Patents by Inventor Ralu Divan

Ralu Divan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240312665
    Abstract: High-resolution, X-ray phase contrast microscopy, a key technique with promising potential in biomedical imaging and diagnostics, is based on narrow-slit high-aspect-ratio gold gratings. We present the development, fabrication details, and experimental testing of the freestanding 10-?m-thick gold membrane masks with an array of 0.9-1.5 ?m void slit apertures for a novel low-energy X-ray microscope. The overall mask size is 4 mm×4 mm, with a grating pitch of 7.5 ?m, 6.0-6.6-?m-wide gold bars are supported by 3-?m-wide crosslinks at 400 ?m intervals. The fabrication process is based on gold electroplating into a silicon mold coated with various thin films to form a voltage barrier, plating base, and sacrificial layer, followed by the mold removal to obtain the freestanding gold membrane with void slit apertures. We discuss key aspects for the materials and processes, including gold structures homogeneity, residual stresses, and prevention of collapsing of the grid elements.
    Type: Application
    Filed: October 6, 2023
    Publication date: September 19, 2024
    Applicant: Creatv MicroTech, Inc.
    Inventors: Olga V. Makarova, Ralu Divan, Nicolaie Moldovan, David A. Czaplewski, Cha-Mei Tang
  • Patent number: 11785943
    Abstract: A material with nanopillar structures extending from a substrate. The nanopillars are engageable by organisms to cause an interaction, such as cellular destruction.
    Type: Grant
    Filed: September 21, 2018
    Date of Patent: October 17, 2023
    Assignee: UChicago Argonne, LLC
    Inventors: Philip D. Laible, Martyna Michalska, Philippe Noirot, Ralu Divan, Igor Aronson, Andrey Sokolov
  • Patent number: 11247896
    Abstract: A material with a nanotexture comprising structures extending from a substrate. The structures are modified by coating the nanotexture with a protective coating and partially removing the coating, exposing a portion of the structure for functionalization.
    Type: Grant
    Filed: July 30, 2019
    Date of Patent: February 15, 2022
    Assignee: UChicago Argonne, LLC
    Inventors: Martyna Michalska, Philip D. Laible, Ralu Divan
  • Patent number: 10793964
    Abstract: A method of manufacturing a functionalized pre-treated carbon nanotube. Atomic Layer deposition is utilized to functionalize a pre-treated carbon nanotube. The functionalized pre-treated carbon nanotube may be used in a chemiresistor, including for methane detection.
    Type: Grant
    Filed: May 4, 2016
    Date of Patent: October 6, 2020
    Assignees: UChicago Argonne, LLC, The Regents of the University of California
    Inventors: Ralu Divan, M. Tanim Humayun, Igor Paprotny, Lara A. Gundel
  • Publication number: 20200039819
    Abstract: A material with a nanotexture comprising structures extending from a substrate. The structures are modified by coating the nanotexture with a protective coating and partially removing the coating, exposing a portion of the structure for functionalization.
    Type: Application
    Filed: July 30, 2019
    Publication date: February 6, 2020
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Martyna Michalska, Philip D. Laible, Ralu Divan
  • Publication number: 20190093150
    Abstract: A material with nanopillar structures extending from a substrate. The nanopillars are engageable by organisms to cause an interaction, such as cellular destruction.
    Type: Application
    Filed: September 21, 2018
    Publication date: March 28, 2019
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Philip D. LAIBLE, Martyna MICHALSKA, Philippe NOIROT, Ralu DIVAN, Igor ARONSON, Andrey SOKOLOV
  • Publication number: 20190090478
    Abstract: A material with nanopillar structures extending from a substrate. The nanopillars are engageable by organisms to cause an interaction, such as cellular destruction.
    Type: Application
    Filed: September 21, 2018
    Publication date: March 28, 2019
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Philip D. LAIBLE, Martyna MICHALSKA, Philippe NOIROT, Ralu DIVAN, Igor ARONSON, Andrey SOKOLOV
  • Publication number: 20170322174
    Abstract: A method of manufacturing a functionalized pre-treated carbon nanotube. Atomic Layer deposition is utilized to functionalize a pre-treated carbon nanotube. The functionalized pre-treated carbon nanotube may be used in a chemiresistor, including for methane detection.
