiconductor devices by lithography, and in particular to an assembly of mask containers for use in such a system. The system comprises: a plurality of mask containers adapted to engage with one another such that two or more containers can be carried together as a stack; a plurality of lithography bays; a transport rail system for carrying the containers between different lithography bays. Each lithography bay has a transmitter/receiver unit for communicating lithography data with a tracking device located in each container, allowing for more efficient mask management. The transportation of the containers in stacks results in an improvement in efficiency.
    Type: Application
    Filed: December 4, 2000
    Publication date: April 17, 2003
    Applicant: Motorola, Inc., Semiconductor 300 GmbH & Co. KG, and Infineon Technologies AG.
    Inventors: Karl Emerson Mautz, Alain Bernard Charles, John George Maltabes, Ralf Schuster