Patents by Inventor Ram B. Sharma

Ram B. Sharma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cyclic sulfonate compounds as photoacid generators in resist applications
    Patent number: 11292764
    Abstract: Novel photoacid generator compounds are provided. Compositions that include the novel photoacid generator compounds are also provided. The present disclosure further provides methods of making and using the photoacid generator compounds and compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
    Type: Grant
    Filed: March 14, 2019
    Date of Patent: April 5, 2022
    Assignee: HERAEUS EPURIO LLC
    Inventors: Yongqiang Zhang, Ram B. Sharma
  • Sulfonic acid derivative compounds as photoacid generators in resist applications
    Patent number: 10976658
    Abstract: Novel photoacid generator compounds are provided. Compositions that include the novel photoacid generator compounds are also provided. The present disclosure further provides methods of making and using the photoacid generator compounds and compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
    Type: Grant
    Filed: August 11, 2016
    Date of Patent: April 13, 2021
    Assignee: HERAEUS EPURIO LLC
    Inventors: Yongqiang Zhang, Darin Campo, Ram B. Sharma, Martin Kunz
  • CYCLIC SULFONATE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS
    Publication number: 20210002213
    Abstract: Novel photoacid generator compounds are provided. Compositions that include the novel photoacid generator compounds are also provided. The present disclosure further provides methods of making and using the photoacid generator compounds and compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
    Type: Application
    Filed: March 14, 2019
    Publication date: January 7, 2021
    Inventors: Yongqiang Zhang, Ram B. Sharma
  • SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS
    Publication number: 20200089110
    Abstract: Novel photoacid generator compounds are provided. Compositions that include the novel photoacid generator compounds are also provided. The present disclosure further provides methods of making and using the photoacid generator compounds and compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
    Type: Application
    Filed: August 11, 2016
    Publication date: March 19, 2020
    Inventors: Yongqiang Zhang, Darin Campo, Ram B. Sharma, Martin Kunz
  • CYCLIC SULFONATE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS
    Publication number: 20200017441
    Abstract: Novel photoacid generator compounds are provided. Compositions that include the novel photoacid generator compounds are also provided. The present disclosure further provides methods of making and using the photoacid generator compounds and compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
    Type: Application
    Filed: March 14, 2019
    Publication date: January 16, 2020
    Inventors: Yongqiang Zhang, Ram B. Sharma
  • Sulfonic acid derivative compounds as photoacid generators in resist applications
    Patent number: 9709886
    Abstract: Novel photoacid generator compounds are provided. Photoresist compositions that include the novel photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
    Type: Grant
    Filed: September 14, 2016
    Date of Patent: July 18, 2017
    Assignee: HERAEUS PRECIOUS METALS NORTH AMERICA DAYCHEM LLC
    Inventors: Yongqiang Zhang, Daniel Greene, Ram B. Sharma
  • SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS
    Publication number: 20170003587
    Abstract: Novel photoacid generator compounds are provided. Photoresist compositions that include the novel photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
    Type: Application
    Filed: September 14, 2016
    Publication date: January 5, 2017
    Inventors: Yongqiang ZHANG, Daniel GREENE, Ram B. SHARMA
  • Sulfonic acid derivative compounds as photoacid generators in resist applications
    Patent number: 9477150
    Abstract: Novel photoacid generator compounds are provided. Photoresist compositions that include the novel photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
    Type: Grant
    Filed: March 13, 2015
    Date of Patent: October 25, 2016
    Assignee: HERAEUS PRECIOUS METALS NORTH AMERICA DAYCHEM LLC
    Inventors: Yongqiang Zhang, Daniel Greene, Ram B. Sharma
  • SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS
    Publication number: 20160266487
    Abstract: Novel photoacid generator compounds are provided. Photoresist compositions that include the novel photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
    Type: Application
    Filed: March 13, 2015
    Publication date: September 15, 2016
    Inventors: Yongqiang ZHANG, Daniel GREENE, Ram B. SHARMA
  • Sulfonic acid derivative compounds as photoacid generators in resist applications
    Patent number: 9383644
    Abstract: Novel photoacid generator compounds are provided. Photoresist compositions that include the novel photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
    Type: Grant
    Filed: September 18, 2014
    Date of Patent: July 5, 2016
    Assignee: HERAEUS PRECIOUS METALS NORTH AMERICA DAYCHEM LLC
    Inventors: Yongqiang Zhang, Ram B. Sharma, Rachael Stuck, Daniel Greene, Rakesh Gupta, Jeffrey D. Fogle
  • SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS
    Publication number: 20160085148
    Abstract: Novel photoacid generator compounds are provided. Photoresist compositions that include the novel photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
    Type: Application
    Filed: September 18, 2014
    Publication date: March 24, 2016
    Inventors: Yongqiang Zhang, Ram B. Sharma, Rachael Stuck, Daniel Greene, Rakesh Gupta, Jeffrey D. Fogle
  • Transparent poly(arylene ether) compositions
    Patent number: 5691442
    Abstract: The transparency of poly(arylene ether) homopolymers and copolymers is improved by endcapping the polymer chain with an unsubstituted phenolic-based endcapping agent.
    Type: Grant
    Filed: September 17, 1996
    Date of Patent: November 25, 1997
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: Marilyn R. Unroe, Rakesh K. Gupta, Ram B. Sharma, Neil C. Thiesing