Patents by Inventor Ramana Murthy Pusuluri

Ramana Murthy Pusuluri has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • FIGURATIVE MODELS CALIBRATED TO CORRECT ERRORS IN PROCESS MODELS
    Publication number: 20180322228
    Abstract: A method for correcting a lithographic pattern includes selecting, by a processor, first stage input factors for utilization with a first computer-implemented model. The processor measures pattern data from existing measured dimensions of a semiconductor to obtain values for the first stage input factors and the first model against the measured pattern data. The processor applies the calibrated first model to predict printed dimensions and the printed dimensions from applying the calibrated first model comprise residuals. The processor establishes, based on the residuals, second stage input factors for a second model and calibrates the second model against the measured pattern data to predict deviations of the printed dimensions from the printed dimensions from the first stage input factors by utilizing the second stage input factors. The method produces predicted printed dimensions of a lithographic pattern by using the second model to revise the printed dimensions of the first model.
    Type: Application
    Filed: May 5, 2017
    Publication date: November 8, 2018
    Inventors: Pardeep KUMAR, Alan E. ROSENBLUTH, Ramana Murthy PUSULURI, Ramya VISWANATHAN
  • Figurative models calibrated to correct errors in process models
    Patent number: 10120963
    Abstract: A method for correcting a lithographic pattern includes selecting, by a processor, first stage input factors for utilization with a first computer-implemented model. The processor measures pattern data from existing measured dimensions of a semiconductor to obtain values for the first stage input factors and the first model against the measured pattern data. The processor applies the calibrated first model to predict printed dimensions and the printed dimensions from applying the calibrated first model comprise residuals. The processor establishes, based on the residuals, second stage input factors for a second model and calibrates the second model against the measured pattern data to predict deviations of the printed dimensions from the printed dimensions from the first stage input factors by utilizing the second stage input factors. The method produces predicted printed dimensions of a lithographic pattern by using the second model to revise the printed dimensions of the first model.
    Type: Grant
    Filed: May 5, 2017
    Date of Patent: November 6, 2018
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Pardeep Kumar, Alan E. Rosenbluth, Ramana Murthy Pusuluri, Ramya Viswanathan