Patents by Inventor Ramkrishna Ghoshal

Ramkrishna Ghoshal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080113283
    Abstract: Siloxane epoxy materials employed as redistribution layers in electronic packaging and coatings for imprinting lithography, and methods of fabrication are disclosed.
    Type: Application
    Filed: April 30, 2007
    Publication date: May 15, 2008
    Applicants: POLYSET COMPANY, INC., RENSSELAER POLYTECHNIC INSTITUTE
    Inventors: Ramkrishna Ghoshal, Pei-I Wang, Toh-Ming Lu, Rajat Ghoshal, Ou Ya
  • Patent number: 7285842
    Abstract: Structures employing siloxane epoxy polymers as diffusion barriers adjacent conductive metal layers are disclosed. The siloxane epoxy polymers exhibit excellent adhesion to conductive metals, such as copper, and provide an increase in the electromigration lifetime of metal lines. In addition, the siloxane epoxy polymers have dielectric constants less then 3, and thus, provide improved performance over conventional diffusion barriers.
    Type: Grant
    Filed: April 27, 2004
    Date of Patent: October 23, 2007
    Assignees: Polyset Company, Inc., Rensselaer Polytechnic Institute
    Inventors: Pei-I Wang, Toh-Ming Lu, Shyam P. Murarka, Ramkrishna Ghoshal
  • Patent number: 7285579
    Abstract: Solventless siloxane epoxy-based coating compositions for use on metals, plastics, wood, and glass are disclosed. The compositions are cationically curable in air by U.V. or by electron beam radiation. The siloxane epoxy coating compositions exhibit excellent film properties after curing, such as good adhesion, flexibility, and appearance. The coating compositions may be clear or may contain fillers, dyes, and pigments. A method for manufacturing a coated metal, plastic, wood, or glass substrate using the compositions is also disclosed, as well as the coated material manufactured by the method.
    Type: Grant
    Filed: March 15, 2005
    Date of Patent: October 23, 2007
    Assignee: Polyset Company, Inc.
    Inventor: Ramkrishna Ghoshal
  • Patent number: 7019386
    Abstract: Semiconductor devices employing siloxane epoxy polymers as low-? dielectric films are disclosed. The devices include a semiconductor substrate, one or more metal layers or structures and one or more dielectric films, wherein at least one dielectric film in the devices is a siloxane epoxy polymer. Use of siloxane epoxy polymers is advantageous, in part, because the polymers adhere well to metals and have dielectric constants as low as 1.8. Thus, the disclosed semiconductor devices offer much better performance than devices fabricated using conventional dielectric materials. Furthermore, the siloxane epoxy polymer dielectrics are fully curable at low temperatures, exhibit low leakage currents, and remain stable at temperatures greater than 400° C.
    Type: Grant
    Filed: April 27, 2004
    Date of Patent: March 28, 2006
    Assignees: Polyset Company, Inc., Rensselaer Polytechnic Institute
    Inventors: Ramkrishna Ghoshal, Pei-I Wang, Toh-Ming Lu, Shyam P. Murarka
  • Patent number: 6962948
    Abstract: Solventless siloxane epoxy-based coating compositions for use on metals, plastics, wood, and glass are disclosed. The compositions are cationically curable in air by heat or by electron beam radiation. The siloxane epoxy coating compositions exhibit excellent film properties after curing, such as good adhesion, flexibility, weatherability, and corrosion resistance even in the absence of a chromium-containing filler. The coating compositions may be clear or may contain fillers and/or pigments. A method for manufacturing a coated metal, plastic, wood, or glass substrate using the compositions is also disclosed, as well as the coated material manufactured by the method.
    Type: Grant
    Filed: August 7, 2003
    Date of Patent: November 8, 2005
    Assignee: Polyset Company, Inc.
    Inventor: Ramkrishna Ghoshal
  • Publication number: 20050236711
    Abstract: Structures employing siloxane epoxy polymers as diffusion barriers adjacent conductive metal layers are disclosed. The siloxane epoxy polymers exhibit excellent adhesion to conductive metals, such as copper, and provide an increase in the electromigration lifetime of metal lines. In addition, the siloxane epoxy polymers have dielectric constants less then 3, and thus, provide improved performance over conventional diffusion barriers.
    Type: Application
    Filed: April 27, 2004
    Publication date: October 27, 2005
    Inventors: Pei-I Wang, Toh-Ming Lu, Shyam Murarka, Ramkrishna Ghoshal
  • Publication number: 20050236695
    Abstract: Semiconductor devices employing siloxane epoxy polymers as low-? dielectric films are disclosed. The devices include a semiconductor substrate, one or more metal layers or structures and one or more dielectric films, wherein at least one dielectric film in the devices is a siloxane epoxy polymer. Use of siloxane epoxy polymers is advantageous, in part, because the polymers adhere well to metals and have dielectric constants as low as 1.8. Thus, the disclosed semiconductor devices offer much better performance than devices fabricated using conventional dielectric materials. Furthermore, the siloxane epoxy polymer dielectrics are fully curable at low temperatures, exhibit low leakage currents, and remain stable at temperatures greater than 400° C.
