Patents by Inventor Ralu Divan
Ralu Divan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240312665Abstract: High-resolution, X-ray phase contrast microscopy, a key technique with promising potential in biomedical imaging and diagnostics, is based on narrow-slit high-aspect-ratio gold gratings. We present the development, fabrication details, and experimental testing of the freestanding 10-?m-thick gold membrane masks with an array of 0.9-1.5 ?m void slit apertures for a novel low-energy X-ray microscope. The overall mask size is 4 mm×4 mm, with a grating pitch of 7.5 ?m, 6.0-6.6-?m-wide gold bars are supported by 3-?m-wide crosslinks at 400 ?m intervals. The fabrication process is based on gold electroplating into a silicon mold coated with various thin films to form a voltage barrier, plating base, and sacrificial layer, followed by the mold removal to obtain the freestanding gold membrane with void slit apertures. We discuss key aspects for the materials and processes, including gold structures homogeneity, residual stresses, and prevention of collapsing of the grid elements.Type: ApplicationFiled: October 6, 2023Publication date: September 19, 2024Applicant: Creatv MicroTech, Inc.Inventors: Olga V. Makarova, Ralu Divan, Nicolaie Moldovan, David A. Czaplewski, Cha-Mei Tang
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Patent number: 11785943Abstract: A material with nanopillar structures extending from a substrate. The nanopillars are engageable by organisms to cause an interaction, such as cellular destruction.Type: GrantFiled: September 21, 2018Date of Patent: October 17, 2023Assignee: UChicago Argonne, LLCInventors: Philip D. Laible, Martyna Michalska, Philippe Noirot, Ralu Divan, Igor Aronson, Andrey Sokolov
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Patent number: 11247896Abstract: A material with a nanotexture comprising structures extending from a substrate. The structures are modified by coating the nanotexture with a protective coating and partially removing the coating, exposing a portion of the structure for functionalization.Type: GrantFiled: July 30, 2019Date of Patent: February 15, 2022Assignee: UChicago Argonne, LLCInventors: Martyna Michalska, Philip D. Laible, Ralu Divan
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Patent number: 10793964Abstract: A method of manufacturing a functionalized pre-treated carbon nanotube. Atomic Layer deposition is utilized to functionalize a pre-treated carbon nanotube. The functionalized pre-treated carbon nanotube may be used in a chemiresistor, including for methane detection.Type: GrantFiled: May 4, 2016Date of Patent: October 6, 2020Assignees: UChicago Argonne, LLC, The Regents of the University of CaliforniaInventors: Ralu Divan, M. Tanim Humayun, Igor Paprotny, Lara A. Gundel
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Publication number: 20200039819Abstract: A material with a nanotexture comprising structures extending from a substrate. The structures are modified by coating the nanotexture with a protective coating and partially removing the coating, exposing a portion of the structure for functionalization.Type: ApplicationFiled: July 30, 2019Publication date: February 6, 2020Applicant: UCHICAGO ARGONNE, LLCInventors: Martyna Michalska, Philip D. Laible, Ralu Divan
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Publication number: 20190093150Abstract: A material with nanopillar structures extending from a substrate. The nanopillars are engageable by organisms to cause an interaction, such as cellular destruction.Type: ApplicationFiled: September 21, 2018Publication date: March 28, 2019Applicant: UCHICAGO ARGONNE, LLCInventors: Philip D. LAIBLE, Martyna MICHALSKA, Philippe NOIROT, Ralu DIVAN, Igor ARONSON, Andrey SOKOLOV
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Publication number: 20190090478Abstract: A material with nanopillar structures extending from a substrate. The nanopillars are engageable by organisms to cause an interaction, such as cellular destruction.Type: ApplicationFiled: September 21, 2018Publication date: March 28, 2019Applicant: UCHICAGO ARGONNE, LLCInventors: Philip D. LAIBLE, Martyna MICHALSKA, Philippe NOIROT, Ralu DIVAN, Igor ARONSON, Andrey SOKOLOV
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Publication number: 20170322174Abstract: A method of manufacturing a functionalized pre-treated carbon nanotube. Atomic Layer deposition is utilized to functionalize a pre-treated carbon nanotube. The functionalized pre-treated carbon nanotube may be used in a chemiresistor, including for methane detection.Type: ApplicationFiled: May 4, 2016Publication date: November 9, 2017Applicant: UChicago Argonne, LLCInventors: Ralu Divan, M. Tanim Humayun, Igor Paprotny, Lara A. Gundel
