Abstract: A method of operating a particle beam system includes determining a deflection amount and a deflection time of a beam deflection module connected to a data network. The method also includes determining an un-blank time of a beam blanking module connected to the data network, and determining a blank time of the beam blanking module connected to the data network. The method further includes generating a data structure which includes plural data records, wherein each data record includes a command representing an instruction for at least one of the modules, and a command time representing a time at which the instruction is to be sent to the data network. In addition, the method includes sorting the records of the data structure by command time, and generating a set of digital commands based on the data structure. Moreover, the method includes sending the digital commands of the set to the network in an order corresponding to an order of the sorted records.

Abstract: An ion beam system comprises a voltage supply system 7 and at least one beam deflector 39 having a plurality of first defection electrodes 51a, 51b, 51c and a plurality of second deflection electrodes 52a, 52b, 52c wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plurality of second deflection electrodes such that electric deflection fields between the plurality of second deflection electrodes and the plurality of opposite first deflection electrodes have a common orientation. The ion beam system has a high kinetic energy mode in which a distribution of the electric deflection fields has a greater width, and a low kinetic energy mode in which a distribution of the electric deflection fields has a smaller width.

Abstract: A method of scanning a surface of an object using a particle beam comprises: determining a surface portion of the surface of the object, wherein the surface portion is to be scanned; determining initial positions of a set of raster points within the surface portion; changing the positions of at least some raster points of the set of raster points; and then scanning the surface portion by directing the particle beam to the positions of the raster points.

Abstract: A method for producing a representation of an object using a particle beam, as well as a particle beam device for carrying out the method are disclosed. The system described herein is based on the object of specifying the method and the particle beam device for producing a representation of an object such that images which are produced, in particular including FFT images, are as free as possible of artifacts which are not caused by the object to be examined. This is achieved in particular in that pixel lives, line flyback times and pixel pause times are varied in raster patterns.

Abstract: A method of raster scanning a surface of an object using a particle beam comprises determining a basic set of raster points within a surface; determining a surface portion of the surface of the object, wherein the surface portion is to be raster scanned; ordering a set of raster points of the basic set located within the surface portion; and scanning of the surface portion by directing the particle beam onto the raster points of the ordered set in an order corresponding to an order of the raster points in the ordered set from the outside to the inside, i.e. starting from the boundary of the surface portion towards its center, or in the reverse order, i.e. from the inside to the outside.

Abstract: A method for producing a representation of an object using a particle beam, as well as a particle beam device for carrying out the method are disclosed. The system described herein is based on the object of specifying the method and the particle beam device for producing a representation of an object such that images which are produced, in particular including FFT images, are as free as possible of artifacts which are not caused by the object to be examined. This is achieved in particular in that pixel lives, line flyback times and pixel pause times are varied in raster patterns.

Abstract: An ion beam system comprises a voltage supply system 7 and at least one beam deflector 39 having at least one first deflection electrode 51a, 51b, 51c and plural second deflection electrodes 52a, 52b, 52c, wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation. The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.

Abstract: A method of processing of an object comprises scanning a particle beam across a surface of the object and detecting electrons emerging from the object due to the scanning; determining a height difference between the surface of the object and a predetermined surface for each of plural of locations on the surface of the object based on the detected electrons; determining a processing intensity for each of the plural locations on the surface of the object based on the determined height differences; and directing a particle beam to the plural locations based on the determined processing intensities, in order to remove material from or deposit material on the object at the plural locations.

Abstract: A particle beam device and a sample receptacle apparatus, which has a sample holder, are disclosed. The sample holder is arranged in a movable fashion along at least a first axis and along at least a second axis. Furthermore, the sample holder is arranged in a rotatable fashion about a first axis of rotation and about a second axis of rotation. A first sample holding device is arranged relative to the sample holder in a rotatable fashion about a third axis of rotation, in which the third axis of rotation and the second axis of rotation are at least in part arranged laterally offset with respect to one another. Furthermore, a control apparatus is provided, in which the first sample holding device is rotatable about the third axis of rotation into an analysis position and/or treating position using the control apparatus.

Abstract: A particle beam system includes a particle beam source for generating a particle beam, a high voltage source, a beam blanker system with deflection plates 56, 57, and a control circuit. The control circuit provides a first current path 67 between the two deflection plates, wherein a switch 70, a node 72 connected to the high voltage source and a switch 76 are arranged in this order in the first current path starting from the deflection plate 56. The control circuit provides a second current path 85 between the deflection plate 56 and the deflection plate 57, wherein in the second current path, starting from the deflection plate 56, a series connection 88 comprising a voltage source 91 a switch 90, a node 86 connected to the high voltage source and a series connection 92 comprising a voltage source 95 and a switch 94 are arranged in this order.

Abstract: A method for producing a representation of an object using a particle beam, as well as a particle beam device for carrying out the method are disclosed. The system described herein is based on the object of specifying the method and the particle beam device for producing a representation of an object such that images which are produced, in particular including FFT images, are as free as possible of artifacts which are not caused by the object to be examined. This is achieved in particular in that pixel lives, line flyback times and pixel pause times are varied in raster patterns.