Patents by Inventor Randolph Schueller

Randolph Schueller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11699893
    Abstract: Systems and methods disclosed herein include a vertical cavity surface emitting laser (VCSEL) device that includes an anode, a cathode, and one or more curved apertures located in an epitaxial layer between the anode and the cathode, each of the one or more curved apertures having an aperture edge and one or more oxidation bridges crossing the curved aperture that allow current to flow inside the curved aperture, in which when a current signal is applied to the VCSEL, current flow between the anode and the cathode is distributed along the aperture edge of the one or more curved apertures.
    Type: Grant
    Filed: November 24, 2020
    Date of Patent: July 11, 2023
    Assignee: Vixar, Inc.
    Inventors: Randolph Schueller, Sara Rothwell
  • Publication number: 20220166192
    Abstract: Systems and methods disclosed herein include a vertical cavity surface emitting laser (VCSEL) device that includes an anode, a cathode, and one or more curved apertures located in an epitaxial layer between the anode and the cathode, each of the one or more curved apertures having an aperture edge and one or more oxidation bridges crossing the curved aperture that allow current to flow inside the curved aperture, in which when a current signal is applied to the VCSEL, current flow between the anode and the cathode is distributed along the aperture edge of the one or more curved apertures.
    Type: Application
    Filed: November 24, 2020
    Publication date: May 26, 2022
    Applicant: Vixar, Inc.
    Inventors: Randolph Schueller, Sara Rothwell
  • Publication number: 20060003662
    Abstract: A field emission device having emitter tips and a support layer for a gate electrode is provided. Openings in the support layer and the gate layer are sized to provide mechanical support for the gate electrode. Cavities may be formed and mechanically supported by walls between cavities or columns within a cavity. Dielectric layers having openings of different sizes between the emission tips and the gate electrode can decrease leakage current between emitter tips and the gate layer. The emitter tips may comprise a carbon-based material. The device can be formed using processing operations similar to those used in conventional semiconductor device manufacturing.
    Type: Application
    Filed: August 26, 2005
    Publication date: January 5, 2006
    Inventors: Randolph Schueller, Charlie Hong, Susan Hong