Abstract: Disclosed are techniques for on-chip electromagnetic interference (EMI) shielding. In an aspect, an integrated circuit includes a noise-sensitive device, a first metallization layer disposed on a first side of the noise-sensitive device, wherein the first metallization layer includes a plurality of conductive routing layers, and wherein conductive routing within the plurality of conductive routing layers is configured as a first side of an on-chip electromagnetic interference (EMI) shield around the first side of the noise-sensitive device, and a second metallization layer disposed on a second side of the noise-sensitive device opposite the first side of the noise-sensitive device, wherein the second metallization layer includes one or more conductive routing layers, and wherein conductive routing within the one or more conductive routing layers is configured as a second side of the on-chip EMI shield around the second side of the noise-sensitive device.

Abstract: An apparatus is disclosed for reducing parasitic capacitance. In an example aspect, an apparatus includes an amplifier having a differential cascode configuration. Each stack of the amplifier includes a first transistor configured to operate as an input stage and a second transistor configured to operate as a cascode stage. The first and second transistors each include two channel terminal regions having a doping type that is uniform across the two channel terminal regions. Surfaces of first channel terminal regions of the first and second transistors abut a first and second quantity of electrical contacts, respectively. Second channel terminal regions of the first and second transistors form a floating region at a floating node. Each of the first quantity of electrical contacts and the second quantity of electrical contacts is greater than a third quantity of electrical contacts abutting a surface of the floating region.

Abstract: One or more aspects include apparatuses, systems including co-spiral inductors and methods for fabricating the same. In at least one aspect, a co-spiral inductor includes a plurality of turns, each of the plurality of turns being displaced both vertically and horizontally from a next successive turn. The plurality of turns is formed from traces on different metal layers formed on a substrate. The co-spiral inductor includes a plurality of insulators configured to electrically insulate each of the plurality of turns. The co-spiral inductor includes a plurality of interconnects configured to couple each of the plurality of turns to at least one other turn.

Abstract: Disclosed is a sheet resistor designed to operate in a high frequency environment. Unlike conventional sheet resistors, the equivalent series inductance (ESL) is minimized or even eliminated altogether when using the designed sheet resistor. As a result, better signal isolation can be achieved.

Abstract: Disclosed are devices and methods for semiconductor devices including a ceramic substrate. Aspects disclosed include semiconductor device including an electrical component, an alumina ceramic substrate and a substrate-film. The substrate-film is deposited on the alumina ceramic substrate. The substrate-film has a planar substrate-film surface opposite the alumina ceramic substrate. The electrical component is formed on the substrate-film surface of the substrate-film on the alumina ceramic substrate.

Abstract: In an aspect, a heterojunction bipolar transistor (HBT) includes a sub-collector disposed on a collector. The collector has a collector contact disposed on the sub-collector and located on a first side of the heterojunction bipolar transistor. The HBT includes an emitter disposed on an emitter cap. The emitter has an emitter contact disposed on the emitter cap and located on a second side of the heterojunction bipolar transistor. The HBT includes a base having a base contact located on the second side of the heterojunction bipolar transistor.

Abstract: An integrated circuit (IC) includes a substrate and a first through substrate via (TSV) in the substrate. The first TSV includes a first metal-insulator-metal (MIM) capacitor. The first MIM capacitor includes a first plate composed of a first metallization layer on an inner surface of the first TSV. The first MIM capacitor includes a MIM insulator layer on the first plate. The first MIM capacitor includes a second plate composed of a second metallization layer on the MIM insulator layer. The IC includes a 3D inductor. The 3D inductor includes a second TSV in the substrate. The 3D inductor includes a first trace on a first surface of the substrate, coupled to a first end of the second TSV. The 3D inductor further includes a second trace on a second surface of the substrate and coupled to a second end of the second TSV and a second end of the first TSV.

Abstract: Antenna modules employing three-dimensional (3D) build-up on mold package to support efficient integration of radio-frequency (RF) circuitry, and related fabrication methods. The antenna module includes a RF transceiver whose circuitry is split over multiple semiconductor dies (“dies”) so different semiconductor devices can be formed in different semiconductor structures. The antenna module is provided as a 3D build-up on mold package to reduce lengths of die-to-die (D2D) interconnections between circuits in different dies. First and second die packages that include respective first and second dies encapsulated in respective first and second mold layers are coupled to each other in a vertical direction in a 3D stacked arrangement with active faces of the first and second dies facing each other to provide a reduced distance between the active faces of the first and second dies. An antenna is stacked on the second die package to provide an antenna(s) for the antenna module.

Abstract: A package that includes a first filter comprising a first polymer, a substrate cap, a second filter comprising a second polymer frame, at least one interconnect, an encapsulation layer and a plurality of through encapsulation vias. The substrate cap is coupled to the first polymer frame such that a first void is formed between the substrate cap and the first filter. The second polymer frame is coupled to the substrate cap such that a second void is formed between the substrate cap and the second filter. The at least one interconnect is coupled to the first filter and the second filter. The encapsulation layer encapsulates the first filter, the substrate cap, the second filter, and the at least one interconnect. The plurality of through encapsulation vias coupled to the first filter.

Abstract: Disclosed are apparatuses and techniques for fabricating an apparatus including a semiconductor device. The semiconductor device may include: a die, a thermally conductive interface that includes a thermal bridge interposer (THBI) structure, and a substrate. The die is coupled to the substrate by the thermally conductive interface and at least a portion of the die is coupled to the substrate by the THBI structure.

