Patents by Inventor Ralph Semmler

Ralph Semmler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220313422
    Abstract: An intraocular lens system for implantation in an eye is provided. The intraocular lens system includes a ciliary body implant having a passive ciliary signal element, the ciliary body implant being implantable in the eye such that the ciliary signal element provides a ciliary signal in response to a movement of the ciliary muscle of the eye. The intraocular lens system also includes an intraocular lens having a sensor element for receiving the ciliary signal. The ciliary body implant and the intraocular lens are formed separately from each other and the intraocular system is configured to control a refractive effect of the intraocular lens that is dependent on the ciliary signal received from the sensor element.
    Type: Application
    Filed: June 16, 2022
    Publication date: October 6, 2022
    Inventors: Jan Buchheister, Peter Klopfleisch, Lothar Müller, Ralph Semmler, Enrico Geißler
  • Patent number: 7525115
    Abstract: Apparatus for inspecting objects especially masks in microlithography that are disposed in a vacuum chamber. The apparatus includes a converter for converting illuminating radiation emitted from the object into a radiation of a higher wavelength. A sensor for recording images is disposed outside the vacuum chamber and arranged as an optical interface from the vacuum chamber to the sensor of the converter or at least one part of an image lens is arranged as a window in the vacuum chamber.
    Type: Grant
    Filed: April 20, 2004
    Date of Patent: April 28, 2009
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Hans-Juergen Dobschal, Wolfgang Harnisch, Thomas Scheruebl, Nobert Rosenkranz, Ralph Semmler
  • Publication number: 20060262306
    Abstract: Apparatus for inspecting objects especially masks in microlithography that are disposed in a vacuum chamber. The apparatus includes a converter for converting illuminating radiation emitted from the object into a radiation of a higher wavelength. A sensor for recording images is disposed outside the vacuum chamber and arranged as an optical interface from the vacuum chamber to the sensor of the converter or at least one part of an image lens is arranged as a window in the vacuum chamber.
    Type: Application
    Filed: April 20, 2004
    Publication date: November 23, 2006
    Inventors: Hans-Juergen Dobschal, Wolfgang Harnisch, Thomas Scheruebl, Nobert Rosenkranz, Ralph Semmler