Patents by Inventor Ramiel Oshana

Ramiel Oshana has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of making and apparatus having polishing pad with window
    Patent number: 7547243
    Abstract: A polishing layer of a polishing has a window member with a top surface positioned a predetermined distance below the polishing surface. A transparent layer can be positioned below the polishing layer and supporting the window member.
    Type: Grant
    Filed: August 17, 2007
    Date of Patent: June 16, 2009
    Assignee: Applied Materials, Inc.
    Inventors: Andreas Norbert Wiswesser, Ramiel Oshana, Kerry F. Hughes, Jay Rohde, David Datong Huo, Dominic J. Benvegnu
  • METHOD OF MAKING AND APPARATUS HAVING POLISHING PAD WITH WINDOW
    Publication number: 20070281587
    Abstract: A polishing layer of a polishing has a window member with a top surface positioned a predetermined distance below the polishing surface. A transparent layer can be positioned below the polishing layer arid supporting the window member.
    Type: Application
    Filed: August 17, 2007
    Publication date: December 6, 2007
    Applicant: Applied Materials, Inc.
    Inventors: Andreas Wiswesser, Ramiel Oshana, Kerry Hughes, Jay Rohde, David Huo, Dominic Benvegnu
  • Polishing pad with window
    Patent number: 7264536
    Abstract: A polishing layer of a polishing has a window member with a top surface positioned a predetermined distance below the polishing surface. A transparent layer can be positioned below the polishing layer and supporting the window member.
    Type: Grant
    Filed: September 23, 2003
    Date of Patent: September 4, 2007
    Assignee: Applied Materials, Inc.
    Inventors: Andreas Norbert Wiswesser, Ramiel Oshana, Kerry F. Hughes, Jay Rohde, David Datong Huo, Dominic J. Benvegnu
  • Polishing pad with window
    Publication number: 20050064802
    Abstract: A polishing layer of a polishing has a window member with a top surface positioned a predetermined distance below the polishing surface. A transparent layer can be positioned below the polishing layer and supporting the window member.
    Type: Application
    Filed: September 23, 2003
    Publication date: March 24, 2005
    Inventors: Andreas Wiswesser, Ramiel Oshana, Kerry Hughes, Jay Rohde, David Huo, Dominic Benvegnu