Patents by Inventor Ramon Mark HOFSTRA

Ramon Mark HOFSTRA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11237491
    Abstract: A system comprises a reflective optical element with a reflective surface that is configured to reflect a radiation beam. The reflective optical element also has a body. The system includes a thermal conditioning mechanism operative to thermally induce a deformation of the body under control of a controller. By means of controllably deforming the body, the shape of the reflective surface can be adjusted in a controlled manner.
    Type: Grant
    Filed: April 10, 2019
    Date of Patent: February 1, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Ramon Mark Hofstra, Andrey Sergeevich Tychkov, Francois Charles Dominique Deneuville, Gerardus Hubertus Petrus Maria Swinkels, Petrus Adrianus Theodorus Maria Ruijs
  • Publication number: 20210165336
    Abstract: A system comprises a reflective optical element with a reflective surface that is configured to reflect a radiation beam. The reflective optical element also has a body. The system includes a thermal conditioning mechanism operative to thermally induce a deformation of the body under control of a controller. By means of controllably deforming the body, the shape of the reflective surface can be adjusted in a controlled manner.
    Type: Application
    Filed: April 10, 2019
    Publication date: June 3, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Ramon Mark HOFSTRA, Andrey Sergeevich TYCHKOV, Francois Charles Dominique DENEUVILLE, Gerardus Hubertus Petrus Maria SWINKELS, Petrus Adrianu Theodorus Maria RUIJS
  • Patent number: 10222702
    Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.
    Type: Grant
    Filed: January 21, 2016
    Date of Patent: March 5, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Arno Jan Bleeker, Ramon Mark Hofstra, Erik Petrus Buurman, Johannes Hubertus Josephina Moors, Alexander Matthijs Struycken, Harm-Jan Voorma, Sumant Sukdew Ramanujan Oemrawsingh, Markus Franciscus Antonius Eurlings, Peter Frans Maria Muys
  • Publication number: 20180031979
    Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.
    Type: Application
    Filed: January 21, 2016
    Publication date: February 1, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Arno Jan BLEEKER, Ramon Mark HOFSTRA, Erik Petrus BUURMAN, Johannes Hubertus Josephina MOORS, Alexander Matthijs STRUYCKEN, Harm-Jan VOORMA, Sumant Sukdew Ramanujan OEMRAWSINGH, Markus Franciscus Antonius EURLINGS, Peter Frans Maria MUYS
  • Patent number: 9835950
    Abstract: A faceted reflector (32, 32?) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.
    Type: Grant
    Filed: December 19, 2014
    Date of Patent: December 5, 2017
    Assignee: ASML Netherland B.V.
    Inventors: Markus Franciscus Antonius Eurlings, Niek Antonius Jacobus Maria Kleemans, Antonius Johannes Josephus Van Dijsseldonk, Ramon Mark Hofstra, Oscar Franciscus Jozephus Noordman, Tien Nang Pham, Jan Bernard Plechelmus Van Schoot, Jiun-Cheng Wang, Kevin Weimin Zhang
  • Publication number: 20160334711
    Abstract: A faceted reflector (32, 32?) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.
    Type: Application
    Filed: December 19, 2014
    Publication date: November 17, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Markus Franciscus Antonius EURLINGS, Niek Antonius Jacobus Maria KLEEMANS, Antonius Johannes Josephus VAN DIJSSELDONK, Ramon Mark HOFSTRA, Oscar Franciscus Jozephus NOORDMAN, Tien Nang PHAM, Jan Bernard Plechelmus VAN SCHOOT, Jiun-Cheng WANG, Kevin Weimin ZHANG