    Type: Application
    Filed: May 4, 2016
    Publication date: November 9, 2017
    Applicant: UChicago Argonne, LLC
    Inventors: Ralu Divan, M. Tanim Humayun, Igor Paprotny, Lara A. Gundel
  • Patent number: 9299526
    Abstract: A source cold cathode field emission array (FEA) source based on ultra-nanocrystalline diamond (UNCD) field emitters. This system was constructed as an alternative for detection of obscured objects and material. Depending on the geometry of the given situation a flat-panel source can be used in tomography, radiography, or tomosynthesis. Furthermore, the unit can be used as a portable electron or X-ray scanner or an integral part of an existing detection system. UNCD field emitters show great field emission output and can be deposited over large areas as the case with carbon nanotube “forest” (CNT) cathodes. Furthermore, UNCDs have better mechanical and thermal properties as compared to CNT tips which further extend the lifetime of UNCD based FEA.
    Type: Grant
    Filed: April 25, 2014
    Date of Patent: March 29, 2016
    Assignees: UChicago Argonne, LLC, The Curators of the University of Missouri
    Inventors: Anirudha V. Sumant, Ralu Divan, Chrystian M. Posada, Carlos H. Castano, Edwin J. Grant, Hyoung K. Lee
  • Publication number: 20150311023
    Abstract: A source cold cathode field emission array (FEA) source based on ultra-nanocrystalline diamond (UNCD) field emitters. This system was constructed as an alternative for detection of obscured objects and material. Depending on the geometry of the given situation a flat-panel source can be used in tomography, radiography, or tomosynthesis. Furthermore, the unit can be used as a portable electron or X-ray scanner or an integral part of an existing detection system. UNCD field emitters show great field emission output and can be deposited over large areas as the case with carbon nanotube “forest” (CNT) cathodes. Furthermore, UNCDs have better mechanical and thermal properties as compared to CNT tips which further extend the lifetime of UNCD based FEA.
    Type: Application
    Filed: April 25, 2014
    Publication date: October 29, 2015
    Applicant: UChicago Argonne, LLC
    Inventors: Anirudha V. Samant, Ralu Divan, Chrystian M. Posada, Carlos H. Castano, Edwin J. Grant, Hyoung K. Lee
  • Patent number: 9153453
    Abstract: A process is disclosed for sectioning by etching of monolayers and multilayers using an RIE technique with fluorine-based chemistry. In one embodiment, the process uses Reactive Ion Etching (RIE) alone or in combination with Inductively Coupled Plasma (ICP) using fluorine-based chemistry alone and using sufficient power to provide high ion energy to increase the etching rate and to obtain deeper anisotropic etching. In a second embodiment, a process is provided for sectioning of WSi2/Si multilayers using RIE in combination with ICP using a combination of fluorine-based and chlorine-based chemistries and using RF power and ICP power. According to the second embodiment, a high level of vertical anisotropy is achieved by a ratio of three gases; namely, CHF3, Cl2, and O2 with RF and ICP. Additionally, in conjunction with the second embodiment, a passivation layer can be formed on the surface of the multilayer which aids in anisotropic profile generation.
    Type: Grant
    Filed: February 10, 2012
    Date of Patent: October 6, 2015
    Assignees: Brookhaven Science Associates, LLC, UChicago Argonne, LLC
    Inventors: Nathalie C. D. Bouet, Raymond P. Conley, Ralu Divan, Albert Macrander
  • Publication number: 20120205785
    Abstract: A process is disclosed for sectioning by etching of monolayers and multilayers using an RIE technique with fluorine-based chemistry. In one embodiment, the process uses Reactive Ion Etching (RIE) alone or in combination with Inductively Coupled Plasma (ICP) using fluorine-based chemistry alone and using sufficient power to provide high ion energy to increase the etching rate and to obtain deeper anisotropic etching. In a second embodiment, a process is provided for sectioning of WSi2/Si multilayers using RIE in combination with ICP using a combination of fluorine-based and chlorine-based chemistries and using RF power and ICP power. According to the second embodiment, a high level of vertical anisotropy is achieved by a ratio of three gases; namely, CHF3, Cl2, and O2 with RF and ICP. Additionally, in conjunction with the second embodiment, a passivation layer can be formed on the surface of the multilayer which aids in anisotropic profile generation.
    Type: Application
    Filed: February 10, 2012
    Publication date: August 16, 2012
    Applicant: Brookhaven Science Associates, LLC
    Inventors: Nathalie C.D. Bouet, Raymond P. Conley, Ralu Divan, Albert Macrander