Patents by Inventor Randall Kubena

Randall Kubena has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11863194
    Abstract: An atomic clock stabilized or disciplined by tooth selected from a phononic comb of frequency teeth. A method of stabilizing an atomic clock having a reference oscillator, the method comprising selecting a particular tooth from a phononic comb of frequency teeth and applying a correction signal to said reference oscillator, the correction signal being based the selected tooth of said phononic comb. The disclosed technology is not limited to stabilizing reference oscillators associated with atomic clocks and thus may be utilized to stabilize reference oscillators whether or not they are interfaces with an atomic clock.
    Type: Grant
    Filed: December 31, 2021
    Date of Patent: January 2, 2024
    Assignee: HRL LABORATORIES, LLC
    Inventors: Randall Kubena, Walter Wall
  • Patent number: 8305154
    Abstract: The present invention is a piezoelectric crystal oscillator using parametric amplification to enhance the Q. Parametric amplification is accomplished by driving the same region of the crystal as used for the oscillator with an overtone of the crystal resonator.
    Type: Grant
    Filed: November 24, 2010
    Date of Patent: November 6, 2012
    Assignee: HRL Laboratories, LLC
    Inventors: Randall Kubena, Yook-Kong Yong
  • Publication number: 20070216490
    Abstract: A method for fabricating a quartz nanoresonator which can be integrated on a substrate, along with other electronics is disclosed. In this method a quartz substrate is bonded to a base substrate. The quartz substrate is metallized so that a bias voltage is applied to the resonator, thereby causing the quartz substrate to resonate at resonant frequency greater than 100 MHz. The quartz substrate can then be used to drive other electrical elements with a frequency equal to its resonant frequency. The quartz substrate also contains tuning pads to adjust the resonant frequency of the resonator. Additionally, a method for accurately thinning a quartz substrate of the resonator is provided.
    Type: Application
    Filed: May 4, 2007
    Publication date: September 20, 2007
    Inventors: Randall Kubena, David Chang, Jinsoo Kim
  • Publication number: 20070205839
    Abstract: A method for fabricating a quartz nanoresonator which can be integrated on a substrate, along with other electronics is disclosed. In this method a quartz substrate is bonded to a base substrate. The quartz substrate is metallized so that a bias voltage is applied to the resonator, thereby causing the quartz substrate to resonate at resonant frequency greater than 100 MHz. The quartz substrate can then be used to drive other electrical elements with a frequency equal to its resonant frequency. The quartz substrate also contains tuning pads to adjust the resonant frequency of the resonator. Additionally, a method for accurately thinning a quartz substrate of the resonator is provided.
    Type: Application
    Filed: May 4, 2007
    Publication date: September 6, 2007
    Inventors: Randall Kubena, David Chang, Jinsoo Kim
  • Publication number: 20070017287
    Abstract: Embodiments of the present invention are directed to apparatuses and methods of making a micromachined resonator gyroscope, e.g. a disc resonator gyro (DRG), including one or more of the following novel features. Embodiments of the invention may comprise a triple-wafer stack gyroscope with an all fused quartz (or all silicon) construction for an electrical baseplate, resonator and vacuum cap. This can yield superior thermal stability over prior art designs. A typical resonator embodiment may include a centrally anchored disc with high aspect-ratio in-plane electrostatic drive and sense electrodes to create large capacitance. A silicon sacrificial layer may be employed for attaching a quartz resonator wafer to a quartz handle wafer for high aspect-ratio etching. In addition, embodiments of the invention may comprise a low thermal stress, wafer-level vacuum packaged gyroscope with on-chip getter. An ultra-thin conductive layer deposited on the quartz resonator may also be utilized for high Q.
    Type: Application
    Filed: July 20, 2006
    Publication date: January 25, 2007
    Applicant: The Boeing Company
    Inventors: Randall Kubena, David Chang
  • Publication number: 20050269901
    Abstract: A method for tuning an electro-mechanical device such as a MEMS device is disclosed. The method comprises operating a MEMS device in a depressurized system and using FIB micromachining to remove a portion of the MEMS device. Additionally, a method for tuning a plurality of MEMS devices by depositing an active layer and then removing a portion of the active layer using FIB micromachining. Also, a method for tuning a MEMS device and vacuum packaging the MEMS device in situ are provided.
    Type: Application
    Filed: June 7, 2005
    Publication date: December 8, 2005
    Inventors: Randall Kubena, Richard Joyce
  • Publication number: 20050158905
    Abstract: A method for fabricating a quartz nanoresonator which can be integrated on a substrate, along with other electronics is disclosed. In this method a quartz substrate is bonded to a base substrate. The quartz substrate is metallized so that a bias voltage is applied to the resonator, thereby causing the quartz substrate to resonate at resonant frequency greater than 100 MHz. The quartz substrate can then be used to drive other electrical elements with a frequency equal to its resonant frequency. The quartz substrate also contains tuning pads to adjust the resonant frequency of the resonator. Additionally, a method for accurately thinning a quartz substrate of the resonator is provided.
    Type: Application
    Filed: January 25, 2005
    Publication date: July 21, 2005
    Inventors: Randall Kubena, David Chang, Jinsoo Kim