Abstract: The present invention relates to a directly photoimageable polymer composition (DPPC) and methods for its use in forming microelectronic and optoelectronic devices. Such DPPC encompasses a polymer having at least one norbornene-type repeat unit having a pendant silyl containing radical and at least one norbornene-type repeat unit having an acrylate containing radical.

Abstract: Embodiments in accordance with the present invention are directed to providing processes for forming fluorinated-alkyl and particularly perfluorinated-alkyl sulfonamide substituted norbornene-type monomers.

Abstract: Embodiments in accordance with the present invention provide waveguide structures and methods of forming such structures where core and laterally adjacent cladding regions are defined. Some embodiments of the present invention provide waveguide structures where core regions are collectively surrounded by laterally adjacent cladding regions and cladding layers and methods of forming such structures.

Abstract: Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to devices, such as electrical, electronic and optoelectronic devices, that encompass such films.

Abstract: Embodiments in accordance with the present invention encompass polymers having at least one norbornene-type repeating unit derived from a norbornene-type monomer having a polyhedral oligosilsesquioxane pendant group. Such polymers, are formed by addition polymerizations that employ one of a neutral or cationic palladium catalyst or a neutral nickel catalyst. Such polymers are useful for a variety of applications such as a positive tone or negative tone photodefinable material, a low-k dielectric constant material, an etch selective layer, a sacrificial material or the like. In addition, embodiments of the present invention include devices formed using such polymers.

Abstract: The present invention relates to a directly photoimageable polymer composition (DPPC) and methods for its use in forming microelectronic and optoelectronic devices. Such DPPC encompasses a polymer having at least one norbornene-type repeat unit having a pendant silyl containing radical and at least one norbornene-type repeat unit having an acrylate containing radical.

Abstract: Methods for the addition polymerization of cycloolefins using a cationic Group 10 metal complex and a weakly coordinating anion of the formula: [(R?)zM(L?)x(L?)y]b[WCA]d wherein [(R?)zM(L?)x(L?)y] is a cation complex where M represents a Group 10 transition metal; R? represents an anionic hydrocarbyl containing ligand; L? represents a Group 15 neutral electron donor ligand; L? represents a labile neutral electron donor ligand; x is 1 or 2; and y is 0, 1, 2, or 3; and z is 0 or 1, wherein the sum of x, y, and z is 4; and [WCA] represents a weakly coordinating counteranion complex; and b and d are numbers representing the number of times the cation complex and weakly coordinating counteranion complex are taken to balance the electronic charge on the overall catalyst complex.

Abstract: The invention provides a method for producing an optical waveguide that includes the steps of: (a) forming a core structure, the core structure including an at least partially cured core composition, on a master defining a waveguide pattern; (b) applying over the top of the core structure and the master a cladding layer including a liquid cladding composition; (c) curing the cladding layer to form a core/cladding combination; and removing the core/cladding combination from the master so as to expose at least a portion of the core structure, wherein the refractive index of the core material is at least about 0.05 percent higher than the refractive index of the cladding material.

Abstract: The present invention relates to polymer compositions and methods of polymerizing such compositions. Furthermore, the present invention relates to polymer compositions that are useful in forming waveguides and to methods for making waveguides using such polymer compositions.

Abstract: The present invention relates to polymer compositions and methods of polymerizing such compositions. Furthermore, the present invention relates to polymer compositions that are useful in forming waveguides and to methods for making waveguides using such polymer compositions.

Abstract: The invention provides a method for producing an optical waveguide that includes the steps of: (a) forming a core structure, the core structure including an at least partially cured core composition, on a master defining a waveguide pattern; (b) applying over the top of the core structure and the master a cladding layer including a liquid cladding composition; (c) curing the cladding layer to form a core/cladding combination; and removing the core/cladding combination from the master so as to expose at least a portion of the core structure, wherein the refractive index of the core material is at least about 0.05 percent higher than the refractive index of the cladding material.

Abstract: A low molecular weight polyether oligomer is modified with a salt during chain extending reaction of the polyether oligomer to form electrostatic dissipative polymer products such as polyurethanes, polyether amide block copolymers and polyether-ester block copolymers. The reaction product polymers exhibit relatively low surface and volume resistivities, and static decay times which are not too fast or too slow, yet are free of excessive amounts of extractable anions, particularly chlorine, nitrate, phosphate and sulfate. The electrostatic dissipative polymers can be blended with a variety of base polymers to form plastic alloys, which in turn can be utilized to form articles useful in the manufacture of electrostatic sensitive electronic devices.