Abstract: A system is provided for in-situ ion beam etch rate or deposition rate measurement, including: a vacuum chamber; an ion beam source configured to direct an ion beam onto a first surface of a sample located within the vacuum chamber and to etch the first surface of the sample with an etch rate; or a material source configured to deposit material onto a first surface of a sample located within the vacuum chamber with a deposition rate; and an interferometric measurement device located at least partially within the vacuum chamber and configured to direct light onto a second surface of the sample and to determine the etch rate of the ion beam or the deposition rate of the deposited material in-situ based on light reflected from the sample.

Abstract: A process for detecting nucleic acids, having the following steps: providing at least one nanoparticle that is functionalised for the nucleic acid to be detected by means of at least one oligonucleotide that is bound to it and that is able to hybridize with at least one segment of a nucleic acid to be detected; bringing the functionalised nanoparticle into contact with a sample in which the nucleic acid is to be detected; and measuring a property that provides information about the degree of hybridization of the at least one oligonucleotide with the nucleic acid to be detected. In addition, the process includes the step of exciting the nanoparticles to generate heat, for example by means of a photothermal effect. The invention is suitable, in particular, for high-throughput DNA analysis.