Abstract: A system for inspecting and validating processes performed on a continuous web of fabric in an automated apparel manufacturing environment. The continuous web of fabric can move in a step wise fashion across a work area where tooling can perform one or more processes on the continuous web of fabric. At least one projector is provided to display an image onto the continuous web of fabric the image including a first image related to an article to be manufactured and a second image related to a reference grid. The continuous web of fabric and the first and second images are viewed by a camera, and data related to the viewed first and second images and the continuous web of fabric can be sent to a computer implemented control center which can analyze the data to determine whether a deviation or error exists regarding the manufacturing process.

Abstract: A system for inspecting and validating processes performed on a continuous web of fabric in an automated apparel manufacturing environment. The continuous web of fabric can move in a step wise fashion across a work area where tooling can perform one or more processes on the continuous web of fabric. At least one projector is provided to display an image onto the continuous web of fabric the image including a first image related to an article to be manufactured and a second image related to a reference grid. The continuous web of fabric and the first and second images are viewed by a camera, and data related to the viewed first and second images and the continuous web of fabric can be sent to a computer implemented control center which can analyze the data to determine whether a deviation or error exists regarding the manufacturing process.

Abstract: A photolithographic mask set for creating a plurality of characters on a device includes a plurality of photolithographic masks, wherein each mask includes at least one mask character area and at least one mask character field area that surrounds said mask character area; wherein each said mask character field area has a radiation energy density transmission factor Tf that is greater than zero, and wherein each mask character area has a radiation energy density transmission factor Tc that is greater than zero, such that each mask character field area and each mask character area of each mask is not opaque.

Abstract: A photolithographic mask set for creating a plurality of characters on a device includes a plurality of photolithographic masks, wherein each mask includes at least one mask character area and at least one mask character field area that surrounds said mask character area; wherein each said mask character field area has a radiation energy density transmission factor Tf that is greater than zero, and wherein each mask character area has a radiation energy density transmission factor Tc that is greater than zero, such that each mask character field area and each mask character area of each mask is not opaque.

Abstract: A photolithographic method for forming a plurality of characters on a device utilizes a mask set that includes a plurality of photolithographic masks, wherein each mask includes at least one non-opaque mask character field area that surrounds a non-opaque mask character area. Photoresist is exposed to radiation energy density through the set of masks using the masks sequentially to create at least one character field area of the photoresist, and a character area of the photoresist. Ultimately, because the character areas of the photoresist are exposed to some light energy density from the non-opaque mask character field areas during each mask exposure step, the total photoresist exposure time to create the series of characters is less than that of the prior art.

Abstract: A photolithographic method for forming a plurality of characters on a device utilizes a mask set that includes a plurality of photolithographic masks, wherein each mask includes at least one non-opaque mask character field area that surrounds a non-opaque mask character area. Photoresist is exposed to radiation energy density through the set of masks using the masks sequentially to create at least one character field area of the photoresist, and a character area of the photoresist. Ultimately, because the character areas of the photoresist are exposed to some light energy density from the non-opaque mask character field areas during each mask exposure step, the total photoresist exposure time to create the series of characters is less than that of the prior art.