Patents by Inventor Ram Kumar Agnihotri

Ram Kumar Agnihotri has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of depositing thin films utilizing a polyimide mask
    Patent number: 4092442
    Abstract: A polyimide mask is used as an undercoat for a standard resist material during the patterning of an underlying thin film layer by plasma etching. The polyimide mask can withstand the conditions of reactive ion (plasma) etching so that it can be used as a protective coating when the thin film is subtractively etched by the plasma etching. The polyimide is particularly useful in processes using either positive or negative electron beam lithography which require sensitive resists.
    Type: Grant
    Filed: December 30, 1976
    Date of Patent: May 30, 1978
    Assignee: International Business Machines Corporation
    Inventors: Ram Kumar Agnihotri, Herman Carl Kluge, II