Abstract: Methods and apparatus for depositing a coating material on an underlying substrate are disclosed. Cathode sputtering techniques for rapidly depositing a relatively thick coating on a substrate having a complex geometry are developed. The apparatus employed includes a sputtering chamber formed between a center, post cathode and a hollow, cylindrical cathode. In one embodiment a magnetic field is imposed upon the sputtering chamber to concentrate the sputtered coating material in a preferred region.

Abstract: Coatings are described which are particularly suited for the protection of nickel and cobalt superalloy articles at elevated temperatures. The protective nature of the coatings is due to the formation of an alumina layer on the surface of the coating which serves to reduce oxidation/corrosion. The coatings contain aluminum, chromium, yttrium (or other oxygen active elements) and a metal chosen from the group consisting of nickel, cobalt and iron or mixtures thereof. The coatings further contain a controlled percentage of silicon which serves to greatly improve the protection afforded by the alumina film to the surface of the coating.