Abstract: A substrate is coated on one face with a thin-films stack having reflection properties in the infrared and/or in solar radiation including at least one metallic functional layer, based on silver or on a metal alloy containing silver, and at least two antireflection coatings. The coatings each include at least one dielectric layer. The functional layer is positioned between the two antireflection coatings. The stack also includes a terminal layer which is the layer of the stack which is furthest from the face. The terminal layer is a metallic layer consisting of zinc and tin, made of SnxZny with a ratio of 0.1?x/y?2.4 and having a physical thickness of between 0.5 nm and 5.0 nm excluding these values, or even between 0.6 nm and 2.7 nm excluding these values.

Abstract: A substrate is coated on one face with a thin-film multilayer including at least one metal functional film based on silver or made of silver having a thickness e of between 7 nm and 20 nm inclusive of these values, and two antireflection coatings each including at least one antireflection film. The functional film is placed between the two antireflection coatings. The multilayer includes an upper discontinuous metal film having a thickness e? of between 0.5 nm and 5 nm inclusive of these values. The upper discontinuous metal film is located above the only or last metal functional film as counted starting from the face.

Abstract: The invention relates to a substrate (10) coated on one face (11) with a multilayer of thin films (14) with reflective properties in the infrared and/or in the solar radiation band comprising a single functional metal layer (140), in particular of silver or of a metal alloy containing silver, and two dielectric coatings (120, 160), said coatings each comprising at least one dielectric layer (122, 164), said functional layer (140) being disposed between the two dielectric coatings (120, 160), said multilayer furthermore comprising a single absorbing layer (19), characterized in that said absorbing layer (19) is a metal layer having a physical thickness in the range between 0.5 nm and 1.5 nm, or even between 0.6 nm and 1.2 nm and is situated directly on said face (11) and directly under a dielectric layer of nitride not comprising any oxygen.

Abstract: A substrate is coated on one face with a thin-films stack having reflection properties in the infrared and/or in solar radiation including at least one metallic functional layer, based on silver or on a metal alloy containing silver, and at least two antireflection coatings. The coatings each include at least one dielectric layer. The functional layer is positioned between the two antireflection coatings. The stack also includes a terminal layer which is the layer of the stack which is furthest from the face. The terminal layer is a metallic layer consisting of zinc and tin, made of SnxZny with a ratio of 0.1?x/y?2.4 and having a physical thickness of between 0.5 nm and 5.0 nm excluding these values, or even between 0.6 nm and 2.7 nm excluding these values.

Abstract: A substrate is coated on one face with a thin-film multilayer including at least one metal functional film based on silver or made of silver having a thickness e of between 7 nm and 20 nm inclusive of these values, and two antireflection coatings each including at least one antireflection film. The functional film is placed between the two antireflection coatings. The multilayer includes an upper discontinuous metal film having a thickness e? of between 0.5 nm and 5 nm inclusive of these values. The upper discontinuous metal film is located above the only or last metal functional film as counted starting from the face.

Abstract: The invention relates to a transparent substrate provided with a thin-film multilayer comprising a metallic layer having infrared-reflection properties located between two, subjacent and superjacent, nonmetallic dielectric coatings, the superjacent dielectric coating comprising the sequence of thin layers deposited in the following order: at least one high-refractive-index layer, the physical thickness of the high-refractive-index layer or the sum of the physical thicknesses of the high-refractive-index layers lying between 15 and 40 nm; and at least one low-refractive-index layer, the physical thickness of the low-refractive-index layer or the sum of the physical thicknesses of the low-refractive-index layers lying between 40 and 120 nm, the refractive index difference between the one or more high-refractive-index layers and the one or more low-refractive-index layers lying between 0.7 and 1.2, preferably between 0.8 and 1.1.

Abstract: The invention relates to a substrate (10) coated on one face (11) with a multilayer of thin films (14) with reflective properties in the infrared and/or in the solar radiation band comprising a single functional metal layer (140), in particular of silver or of a metal alloy containing silver, and two dielectric coatings (120, 160), said coatings each comprising at least one dielectric layer (122, 164), said functional layer (140) being disposed between the two dielectric coatings (120, 160), said multilayer furthermore comprising a single absorbing layer (19), characterized in that said absorbing layer (19) is a metal layer having a physical thickness in the range between 0.5 nm and 1.5 nm, or even between 0.6 nm and 1.2 nm and is situated directly on said face (11) and directly under a dielectric layer of nitride not comprising any oxygen.

Abstract: The invention relates to a transparent substrate provided with a thin-film multilayer comprising a metallic layer having infrared-reflection properties located between two, subjacent and superjacent, nonmetallic dielectric coatings, the superjacent dielectric coating comprising the sequence of thin layers deposited in the following order: at least one high-refractive-index layer, the physical thickness of the high-refractive-index layer or the sum of the physical thicknesses of the high-refractive-index layers lying between 15 and 40 nm; and at least one low-refractive-index layer, the physical thickness of the low-refractive-index layer or the sum of the physical thicknesses of the low-refractive-index layers lying between 40 and 120 nm, the refractive index difference between the one or more high-refractive-index layers and the one or more low-refractive-index layers lying between 0.7 and 1.2, preferably between 0.8 and 1.1.