Abstract: Disclosed is a sheet resistor designed to operate in a high frequency environment. Unlike conventional sheet resistors, the equivalent series inductance (ESL) is minimized or even eliminated altogether when using the designed sheet resistor. As a result, better signal isolation can be achieved.

Abstract: Improve EM coupling for the wafer-bonding process from a first wafer to a second wafer by a shielding technique. Examples may include building an EM shield implemented by BEOL-stacks/routings, bonding contacts, and TSVs for a closed-loop shielding platform for the integrated device to minimize EM interference from active devices due to eddy currents. The shield may be implemented in the active device layer during a wafer-to-wafer bonding-process that uses two different device layers/wafers, an active device layer/wafer and a passive device layer/wayer. The shield may be designed by the patterned routings for both I/O ports and the GND contacts.

Abstract: An inductor includes a first metallization layer multi-turn trace. The inductor also includes a second metallization layer multi-turn trace coupled to the first metallization layer multi-turn trace through at least one first via. The inductor further includes a plurality of discrete third metallization layer trace segments coupled to the second metallization layer multi-turn trace through a plurality of second vias.

Abstract: Disclosed are devices having a metal-insulator-metal (MIM) capacitor and methods for fabricating the devices. The MIM capacitor includes a plurality of trenches in a Silicon (Si) substrate; a porous Si surface formed in the plurality of trenches, where the porous Si surface has an irregular surface on sidewalls and bottoms of the plurality of trenches; an oxide layer conformally disposed on the porous Si surface; a first plate conformally disposed on the oxide layer; a first dielectric layer conformally disposed on the first plate; and a second plate conformally disposed on the first dielectric, where the first plate, the first dielectric layer, and the second plate, each have an irregular surface that generally conforms to the irregular surface of the porous Si surface.

Abstract: Radio frequency (RF) circuits generate noise that can interfere with other RF circuits on the same semiconductor die. An isolation material disposed in an isolation region between a first active region of a first RF circuit and a second active region of a second RF circuit comprises a porosified region of the semiconductor material of the semiconductor die. The isolation material (e.g., porosified material) has a higher resistivity and lower permittivity than the semiconductor material to reduce transmission of noise interference between the first RF circuit and the second RF circuit. The isolation material in the isolation region of the semiconductor material comprises a porosity in the range 20% to 50% higher than the porosity of the semiconductor material in the first and second active regions. The porosified region has a lower permittivity and a higher resistivity than the non-porosified region to protect against the transmission of noise interference.

Abstract: A three-dimensional integrated circuit (3DIC) and techniques for fabricating a 3DIC. An example semiconductor device generally includes an integrated circuit (IC) having a first plurality of pads coupled to components of the IC, wherein a first oxide material is disposed between the first plurality of pads, and a second plurality of pads, wherein at least a portion of the first plurality of pads is bonded to at least a portion of the second plurality of pads, and wherein a second oxide material is disposed between the second plurality of pads and is bonded to the first oxide material b. The semiconductor device may also include a substrate disposed above the second plurality of pads, one or more passive devices adjacent to the substrate, and one or more vias formed through the substrate, wherein at least one of the second plurality of pads is coupled to the one or more vias.

Abstract: Surface acoustic wave (SAW) filter packages employing an enhanced thermally conductive cavity frame for heat dissipation, and related fabrication methods are disclosed. The SAW filter package also includes a cavity frame comprising a perimeter structure and a cavity inside the perimeter structure coupled to a substrate of a piezoelectric material that contains interdigital transducers (IDTs). A cap substrate is disposed on the perimeter structure of the cavity frame to enclose an air cavity inside the perimeter structure between a substrate and the cap substrate. In exemplary aspects, to effectively dissipate heat generated in the SAW filter package to maintain the desired performance of the SAW filter, the cavity frame is comprised of a material that has an enhanced thermal conductivity. The heat generated in the SAW filter package can more effectively be dissipated, particularly at edges and corners of the cavity frame where hot spots can particularly occur.

Abstract: A three dimensional (3D) inductor is described. The 3D inductor includes a first plurality of micro-through substrate vias (TSVs) within a first area of a substrate. The 3D inductor also includes a first trace on a first surface of the substrate, coupled to a first end of the first plurality of micro-TSVs. The 3D inductor further includes a second trace on a second surface of the substrate, opposite the first surface, coupled to a second end, opposite the first end, of the first plurality of micro-TSVs.

Abstract: In an aspect, a heterojunction bipolar transistor (HBT) includes a sub-collector disposed on a collector. The collector has a collector contact disposed on the sub-collector and located on a first side of the heterojunction bipolar transistor. The HBT includes an emitter disposed on an emitter cap. The emitter has an emitter contact disposed on the emitter cap and located on a second side of the heterojunction bipolar transistor. The HBT includes a base having a base contact located on the second side of the heterojunction bipolar transistor.

Abstract: A radio frequency integrated circuit (RFIC) includes a bulk semiconductor substrate. The RFIC also includes a compound semiconductor field effect transistor (FET). The compound semiconductor FET is composed of a gallium nitride (GaN) epitaxial stack in a trench in the bulk semiconductor substrate having sidewall spacers. The sidewall spacers are between the GaN epitaxial stack and sidewalls of the trench. A carbonized surface layer is at a base of the trench and coupled to the GaN epitaxial stack. The RFIC further includes a complementary metal oxide semiconductor (CMOS) transistor integrated with the compound semiconductor FET on the bulk semiconductor substrate.