Patents by Inventor Ramya Ramalingam

Ramya Ramalingam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Extreme ultraviolet mask absorber materials
    Patent number: 11640109
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from antimony and nitrogen.
    Type: Grant
    Filed: January 25, 2021
    Date of Patent: May 2, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Shuwei Liu, Shiyu Liu, Vibhu Jindal, Azeddine Zerrade, Ramya Ramalingam
  • EUV mask blank absorber defect reduction
    Patent number: 11454876
    Abstract: Methods of coating extreme ultraviolet (EUV) reticle carrier assemblies are disclosed. The method includes depositing an adhesion layer on the EUV reticle carrier assembly, depositing at least one EUV absorber layer on the EUV reticle carrier assembly and depositing a stress-relieving layer on EUV reticle carrier assembly. The coated EUV reticle carrier assemblies exhibit reduced particle defect generation during EUV mask blank manufacturing.
    Type: Grant
    Filed: December 14, 2020
    Date of Patent: September 27, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Binni Varghese, Vibhu Jindal, Azeddine Zerrade, Shiyu Liu, Ramya Ramalingam
  • EUV Mask Blank Absorber Defect Reduction
    Publication number: 20220187696
    Abstract: Methods of coating extreme ultraviolet (EUV) reticle carrier assemblies are disclosed. The method includes depositing an adhesion layer on the EUV reticle carrier assembly, depositing at least one EUV absorber layer on the EUV reticle carrier assembly and depositing a stress-relieving layer on EUV reticle carrier assembly. The coated EUV reticle carrier assemblies exhibit reduced particle defect generation during EUV mask blank manufacturing.
    Type: Application
    Filed: December 14, 2020
    Publication date: June 16, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Binni Varghese, Vibhu Jindal, Azeddine Zerrade, Shiyu Liu, Ramya Ramalingam
  • Extreme Ultraviolet Mask Absorber Materials
    Publication number: 20210232042
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from antimony and nitrogen.
    Type: Application
    Filed: January 25, 2021
    Publication date: July 29, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Shuwei Liu, Shiyu Liu, Vibhu Jindal, Azeddine Zerrade, Ramya Ramalingam