Abstract: The invention relates to a planar inductive component arranged over a substrate (103). The substrate in a first plane, a patterned ground shield (102), for shielding the winding (101) from the substrate (103). The winding (101) is at least substantially symmetrical plane. The patterned ground shield (102) comprises a plurality of electrical conductive first tracks (105) situated in a first ground shield plane in parallel with the first plane. The first tracks have an orientation perpendicular to the mirror plane (104). Without the patterned ground shield (102) the winding (101) is capacitively coupled to the substrate (103). The substrate resistance results in a degradation of the quality factor of the inductive component (100). The patterned ground shield (102) shields the winding (101) from the substrate (103), thereby eliminating the degrading effect of the substrate.

Abstract: The invention relates to a method of manufacturing a semiconductor device (10) in which, in a semiconductor body (1) with a temporary substrate (2), at least one semiconductor element (3) is formed which, on a side of the semiconductor body (1) opposite to the substrate (2), is provided with at least one connection region (4), and, on the said side, a dielectric (5) is formed and patterned to leave free the connection region (4), after which a metal layer (6) is deposited over the dielectric (5) so as to be in contact with the connection region (4), which metal layer (6) serves as an electric connection conductor of the connection region (4), after which the temporary substrate (2) is removed and the metal layer (6) also serves as a substrate of the device (10).