    Type: Application
    Filed: April 27, 2004
    Publication date: October 27, 2005
    Inventors: Ramkrishna Ghoshal, Pei-I Wang, Toh-Ming Lu, Shyam Murarka
  • Publication number: 20050239295
    Abstract: A method for treating the surfaces of materials to improve wettability and adhesion of subsequently deposited polymer layers is disclosed. Suitable materials for practice of the method include polymeric materials and silicon-containing materials is disclosed. The method involves contacting at least a portion of the surface of the material with an aqueous solution of sulfuric acid or phosphoric acid, followed by rinsing with water. After the acid treatment, the contact angle of the surface decreases, and subsequently deposited polymer coatings easily wet the material's surface and exhibit enhanced adhesion. The method may be used to fabricate useful structures, such as semiconductor structures, optical waveguide structures, and coated articles.
    Type: Application
    Filed: April 27, 2004
    Publication date: October 27, 2005
    Inventors: Pei-l Wang, Toh-Ming Lu, Shyam Murarka, Ramkrishna Ghoshal
  • Publication number: 20050170187
    Abstract: Solventless siloxane epoxy-based coating compositions for use on metals, plastics, wood, and glass are disclosed. The compositions are cationically curable in air by U.V. or by electron beam radiation. The siloxane epoxy coating compositions exhibit excellent film properties after curing, such as good adhesion, flexibility, and appearance. The coating compositions may be clear or may contain fillers, dyes, and pigments. A method for manufacturing a coated metal, plastic, wood, or glass substrate using the compositions is also disclosed, as well as the coated material manufactured by the method.
    Type: Application
    Filed: March 15, 2005
    Publication date: August 4, 2005
    Applicant: Polyset Company, Inc.
    Inventor: Ramkrishna Ghoshal
  • Publication number: 20050042458
    Abstract: Solventless siloxane epoxy-based coating compositions for use on metals, plastics, wood, and glass are disclosed. The compositions are cationically curable in air by heat or by electron beam radiation. The siloxane epoxy coating compositions exhibit excellent film properties after curing, such as good adhesion, flexibility, weatherability, and corrosion resistance even in the absence of a chromium-containing filler. The coating compositions may be clear or may contain fillers and/or pigments. A method for manufacturing a coated metal, plastic, wood, or glass substrate using the compositions is also disclosed, as well as the coated material manufactured by the method.
    Type: Application
    Filed: August 7, 2003
    Publication date: February 24, 2005
    Applicant: Polyset Company Inc.
    Inventor: Ramkrishna Ghoshal
  • Patent number: 5863970
    Abstract: A composition useful as a die-attach adhesive, polymer bump or encapsulant comprises from about 5-100% by weight of a base resin and from zero to 95% by weight of a particulate filler such as silver, wherein the base resin contains (a) from 10-95 parts by weight of a cycloaliphatic epoxy-functional siloxane, (b) from about 5-90 parts by weight of a non-silicon-containing polyepoxy resin, .COPYRGT. from about 0.1-3 parts by weight of an iodonium salt, (d) from zero to about 3 parts by weight of a copper compound and, optionally, a silane adhesion promotor and/or an elastomeric toughener.
    Type: Grant
    Filed: February 4, 1997
    Date of Patent: January 26, 1999
    Assignees: Polyset Company, Inc., Motorola, Inc.
    Inventors: Ramkrishna Ghoshal, Prosanto Mukerji
  • Patent number: 5318808
    Abstract: Compositions for photocurable coatings are disclosed. The compositions comprise (a) an epoxidized vegetable oil, (b) a low molecular weight epoxy resin, (c) a photoinitiator for cationic polymerization and (d) a wax. Processes for making and using the coatings are also disclosed as are containers coated according to the invention.
    Type: Grant
    Filed: September 25, 1992
    Date of Patent: June 7, 1994
    Assignee: Polyset Company, Inc.
    Inventors: James V. Crivello, Ramkrishna Ghoshal
  • Patent number: 4136774
    Abstract: A two pocket rock bolt resin package containing, in one pocket, a polyester together with sodium bicarbonate and calcium carbonate and, in a second pocket, a curing agent, water and a weak acid.
    Type: Grant
    Filed: December 22, 1977
    Date of Patent: January 30, 1979
    Assignee: Rexnord Inc.
    Inventor: Ramkrishna Ghoshal