Patents by Inventor Ramon Mark HOFSTRA
Ramon Mark HOFSTRA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11237491Abstract: A system comprises a reflective optical element with a reflective surface that is configured to reflect a radiation beam. The reflective optical element also has a body. The system includes a thermal conditioning mechanism operative to thermally induce a deformation of the body under control of a controller. By means of controllably deforming the body, the shape of the reflective surface can be adjusted in a controlled manner.Type: GrantFiled: April 10, 2019Date of Patent: February 1, 2022Assignee: ASML Netherlands B.V.Inventors: Ramon Mark Hofstra, Andrey Sergeevich Tychkov, Francois Charles Dominique Deneuville, Gerardus Hubertus Petrus Maria Swinkels, Petrus Adrianus Theodorus Maria Ruijs
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Publication number: 20210165336Abstract: A system comprises a reflective optical element with a reflective surface that is configured to reflect a radiation beam. The reflective optical element also has a body. The system includes a thermal conditioning mechanism operative to thermally induce a deformation of the body under control of a controller. By means of controllably deforming the body, the shape of the reflective surface can be adjusted in a controlled manner.Type: ApplicationFiled: April 10, 2019Publication date: June 3, 2021Applicant: ASML Netherlands B.V.Inventors: Ramon Mark HOFSTRA, Andrey Sergeevich TYCHKOV, Francois Charles Dominique DENEUVILLE, Gerardus Hubertus Petrus Maria SWINKELS, Petrus Adrianu Theodorus Maria RUIJS
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Patent number: 10222702Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.Type: GrantFiled: January 21, 2016Date of Patent: March 5, 2019Assignee: ASML Netherlands B.V.Inventors: Arno Jan Bleeker, Ramon Mark Hofstra, Erik Petrus Buurman, Johannes Hubertus Josephina Moors, Alexander Matthijs Struycken, Harm-Jan Voorma, Sumant Sukdew Ramanujan Oemrawsingh, Markus Franciscus Antonius Eurlings, Peter Frans Maria Muys
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Publication number: 20180031979Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.Type: ApplicationFiled: January 21, 2016Publication date: February 1, 2018Applicant: ASML Netherlands B.V.Inventors: Arno Jan BLEEKER, Ramon Mark HOFSTRA, Erik Petrus BUURMAN, Johannes Hubertus Josephina MOORS, Alexander Matthijs STRUYCKEN, Harm-Jan VOORMA, Sumant Sukdew Ramanujan OEMRAWSINGH, Markus Franciscus Antonius EURLINGS, Peter Frans Maria MUYS
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Patent number: 9835950Abstract: A faceted reflector (32, 32?) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.Type: GrantFiled: December 19, 2014Date of Patent: December 5, 2017Assignee: ASML Netherland B.V.Inventors: Markus Franciscus Antonius Eurlings, Niek Antonius Jacobus Maria Kleemans, Antonius Johannes Josephus Van Dijsseldonk, Ramon Mark Hofstra, Oscar Franciscus Jozephus Noordman, Tien Nang Pham, Jan Bernard Plechelmus Van Schoot, Jiun-Cheng Wang, Kevin Weimin Zhang
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Publication number: 20160334711Abstract: A faceted reflector (32, 32?) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.Type: ApplicationFiled: December 19, 2014Publication date: November 17, 2016Applicant: ASML Netherlands B.V.Inventors: Markus Franciscus Antonius EURLINGS, Niek Antonius Jacobus Maria KLEEMANS, Antonius Johannes Josephus VAN DIJSSELDONK, Ramon Mark HOFSTRA, Oscar Franciscus Jozephus NOORDMAN, Tien Nang PHAM, Jan Bernard Plechelmus VAN SCHOOT, Jiun-Cheng WANG, Kevin Weimin ZHANG