Abstract: A method of determining a characteristic of one or more processes for manufacturing features on a substrate, the method including: obtaining image data of a plurality of features on a least part of at least one region on a substrate; using the image data to obtain measured data of one or more dimensions of each of at least some of the plurality of features; determining a statistical parameter that is dependent on the variation of the measured data of one or more dimensions of each of at least some of the plurality of features; determining a probability of defective manufacture of features in dependence on a determined number of defective features in the image data; and determining the characteristic of the one or more processes to have the probability of defective manufacture of features and the statistical parameter.

Abstract: A method of determining a characteristic of one or more processes for manufacturing features on a substrate, the method including: obtaining image data of a plurality of features on a least part of at least one region on a substrate; using the image data to obtain measured data of one or more dimensions of each of at least some of the plurality of features; determining a statistical parameter that is dependent on the variation of the measured data of one or more dimensions of each of at least some of the plurality of features; determining a probability of defective manufacture of features in dependence on a determined number of defective features in the image data; and determining the characteristic of the one or more processes to have the probability of defective manufacture of features and the statistical parameter.

Abstract: A method, system and program for determining a position of a feature referenced to a substrate. The method includes measuring a position of the feature, receiving an intended placement of the feature and determining an estimate of a placement error based on knowledge of a relative position of a first reference feature referenced to a first layer on a substrate with respect to a second reference feature referenced to a second layer on a substrate. The updated position may be used to position the layer of the substrate having the feature, or another layer of the substrate, or another layer of another substrate.

Abstract: A method of determining a characteristic of one or more processes for manufacturing features on a substrate, the method including: obtaining image data of a plurality of features on a least part of at least one region on a substrate; using the image data to obtain measured data of one or more dimensions of each of at least some of the plurality of features; determining a statistical parameter that is dependent on the variation of the measured data of one or more dimensions of each of at least some of the plurality of features; determining a probability of defective manufacture of features in dependence on a determined number of defective features in the image data; and determining the characteristic of the one or more processes to have the probability of defective manufacture of features and the statistical parameter.

Abstract: The invention provides a non-invasive skin treatment device (100) comprising an r.f. treatment electrode (10); a return electrode (40); an r.f. generator (20) configured and arranged such that, during treatment, an r.f. treatment signal is applied between the r.f. treatment electrode (10) and the return electrode (40) for heating an inner region (15) of skin; an impedance measurement circuit (35) configured and arranged to measure, before treatment of the inner region, an initial skin impedance (Zo) between the r.f. treatment electrode (10) and the return electrode (40); and a treatment settings determiner (30) configured and arranged to determine, before treatment of the inner region (15), treatment settings associated with the r.f. treatment signal depending on the initial skin impedance (Zo) and on a dimension of the r.f. treatment electrode (10) in the contact plane, the treatment settings comprising at least one of a treatment duration (TD) associated with a desired treatment result, and an r.f.

Abstract: A method, system and program for determining a position of a feature referenced to a substrate. The method includes measuring a position of the feature, receiving an intended placement of the feature and determining an estimate of a placement error based on knowledge of a relative position of a first reference feature referenced to a first layer on a substrate with respect to a second reference feature referenced to a second layer on a substrate. The updated position may be used to position the layer of the substrate having the feature, or another layer of the substrate, or another layer of another substrate.

Abstract: A method, system and program for determining a position of a feature referenced to a substrate. The method includes measuring a position of the feature, receiving an intended placement of the feature and determining an estimate of a placement error based on knowledge of a relative position of a first reference feature referenced to a first layer on a substrate with respect to a second reference feature referenced to a second layer on a substrate. The updated position may be used to position the layer of the substrate having the feature, or another layer of the substrate, or another layer of another substrate.

Abstract: A method, system and program for determining a position of a feature referenced to a substrate. The method includes measuring a position of the feature, receiving an intended placement of the feature and determining an estimate of a placement error based on knowledge of a relative position of a first reference feature referenced to a first layer on a substrate with respect to a second reference feature referenced to a second layer on a substrate. The updated position may be used to position the layer of the substrate having the feature, or another layer of the substrate, or another layer of another substrate.

Abstract: The invention provides a non-invasive skin treatment device (100) comprising an r.f. treatment electrode (10); a return electrode (40); an r.f. generator (20) configured and arranged such that, during treatment, an r.f. treatment signal is applied between the r.f. treatment electrode (10) and the return electrode (40) for heating an inner region (15) of skin; an impedance measurement circuit (35) configured and arranged to measure, before treatment of the inner region, an initial skin impedance (Zo) between the r.f. treatment electrode (10) and the return electrode (40); and a treatment settings determiner (30) configured and arranged to determine, before treatment of the inner region (15), treatment settings associated with the r.f. treatment signal depending on the initial skin impedance (Zo) and on a dimension of the r.f. treatment electrode (10) in the contact plane, the treatment settings comprising at least one of a treatment duration (TD) associated with a desired treatment result, and an r.f.