Patents by Inventor Ralph Kerns

Ralph Kerns has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming a capacitor using a high K dielectric material
    Publication number: 20030222296
    Abstract: A method of forming a capacitor using a high dielectric constant material.
    Type: Application
    Filed: June 4, 2002
    Publication date: December 4, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Ajay Kumar, Padmapani Nallan, Anisul H. Khan, Ralph Kerns, Virinder S. Grewal
  • Method of preventing short circuits in magnetic film stacks
    Publication number: 20030180968
    Abstract: A method for preventing electrical short circuits in a multi-layer magnetic film stack comprises providing a film stack that includes a layer of magnetic material having an exposed surface. A protective layer is deposited on the exposed surface of the magnetic layer. The protective layer may comprise, for example, a fluorocarbon or a hydrofluorocarbon. The film stack is etched and the protective layer protects the exposed surface from a conductive residue produced while etching the film stack. The method may be used in film stacks to form a magneto-resistive random access memory (MRAM) device.
    Type: Application
    Filed: September 4, 2002
    Publication date: September 25, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Padmapani C. Nallan, Ajay Kumar, Jeng H. Hwang, Guangxiang Jin, Ralph Kerns