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Patent number: 9299526Abstract: A source cold cathode field emission array (FEA) source based on ultra-nanocrystalline diamond (UNCD) field emitters. This system was constructed as an alternative for detection of obscured objects and material. Depending on the geometry of the given situation a flat-panel source can be used in tomography, radiography, or tomosynthesis. Furthermore, the unit can be used as a portable electron or X-ray scanner or an integral part of an existing detection system. UNCD field emitters show great field emission output and can be deposited over large areas as the case with carbon nanotube “forest” (CNT) cathodes. Furthermore, UNCDs have better mechanical and thermal properties as compared to CNT tips which further extend the lifetime of UNCD based FEA.Type: GrantFiled: April 25, 2014Date of Patent: March 29, 2016Assignees: UChicago Argonne, LLC, The Curators of the University of MissouriInventors: Anirudha V. Sumant, Ralu Divan, Chrystian M. Posada, Carlos H. Castano, Edwin J. Grant, Hyoung K. Lee
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Publication number: 20150311023Abstract: A source cold cathode field emission array (FEA) source based on ultra-nanocrystalline diamond (UNCD) field emitters. This system was constructed as an alternative for detection of obscured objects and material. Depending on the geometry of the given situation a flat-panel source can be used in tomography, radiography, or tomosynthesis. Furthermore, the unit can be used as a portable electron or X-ray scanner or an integral part of an existing detection system. UNCD field emitters show great field emission output and can be deposited over large areas as the case with carbon nanotube “forest” (CNT) cathodes. Furthermore, UNCDs have better mechanical and thermal properties as compared to CNT tips which further extend the lifetime of UNCD based FEA.Type: ApplicationFiled: April 25, 2014Publication date: October 29, 2015Applicant: UChicago Argonne, LLCInventors: Anirudha V. Samant, Ralu Divan, Chrystian M. Posada, Carlos H. Castano, Edwin J. Grant, Hyoung K. Lee
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Patent number: 9153453Abstract: A process is disclosed for sectioning by etching of monolayers and multilayers using an RIE technique with fluorine-based chemistry. In one embodiment, the process uses Reactive Ion Etching (RIE) alone or in combination with Inductively Coupled Plasma (ICP) using fluorine-based chemistry alone and using sufficient power to provide high ion energy to increase the etching rate and to obtain deeper anisotropic etching. In a second embodiment, a process is provided for sectioning of WSi2/Si multilayers using RIE in combination with ICP using a combination of fluorine-based and chlorine-based chemistries and using RF power and ICP power. According to the second embodiment, a high level of vertical anisotropy is achieved by a ratio of three gases; namely, CHF3, Cl2, and O2 with RF and ICP. Additionally, in conjunction with the second embodiment, a passivation layer can be formed on the surface of the multilayer which aids in anisotropic profile generation.Type: GrantFiled: February 10, 2012Date of Patent: October 6, 2015Assignees: Brookhaven Science Associates, LLC, UChicago Argonne, LLCInventors: Nathalie C. D. Bouet, Raymond P. Conley, Ralu Divan, Albert Macrander
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Publication number: 20120205785Abstract: A process is disclosed for sectioning by etching of monolayers and multilayers using an RIE technique with fluorine-based chemistry. In one embodiment, the process uses Reactive Ion Etching (RIE) alone or in combination with Inductively Coupled Plasma (ICP) using fluorine-based chemistry alone and using sufficient power to provide high ion energy to increase the etching rate and to obtain deeper anisotropic etching. In a second embodiment, a process is provided for sectioning of WSi2/Si multilayers using RIE in combination with ICP using a combination of fluorine-based and chlorine-based chemistries and using RF power and ICP power. According to the second embodiment, a high level of vertical anisotropy is achieved by a ratio of three gases; namely, CHF3, Cl2, and O2 with RF and ICP. Additionally, in conjunction with the second embodiment, a passivation layer can be formed on the surface of the multilayer which aids in anisotropic profile generation.Type: ApplicationFiled: February 10, 2012Publication date: August 16, 2012Applicant: Brookhaven Science Associates, LLCInventors: Nathalie C.D. Bouet, Raymond P. Conley, Ralu Divan, Albert Macrander