Patents by Inventor Randall Kautz

Randall Kautz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • High contrast high thermal stability positive photoresists having novolak resins of lowered hydroxyl content
    Patent number: 5208138
    Abstract: Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and (1) a monohydroxy aromatic aldehyde and wherein at least a portion of the hydroxyl groups thereof are esterified or (2) a mixture of at least one monohydroxy aromatic aldehyde and at least one non-hydroxylic aromatic aldehyde; the novolak resins having a hydroxyl number of from about 120 to about 180 grams of resin per equivalent of hydroxyl. The novolak resins are especially useful in positive photoresist formulations and have enhanced photospeed and film loss characteristics as well as improved thermal stability.
    Type: Grant
    Filed: May 21, 1992
    Date of Patent: May 4, 1993
    Assignee: Morton International, Inc.
    Inventors: Richard M. Lazarus, Randall Kautz, Sunit S. Dixit
  • Novolak resins of lowered hydroxyl content and high contrast high thermal stability positive photoresists prepared therefrom
    Patent number: 5182184
    Abstract: Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and (1) a monohydroxy aromatic aldehyde and wherein at least a portion of the hydroxyl groups thereof are esterified or (2) a mixture of at least one monohydroxy aromatic aldehyde and at least one non-hydroxylic aromatic aldehyde; the novolak resins having a hydroxyl number of from about 120 to about 180 grams of resin per equivalent of hydroxyl. The novolak resins are especially useful in positive photoresist formulations and have enhanced photospeed and film loss characteristics as well as improved thermal stability.
    Type: Grant
    Filed: February 5, 1990
    Date of Patent: January 26, 1993
    Assignee: Morton International, Inc.
    Inventors: Richard M. Lazarus, Randall Kautz, Sunit S. Dixit
  • Mixed aldehyde novolak resins useful as high contrast high thermal stability positive photoresists
    Patent number: 5130409
    Abstract: Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and an aromatic aldehyde. When the aromatic aldehyde is a monohydroxy aromatic aldehyde, the novolak resin is especially useful in positive photoresist formulations.
    Type: Grant
    Filed: November 16, 1990
    Date of Patent: July 14, 1992
    Assignee: Morton International, Inc.
    Inventors: Richard M. Lazarus, Randall Kautz, Sunit S. Dixit
  • High contrast high thermal stability positive photoresists with mixed cresol and hydroxybenzaldehyde prepared novolak and photosensitive diazoquinone
    Patent number: 4920028
    Abstract: Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and an aromatic aldehyde. When the aromatic aldehyde is a monohydroxy aromatic aldehyde, the novolak resin is especially useful in positive photoresist formulations.
    Type: Grant
    Filed: August 2, 1988
    Date of Patent: April 24, 1990
    Assignee: Morton Thiokol, Inc.
    Inventors: Richard M. Lazarus, Randall Kautz, Sunit S. Dixit